Renesas Electronics Corporation

Nec Electronics Corporation

Hiroshi Furuta

Kenjyu Shimogawa

Junji Monden

Kiyokazu Hashimoto

Muneaki Matsushige

Satoshi Yamamoto

Shouzou Uchida

Kenji Saito

Toshikatsu Jinbo

Toshifumi Takahashi

Ichiro Mizuguchi

Shunsaku Naga

Ichirou Mizuguchi

Takayuki Shirai

Hideyuki Nakamura

Hidetaka Natsume

Shinji Takeda

Kenji Hibino

Ryuichi Okamura

Hiroyuki Satake

Hiroyuki Hoshizaki

Hiroyasu Kitajima

Masaru Ushiroda

Takaaki Kobayashi

Hirofumi Azuhata

Kenjiyu Shimogawa

Tomoya Morita

A DRAM device includes plural N-channel MIS transistors arranged in a matrix over a P well, and a plurality of capacitors formed corresponding to the plurality of N-channel MIS transistors, and plural word lines formed corresponding to each row of the plurality of N-channel MIS transistors, and a plurality of bit lines formed corresponding to each column of the plurality of N-channel MIS transistors, and a Pdiffusion layer formed extending in the direction that the plurality of word lines extend and supplied with a p well voltage potential.

DRAM device

A semiconductor integrated circuit device includes a functional circuit part that includes a plurality of field effect transistors, a mode control circuit that receives a first control signal and that generates a second control signal that is used to change a logic state of the functional circuit part, an output control circuit that receives an output signal of the functional circuit part and controls output of the output signal, and a control circuit that receives the second control signal and that generates a third control signal to the output control circuit. During a time period when the functional circuit part changes a logic state according to the second control signal, the output control circuit inverts the output signal of the functional circuit part according to the third control signal.

Semiconductor device

In addition to a memory macro region and functional circuit regions on a substrate, a semiconductor integrated circuit device includes a dummy pattern regionarranged between the functional circuit regions and between the memory macro regionand the functional circuit regions and including a dummy pattern. The dummy pattern has a pattern identical to that of diffusion layers and gate electrodes of a memory cell pattern in a memory cell array region. An area ratio of dummy diffusion layer(s) and dummy gate electrode(s) in the dummy pattern region is equal to or greater than that of the diffusion layers and the gate electrode(s) in the memory cell array region.

Semiconductor integrated circuit device

A semiconductor integrated circuit device includes a gate electrode of at least one of a P-channel MISFET (metal-insulator-semiconductor field-effect transistor) and an N-channel MISFET provided in a direction parallel to a direction of a well isolation boundary phase between the P-channel MISFET and the N-channel MISFET, a first diffusion layer having a same conductivity type as that of a drain diffusion layer of one of a plurality of ones of the MISFET provided in two regions with a drain diffusion layer of the MISFET therebetween through an isolation respectively in a direction orthogonal to the gate electrode, and a second diffusion layer having a conductivity type different from that of the drain diffusion layer of the one of the plurality of ones of the MISFET provided between the well isolation boundary phase and one of a source diffusion layer and the drain diffusion layer.

Semiconductor integrated circuit including transistor having diffusion layer formed at outside of element isolation region for preventing soft error

A semiconductor integrated circuit device includes: a plurality of data holding circuits; and a plurality of wells. The plurality of data holding circuits is provided in a substrate of a first conductive type. Each of the plurality of data holding circuits includes a first well of the first conductive type and a second well of a second conductive type different from the first conductive type. The plurality of wells is arranged in two directions for the each of the plurality of data holding circuits.

A semiconductor integrated circuit device, includes a first electrode including a first semiconductor layer formed on a substrate, a side surface insulating film formed on at least a part of a side surface of the first electrode, an upper surface insulating film formed on the first electrode and the side surface insulating film, a second electrode which covers the side surface insulating film and the upper surface insulating film, and a fin-type field effect transistor. The first electrode, the side surface insulating film, and the second electrode constitute a capacitor element. A thickness of the upper surface insulating film between the first electrode and the second electrode is larger than a thickness of the side surface insulating film between the first electrode and the second electrode, and the fin-type field effect transistor includes a second semiconductor layer which protrudes with respect to the plane of the substrate.

Semiconductor integrated circuit device including a fin-type field effect transistor and method of manufacturing the same

A semiconductor integrated circuit device according to an embodiment of the invention includes: a protective element formed on a semiconductor substrate; and a plurality of wiring layers composed of insulating layers including a layer that is a low dielectric-constant film, and metal lines, in which a metal line in a second wiring layer and a metal line in a first wiring layer among the plurality of wiring layers extend from the other region above the semiconductor substrate to a region electrically connected with the protective element.

