Tokyo Ohka Kogyo Co., Ltd.

Ricoh Company, Ltd.

Hiroshi Hosoda

Toshimasa Nakayama

Hidekatsu Kohara

Kousuke Doi

Nobuo Tokutake

Satoshi Niikura

Hiroshi Nishida

Eiji Shinohara

Kazuyuki Nitta

Taku Hirayama

Atsushi Sawano

Atsushi Hanai

Kouichi Takahashi

Tatsuto Torikai

Tetsuya Miida

Keisuke Kataoka

Sachiko Misumi

Tatsuya Hashiguchi

Remi Numata

Takehiro Nishiura

Yayoi Katagiri

Keisuke Hilltop Nagatsuda 303 Kataoka

Sachiko Residence Denen 3A Misumi

A transmission device sends status information representing status of a copier to a center through a PSTN. In the center, the status information of each copier is analyzed, and suggestion information selected based on a result of the analysis is provided to a terminal of the user of the copier concerned. In this case, the user is informed by an e-mail or through a Web page with using the terminal. The information includes: a suggestion to multiply the copier, replace the currently-used copier with a new copier, performance information regarding a model of the currently-used copier, information regarding a timing for replenishing/replacing an expendable supply (such as a toner unit, etc.), a suggestion to purchase the expendable supply, and the like.

System, method, apparatus and program for collecting and providing information

The present invention provides a positive photoresist composition exhibiting superior sensitivity, definition and thermostability, and in addition, having excellent focal depth range properties. The positive photoresist composition comprises (A) an alkali-soluble resin; (B) a quinonediazide group-containing compound; and (C), for example, bis(4-hydroxy-2,3,5-trimethylphenyl)-2-hydroxyphenylmethane.

Positive photoresist composition

A positive photoresist composition comprising (A) an alkali-soluble resin and (B) a light-sensitive component comprising at least one compound represented by the following general formula (I): ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each independently a hydrogen atom, an alkyl group having 1-3 carbon atoms or an alkoxy group having 1-3 carbon atoms; R.sup.4 is a hydrogen atom or an alkyl group having 1-3 carbon atoms; a, b and c are an integer of 1-3; l, m and n are an integer of 1-3, in which at least part of the hydroxyl groups present are esterified with a quinonediazidosulfonic acid and a sulfonic acid which has a group represented by the following formula (II):

Positive photoresist compositions and multilayer resist materials using

An improved positive-working photoresist composition useful in the fine patterning work of a resist layer is proposed which is capable of giving a patterned resist layer having excellent resolution, heat resistance and orthogonality of the cross sectional profile of a line pattern with a high sensitivity to actinic rays and a wide range of the focusing depth. The photoresist composition comprises, as a uniform mixture in the form of a solution, (a) an alkali-soluble novolac resin, (b) a naphthoquinone-1,2-diazido group-containing compound as a photosensitizing ingredient and (c) a specific phenolic triphenyl methane compound substituted by cyclohexyl groups on two of the phenyl groups, such as bis(3-cyclohexyl-4-hydroxy-6-methylphenyl)-3,4-dihydroxyphenyl methane or bis(3-cyclohexyl-6-hydroxy-4-methylphenyl)-3,4-dihydroxyphenyl methane, in a specified amount.

Positive-working quinonediazide photoresist composition containing a

Proposed is a positive-working photosensitive resin composition suitable as a photoresist in the photolithographic patterning work for the manufacture of, for example, semiconductor devices having excellent storage stability and capable of giving a patterned resist layer having excellent contrast of the images, orthogonality of the cross sectional profile of line patterns and heat resistance along with a satisfactorily high photosensitivity and large focusing latitude. The composition comprises, in admixture with an alkali-soluble novolac resin as a film-forming agent, a photosensitizing agent which is an esterification product of a specific tris(hydroxyphenyl) methane compound of which two of the hydroxyphenyl groups each have a cyclohexyl group bonded thereto at a specified position with at least one naphthoquinone-1,2-diazide sulfonyl group as the esterifying group.

Positive working photosensitive resin composition containing

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Kanagawa, Japan

Hiroshi Hosoda