Stanley Electric Co., Ltd

Tokuyama Corporation

Hiroshi Furuya

Toshiyuki Obata

Toru Kinoshita

Shizukuni Yata

Yoshiki Fukuyama

A group III nitride laminate includes, on an AlN single crystal substrate, a multilayer structure having an AlGaN layer (0&#x3c;X&#x2264;1) that is lattice-matched to the AlN single crystal substrate, and wherein a GaN layer that has a film thickness of 5-400 nm and a dislocation density of less than 5&#xd7;10cmor a half width of the X-ray omega rocking curve of 50-300 seconds is laminated on the AlGaN layer (0&#x3c;X&#x2264;1).

Group III nitride laminate, luminescence element comprising said laminate, and method of producing group III nitride laminate

Provided is a method for pretreatment of a group III nitride single crystal substrate having a high Al composition ratio, for manufacturing a high-quality group III nitride thin film. The method includes heating the base substrate at a temperature range of 1000 to 1250&#xb0; C. for no less than 5 minutes under a first mixed gas atmosphere before a layer of a second group III nitride single crystal is grown, wherein the first mixed gas includes hydrogen gas and nitrogen gas; the base substrate includes a layer of a first group III nitride single crystal at least on a surface of the base substrate; the first group III nitride single crystal is represented by a composition formula of AlGaInN; and the layer of the second group III nitride single crystal is to be grown on the layer of the first group III nitride single crystal.

Method for pretreatment of base substrate and method for manufacturing layered body using pretreated base substrate

Disclosed is a method for producing a porous carbon material comprising: heating a cured phenolic resin complex lump, including 150 to 450 parts by weight of sodium hydroxide and/or potassium hydroxide per 100 parts by weight of phenolic resin, at a temperature of 420 to 850&#xb0; C. in a non-oxidizing atmosphere to obtain carbonized material; and washing and removing sodium hydroxide and potassium hydroxide included in the carbonized material. According to the present invention, there can be provided a porous carbon material, including large volumes of subnano-pores having a diameter of in a range of 0.45 to 1.0 nm with a sharp distribution, which is particularly useful as a gaseous adsorbent.

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Yamaguchi, Japan

Hiroshi Furuya