National Institute of Advanced Industrial Science and Technology

Agency of Industrial Science and Technology

Agency of Industrial Science and Technology Ministry of International

Hiroshi Hiroshima

Kenta Suzuki

Hideki Takagi

Mutsuo Ogura

Sung Won Youn

Shigeo Okayama

SungWon Youn

Sang Cheon Park

Masanori Komuro

An imprint device according to the present invention is provided with a supply device that supplies a plurality of condensable gases, which have different saturated vapor pressures, at a fixed ratio by a first condensable gas tank () and a control valve () and a second condensable gas tank () and a control valve () when a concave portion formed in a mold is transferred in an atmosphere of a condensable gas, which condenses at a temperature and a pressure in the concave portion, the concave portion being sealed by a resist layer that enters into the concave portion formed in the mold (). The imprint device makes it possible to prevent resist filling failure caused by capillary condensation and to adjust pattern line width and shape by using the same mold.

Imprint device

Provided is a method for forming a pattern of polyimide that is simpler and is more excellent in the pattern shape and in the dimensional accuracy in comparison with the conventional techniques of patterning polyimide, such as photolithography and laser processing. In a method for forming a micropattern of polyimide, which includes using as polyimide a solvent-soluble polyimide resin composition that is photosensitive and is moldable at a temperature of less than or equal to a glass-transition temperature; patterning the composition using thermal imprinting; and thermally curing the composition, ultraviolet irradiation is performed after the composition is released from a mold after a molding step.

Method for forming micropattern of polyimide using imprinting

In order to prevent occurrence of a residual film distribution dependent upon a pattern density of a mold, in producing the mold to be used for imprint lithography, by etching using a mask, use is made of a first mask Mfor forming a desired pattern to be formed on a surface of the mold, and a second mask Mfor partially covering the first mask such that the area covering openings of the first mask is made larger as an opening ratio of the pattern formed on the first mold surface is higher, thereby to make a volume of a recess of the mold in a given area; in which, after the mold is etched by the first mask, etching is further conducted by covering partially the first mask with the second mask without removing the first mask; or alternatively, the etching is conducted with the first mask and the second mask overlapped from the beginning, thereby to use the second mask as a mask for delaying the etching, for conduct the etching.

Method of producing a mold for imprint lithography, and mold

A vibration-isolator joint for a vacuum device is connected to a vacuum pump and to a vacuum chamber used to evacuate the vacuum chamber. The joint includes a bellows having an internal portion via which evacuation is effected, a first end connected to the vacuum pump, a second end connected to the vacuum chamber, and a support structure that, when the bellows has been compressed by a prescribed amount, prevents further compression of the bellows and also communicates to the bellows vibration in a direction other than the direction in which the bellows expands and contracts.

Vibration-isolator joint for vacuum device

A charged beam apparatus comprising a vacuum chamber having a moving mechanism inside and a sample chamber, the sample chamber being used placed in an ultra-high vacuum atmosphere or a gas atmosphere, wherein a flat surface is formed on that surface of the moving mechanism which faces the sample chamber, and a flange having a flat open surface is mounted between the vacuum chamber and the sample chamber such that the open surface is opposed to the flat surface with a tiny gap being formed between the open surface and the flat surface for permitting vacuum venting without imposing any restrictions on the moving mechanism, whereby the apparatus operates without restricting the action of the moving mechanism.

Growing community of inventors

Tsukuba, Japan

Hiroshi Hiroshima