Merck Patent Gmbh

Az Electronic Materials (luxembourg) S.a.r.l.

Hiroshi Hitokawa

Tomohide Katayama

Masato Suzuki

Shigemasa Nakasugi

Hiroshi Yanagita

Toshiya Okamura

Shunji Kawato

Tetsumasa Takaichi

Rikio Kozaki

Katsuyuki Sakamoto

Tomotsugu Yano

Rui Zhang

Aritaka Hishida

To provide a novel polymer capable of reducing sublimate during film formation and a composition comprising the same. The polymer (A) according to the present invention comprises at least one structural unit selected from the group consisting of Unit (a), Unit (b), Unit (c) and Unit (d) having certain structures, wherein, n, n, nand n, which are the numbers of repetition respectively of Units (a), (b), (c) and (d), satisfy the following formulae: n+n>0, n≥0 and n≥0.

Polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor composition

[Problem to be Solved] To provide a bottom antireflective coating forming composition which can show high etching resistance and can be crosslinked even at a relatively low temperature. Further, to provide a resist pattern manufacturing method and a device manufacturing method using the same. [Solution] The bottom antireflective coating forming composition comprises: a polymer A comprising specific repeating units; a low molecular crosslinking agent having a molecular weight of 100 to 3,000; and a solvent. The resist pattern manufacturing method and the device manufacturing method using the same are also provided.

Bottom antireflective coating forming composition

[Problem] To provide a high heat resistance resist composition and a pattern formation method using the composition. [Solution] The present invention provides a chemically amplified negative-type resist composition comprising a particular polymer and a particular crosslinking agent, and this composition makes it possible to form a resist pattern of high sensitivity, of excellent resolution and of strong heat-resistance.

High heat resistance resist composition and pattern forming method using the same

[Problem] To provide a dispersion containing surface-modified silica nanoparticles highly dispersed in an organic dispersion medium and also having high transparency and storage stability. [Solution] Disclosed is a method for producing surface-modified silica nanoparticles comprising: preparing a first silica nanoparticle dispersion containing silica nanoparticles and an aqueous dispersion medium; replacing the aqueous dispersion medium in the first silica nanoparticle dispersion with an organic dispersion medium comprising at least one selected from cyclic esters or cyclic amides, to obtain a second silica nanoparticle dispersion; and mixing the second silica nanoparticle dispersion with a silane coupling agent represented by the formula (1): 

Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticles

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Kakegawa, Japan

Hiroshi Hitokawa