Matsushita Electric Industrial Co., Ltd.

Panasonic Corporation

Panasonic Intellectual Property Management Co., Ltd.

Hiroshi Hayata

Masahide Yokoyama

Eiji Ohno

Noboru Yamada

Nobuo Akahira

Hidehiro Yoshida

Naoki Suzuki

Kenichi Nagata

Yoshitaka Sakaue

Kazuhiro Nishikawa

Masahiro Yamamoto

Takaaki Higashida

Hisao Nagai

Kazuki Fukada

Tadashi Kimura

Takafumi Okuma

Isamu Aokura

Hitoshi Yamanishi

Hirokazu Nakaue

Masahiro Muro

Toshiyuki Suemitsu

Akira Okuda

Yoshio Kanata

Hideki Yamashita

Takao Nagumo

Teiichi Kimura

Yoshie Iwane

Nobuyuki Mori

Seiichiro Mori

A functional-film fabricating method includes applying a coating by ejecting droplets of functional liquid from plural nozzles to ejection areas for forming a functional film which are surrounded by bounded areas having a liquid repellent property, during a single scanning. In applying the coating, when there is a non-ejectable nozzle out of plural nozzles to be used for applying a coating to a single ejection area, the amount of droplets of the functional liquid ejected from another ejectable nozzle to be used for applying a coating to this ejection area is larger than that of cases where there is no non-ejectable nozzle.

Method for fabricating functional film

Provided is an ink-jet apparatus that: has a wide control range of the direction for ink ejection; can correct a variation in the direction for ink ejection; and can improve the yield of a product when used for manufacture of electronic devices. The ink-jet apparatus includes: pressure chamberconfigured with a pair of partition walls; nozzle platehaving nozzle; diaphragmsupported by partition walls; piezoelectric elementsandthat are in contact with diaphragmfor pressurizing pressure chamber; and piezoelectric elementsandsupporting partition walls. A voltage can be applied individually to piezoelectric elements, andto. The widths of part A and part B of diaphragm, part A being in contact with a piezoelectric element, and part B being in contact with partition wallsatisfy a particular relationship.

Ink-jet apparatus

A deposition apparatus includes a processing chamber internally having a reduced-pressure space for deposition process to be carried out therein, a base material holding member for holding a base material to be subjected to the deposition process, a target support member for supporting a target thereon, and a power supply unit for applying electric power to the target support member to generate a plasma in the reduced-pressure space. In the deposition apparatus, deposition process is carried out by using the target, which has a recess portion in its surface and in which a powder target formed of a powder material is placed in an inner surface of the recess portion. Thus, the in-plane uniformity of deposition rate is improved and a stable film deposition is fulfilled.

Deposition method by physical vapor deposition and target for deposition processing by physical vapor deposition

There is provided a display apparatus configured by stacking a drive circuit substrate and a light-emitting substrate. Electrodes of the substrates are accurately aligned to be electrically connected to each other. A display apparatus is configured by stacking a drive circuit substrate having a drive circuit and a light-emitting substrate having a light-emitting unit including a pixel electrode to cause the drive circuit substrate and the light-emitting substrate to face each other, wherein on a stacked plane between the drive circuit substrate and the light-emitting substrate, an intermediate electrode connected to the light-emitting unit of the light-emitting substrate and a connection electrode connected to the drive circuit and the drive circuit substrate are electrically connected to each other, and the intermediate electrode is elongated in a direction parallel to or perpendicular to a longitudinal direction of the pixel electrode on the stacked plane.

Display apparatus

This invention provides a means for suppressing streaks of light emission in an organic EL display having an organic light-emitting layer formed by coating by an ink jet method. A manufacturing process of the organic EL display of this invention includes: preparing a display substrate having two or more linear banks in parallel to each other, and two or more pixel regions arranged in a region between the linear banks; arranging an ink jet head such that the alignment direction of nozzles and the line direction of the linear banks are in parallel; and relatively moving the ink jet head in a direction perpendicular to the line direction of the linear banks and discharging the ink from the nozzles to apply the ink to every region defined by the linear banks.

Organic electroluminescent display and manufacturing method therefor

A first target is arranged opposite a substrate while a second target is arranged not opposite the substrate within a vacuum chamber. Pressure within the vacuum chamber is adjusted to a first pressure, and during a period wherein the pressure is changed from the first pressure to a second pressure which is lower than the first pressure, plasma density above the second target is made greater than plasma density above the first target. At a time point when the second pressure is reached, the plasma density above the first target is made greater than the plasma density above the second target.

Magnetron sputtering method and apparatus

The film thickness of a thin film formed on substrate,is made symmetrical and uniform by eliminating currents of gas over target,by performing film deposition in a condition with gas supply and vacuum evacuation cut off, after adjusting the interior of vacuum chamber,to the predetermined pressure.

Sputtering method and apparatus

The present invention is to provide a method for manufacturing the PCE optical information recording disk under control of not only the crystallization velocity but also the complex index of refraction and thus the reflectance on the disk surface. The PCE optical information recording disk is suitable to be used under the constant angular velocity (the constant rotational numbers wherein the disk has a characteristic that the crystallization velocity is designed to become faster from inside area of the disk to outside area in the radical direction thereof under control of not only the crystallization velocity but also the complex index of refraction and thus the reflectance on the disk surface. In the case of mass production and high film formation to be required, the present invention provides an effective method for manufacturing the optical disk by means of sputtering from at least two targets at the same time in a manner that the crystallization velocity is increased in a radial direction from inside area to outside area in the disk.

Optical recording disk and method for manufacturing the same

A trigger gas feed system is normally kept opened before a discharge is started. The trigger gas feed system is shut instantaneously, for example, when the discharge is generated, thereby to set a vacuum chamber at a sputtering pressure. The trigger gas feed system is opened again after the discharge is finished. The opened state is continued until another discharge is started. Accordingly, the pressure in the vacuum chamber before the discharge is maintained always constant, and the vacuum chamber is returned to the sputtering pressure in a short time.

Sputtering method and apparatus using a trigger gas feed

Optical information recording disk and method for manufacturing the same

A magnetron sputtering apparatus has a plurality of ring-shaped flat targets with different diameters disposed about one center axis. The apparatus includes magnets having the same polarity as each other and placed on both front surface side and rear surface side of each of the targets along an inner circumferential edge thereof, and magnets having the same polarity as each other and placed on both front surface side and rear surface side of each of the targets along an outer circumferential edge thereof. The magnets placed along the inner and outer circumferential edges are placed in such a way that the magnets along the inner circumferential edge and the magnets along the outer circumferential edge become opposite in polarity to each other.

Magnetron sputtering apparatus and method

A magnetron sputtering apparatus has a ring-shaped flat target and includes magnets of the same polarity respectively arranged at a front side and a rear side of the target extending along an inner peripheral edge of the target, and magnets of the same polarity respectively arranged at the front side and the rear side of the target extending along an outer peripheral edge of the target. The magnets extending along the inner peripheral edge of the target are inverted in polarity relative to the other magnets extending along the outer peripheral edge of the target.

Growing community of inventors

Osaka, Japan

Hiroshi Hayata