Disclosed is a semiconductor device including a mode control circuit that, when a standby control signal is in an activated state, based on a timer output signal from a timer circuit, generates a MODE control output signal that changes a logic state of a functional circuit part at every prescribed time interval, and an output control circuit that receives an output signal of the functional circuit part and controls output of the output signal; based on a delay output signal generated by delaying a MODE control output signal by a delay circuit. While the functional circuit part is changing the logic state by the MODE control output signal, the output control circuit does not transfer the functional circuit part output signal to output, but holds and outputs a functional circuit part output signal immediately before the functional circuit part changes the logic state by the MODE control output signal.

A semiconductor device has an SOI (Silicon On Insulator) structure and comprising a P-channel FET and an N-channel FET which are formed on an insulating film. The semiconductor device includes: at least two of first, second, third and fourth PN-junction elements. The first PN-junction element is formed from a P-type semiconductor layer and an N-type semiconductor layer having the same impurity concentrations as those of source/drain regions of the P-channel FET and the N-channel FET, respectively. The second PN-junction element is formed from a P-type semiconductor layer and an N-type semiconductor layer having the same impurity concentrations as those of the source/drain region and a channel region in the P-channel FET, respectively. The third PN-junction element is formed from a P-type semiconductor layer and an N-type semiconductor layer having the same impurity concentrations as those of a channel region and the source/drain region in the N-channel FET, respectively. The fourth PN-junction element is formed from a P-type semiconductor layer and an N-type semiconductor layer having the same impurity concentrations as those of the channel regions of the N-channel FET and the P-channel FET, respectively. At least two PN-junction elements are connected in series in a forward bias between two different terminals to form an electrostatic protection device.

Semiconductor device with electrostatic protection device

A MISFET includes a drain diffusion layer of a first conductivity type, a source diffusion layer of the first conductivity type, a gate electrode, and a substrate/well of a second conductivity type. In the MISFET, first diffusion layers of the first conductivity type are provided at two or more positions at predetermined intervals with an isolation therebetween respectively. The two or more positions are facing at least two sides of the element isolation insulation around the drain diffusion layer. A second diffusion layer of the second conductivity type is provided so as to be close to or to come in contact with the source diffusion layer.

A semiconductor integrated circuit has K (K is a natural number of 2 or more) number of memory cells coupled to a same word line, and multiple sense amplifier circuits coupled to the memory cells. The multiple sense amplifier circuits are divided into N (N is a natural number of 2 or more) number of groups. Among the N number of groups, after a first group of sense amplifier circuits is activated and carrying out a predetermined read-out operation, a second group of the sense amplifier circuits is activated and the predetermined read-out operation is carried out, and an Nth group of the sense amplifier circuits is activated sequentially to carry out the predetermined read-out operation.

Semiconductor integrated circuit

Provided is a destructive readout semiconductor memory device capable of avoiding concentration of a writeback current, in which a switch circuit () is provided between each bit line () and each sense amplifier (). In writeback, the switch circuits are turned on at staggered time points. In readout, the switch circuits are turned on to read memory cell data to the sense amplifiers while the sense amplifiers are turned off, and the switch circuits are then turned off once. After that, the sense amplifiers are turned on to amplify the read data. The switch circuits are subsequently divided into groups and turned on again to write back the data amplified by the sense amplifiers to the memory cells. The switch circuits are divided into groups to be turned on at staggered time points during the writeback, to thereby avoid concentration of the writeback current in one time period.

Semiconductor memory device and semiconductor memory device operation method

A semiconductor device according to an embodiment of the present invention includes: an oscillating circuit including a plurality of logic circuits connected in series; and an error detecting circuit receiving output signals of at least two of the plurality of logic circuits, and suspending an operation of the oscillating circuit to notify other blocks of the oscillating circuit that an error occurs in the oscillating circuit if a phase difference between the output signals is not within a predetermined phase difference range.

The semiconductor device includes first and second common source semiconductor layers respectively extending in a first direction, first and second logic gate circuits respectively composed of at least one three-dimensional P-type FET and a three-dimensional N-type FET. The sources of the three-dimensional P-type FETs in the first and second logic gate circuits are joined to the first common source semiconductor layer. The sources of the three-dimensional N-type FETs in the first and second logic gate circuits are joined to the second common source semiconductor layer. The semiconductor layers of the three-dimensional P-type and N-type FETs in the first logic gate circuit are joined in their drain side, and The semiconductor layers of the three-dimensional P-type and N-type FETs in the second logic gate circuit are joined in their drain side. The dissipation of the FinFET can be improved.

Semiconductor device with three-dimensional field effect transistor structure

A static random access memory (SRAM) cell includes a first well region of a first conductivity type, a second well region of the first conductivity type, formed in a location different from a location where the first well region is formed, and a third well region of a second conductivity type, which is located between the first well region and the second well region. The memory cell further includes a first tap diffused layer of the first conductivity type for supplying a potential to the first well region, a second tap diffused layer of the first conductivity type for supplying the potential to the second well region, the first and second tap diffused layers being arranged substantially on a diagonal line in the layout of the SRAM cell, and a metal interconnection connected to the first and second tap diffused layers, the metal interconnection passing on the third well region in the SRAM cell.

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Kanagawa, Japan

Hiroshi Furuta