Canon Anelva Corporation

Nippon Oil Fats Co., Ltd.

Anelva Corporation

Mitsubishi Denki Kabushiki Kaisha

Nec Corporation

Denso Corporation

Denki Kagaku Kogyo Kabushiki Kaisha

Denso It Laboratory, Inc.

Canon Anelva Engineering Corporation

Hiroshi Doi

Masami Shibagaki

Yuichi Sasuga

Shigeru Masuoka

Nobuyuki Masaki

Hiroyuki Hama

Atsushi Sekiguchi

Shigeru Mizuno

Yasuhiro Maeda

Sunil Wickramanayaka

Masahito Ishihara

Shinya Hasegawa

Toshiyuki Konishi

Mitsuru Ambai

Yoshihiro Honda

Ikuro Sato

Akihiro Egami

Yoshiyuki Tsuda

Ryoki Tobe

Hirohide Aoki

Mitsuhito Kamei

Ari Widodo

Osamu Kadota

Toshiaki Sasaki

Yoshikazu Nozaki

Naoyuki Kajita

Kuniaki Nakashima

Masanori Inoue

Seiji Itani

Xiao-Meng Liu

Yoshikatsu Honda

Toshiaki Matsuo

Susumu Kohno

An iris detection device includes a candidate detection unit, a candidate narrowing-down unit, and an iris specifying unit. The candidate detection unit detects circular regions as iris candidates from images captured by an infrared camera. The candidate narrowing-down unit narrows down the detected iris candidates into a predetermined number of iris candidates with use of data items of images of surroundings of each of the iris candidates. The iris specifying unit specifies one of the predetermined number of iris candidates obtained by the narrowing-down as an iris by matching between gradients of a contour of each of the predetermined number of iris candidates and iris templates.

Iris detection device, iris detection method, and recording medium onto which iris detection program is recorded

A recognition system includes: a sensor processing unit (SPU) that performs sensing to output a sensor value; a task-specific unit (TSU) including an object detection part that performs an object detection task based on the sensor value and a semantic segmentation part that performs a semantic segmentation task based on the sensor value; and a generic-feature extraction part (GEU) including a generic neural network disposed between the sensor processing unit and the task-specific unit, the generic neural network being configured to receive the sensor value as an input to extract a generic feature to be input in common into the object detection part and the semantic segmentation part.

Recognition system, generic-feature extraction unit, and recognition system configuration method

A heat treatment apparatus including a vacuum vessel, a substrate stage which holds a substrate mounted on it, a heating unit for heating the substrate, and an exhaust unit for evacuating the vacuum vessel includes a first reflector which covers the upper portion of the exhaust port of the exhaust unit while being spaced apart from the exhaust port, and a second reflector which surrounds the exhaust port. At least one of reflector members which form the second reflector faces a direction defined from the heating unit to the exhaust port.

Heat treatment apparatus and semiconductor device manufacturing method

A substrate processing apparatus includes a chamber capable of being evacuated, a substrate stage adapted to mount a substrate, a heating unit adapted to be set above the substrate mounting surface of the substrate stage, face the substrate mounted on at least the substrate mounting surface, and heat the substrate by radiant heat without being in contact with the substrate, a shutter adapted to be retractably inserted in the space between the heating unit and the substrate mounted on the substrate mounting surface, and a shutter driving unit adapted to extend/retract the shutter into/from the space. The substrate is mounted on the substrate stage to face the heating unit, the substrate is annealed by heating the substrate by radiant heat from the heating unit, and the shutter is extended into the space between the heating unit and the substrate stage.

Substrate processing apparatus, substrate annealing method, and semiconductor device manufacturing method

Deterioration of an O ring due to radiation heating in a vacuum heating apparatus is prevented to allow heat treatment of a substrate with good annealing properties. The vacuum heating apparatusincludes a vacuum chamberconstituted by flangesandhaving an opening portionand joined together, a turbo molecular pumpfor exhausting gas from the vacuum chamber, and a heater basefor heating a substrateplaced in the vacuum chamber. Joint surfaces of the flangesandare sealed by an O ring. Further, bonding stepsare formed between the heater baseand the O ringon the joint surfaces of the flangesand, thereby preventing thermo-radiation from the heater basefrom reaching the O ringthrough the joint surfaces of the flangesand

Vacuum heating apparatus

A heating apparatus including a filament arranged in a vacuum heating vessel comprises a base plate arranged in the vacuum heating vessel to fix the filament at a predetermined position with respect to a conductive heater forming one surface of the vacuum heating vessel. The base plate comprises a plate body having a carbon fiber.

Heating apparatus, heating method, and semiconductor device manufacturing method

A substrate heating apparatus having a conductive heater which heats a substrate includes a filament arranged in the conductive heater and connected to a filament power supply to generate thermoelectrons, and an acceleration power supply which accelerates the thermoelectrons between the filament and conductive heater. The filament has inner peripheral portions formed at a predetermined interval along an inner circle concentric with the substrate, outer peripheral portions formed at a predetermined interval on an outer circle concentric with the inner circle and having a diameter larger than that of the inner circle, and a region formed by connecting the end point of each inner peripheral portions and the end point of a corresponding one of the outer peripheral portions.

Substrate heating apparatus, heating method, and semiconductor device manufacturing method

A plasma processing system includes a reactor, a top electrode made of a magnetic or ferromagnetic metal or a metal-alloy, wherein a RF or DC power is applied to generate plasma within the reactor; a gas showerhead fixed to the top electrode; a sheet-like magnetic assembly bound to the upper surface of the gas showerhead, which includes a plurality of separate magnets, a metal sheet made of a ferromagnetic metal, and a deformable film.

Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems

CVD apparatus

A failure determining apparatus for a gas-insulated electrical appliance where the appliance is a cylindrical metal container with a charged conductor, insulating gas, and a plurality of insulating spaces inside for supporting the conductor and partitioning the container. The failure determining apparatus has a high-speed developing sensor which detects a high-speed phenomenon caused by a failure within the gas sections; a first failure determining circuit which determines the presence of a failure from an output of the high-speed developing sensor; a low-speed developing sensor which detects a low-speed phenomenon caused by a failure within the gas sections; a second failure determining circuit which determines the presence of a failure from an output of the low-speed developing sensor; and an arithmetic control circuit which identifies a gas section of the metal container in which a failure occurs from an output of the first and second failure determining circuits.

Failure determining apparatus of gas-insulated electrical appliance

A method of cost-effective printing control for printing a variety of documents or images in color. An operator is notified whether printing is enabled as well as of the residual amounts of two or more printing agents. Printing data, including both character printing and graphics commands, is created for a given object to be printed. The amounts of each printing agent required for a given object is predicted and the object is printing if the quantities of all printing agents exceed their respective predicted amounts. No printing occurs and the printing operator is alerted if the amount of any one printing agent is below the amount predicted for that agent.

Printing control method, printing device, printing control device and storage medium storing printing control program

A method of manufacturing a titanium nitride thin film at the surface of a substrate the chemical vapor deposition method (CVD method) includes supplying trakisdialkylamino titanium (TDAAT and ammonia into a reaction vessel, and heating it a prescribed temperature under a low pressure of less than 100 Pa total pressure, wherein the partial pressure P of the source-material gas is set in a range of 0<P /P <10 with respect to the partial pressure P of the added ammonia gas.

Method for manufacturing a titanium nitride thin film

The present invention is directed to a plasma treating apparatus, for generating plasma in a dielectric container and for treating the surface of a substrate with the plasma generated, which includes a hot air heating system for heating the dielectric container by blowing hot air to a central location on the outside surface of the dielectric container. The present invention is further directed to a plasma treating method for generating plasma in a dielectric container and for treating the surface of a substrate with the plasma generated which includes hot air heating for heating the dielectric container by blowing hot air to the outside surface of the dielectric container to a temperature at which a thin film does not deposit on the inside surface of the dielectric container.

Plasma treating apparatus and plasma treating method

According to the present invention, there is provided a heterodyne interferometer comprising a laser oscilator, a frequency modulator which splits the laser beam into two beams and causes the beams to have different frequencies, a photodetector which composes both beams after at least one beam is reflected or transmitted by an object under test, and produces an interference signal from a composed laser beam, a frequency analyzer which reveals a Doppler frequency component of the interference signal, and an x-axis and y-axis fine movement command circuit and a photodetector positioning mechanism which detects the amplitude of the a.c.(alternating current) component of the interference signal and positions the photodetector so that the amplitude is maximum. The present invention also provides the heterodyne interferometer which, instead of the x-axis and y-axis fine movement command circuit and a photodetector positioning mechanism, comprises a plurality of photodetector disposed in the direction perpendicular to the laser beam axis, a peak value discriminator which discriminates a peak amplitude of the interference signals output by the photodetectors, and a multiplexer which discriminates interference signal having the largest amplitude and transmits this interference to the frequency analyzer. The heterodyne interferometer is capable of obtaining interference signal of a predetermined level irrespective of the surface condition of an object under test at the laser beam focal point.

Heterodyne interferometer

An antifouling paint which containing as a vehicle a copolymer comprising units (a) and (b) ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group, and R.sub.2, R.sub.3, and R.sub.4 each represents an alkyl group having from 1 to 8 carbon atoms or a phenyl group; ##STR2## wherein R.sub.5 and R.sub.6 each represents hydrogen atom or a methyl group, R.sub.7 represents an alkyl group having from 1 to 4 carbon atoms or an acyl group, and n is a positive number from 1 to 30, wherein the total weight of unit (b) per molecule is at least 5 wt %, and said paint further contains from 0 to 80 wt % of a non-polymeric antifouling agent.

Antifouling paint containing polymer of ethylenically unsaturated

Growing community of inventors

Tokyo, Japan

Hiroshi Doi