Nippon Telegraph and Telephone Public Corporation

Daikin Kogyo Co., Ltd.

Hiroshi Asakawa

Hiroshi Inukai

Toshihiko Amano

Osamu Kogure

Tsuneo Fujii

Takayuki Deguchi

Masami Kakuchi

A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.

Fluoroalkyl acrylate resist material and process for forming fine resist

Resist material and process for forming fine resist pattern

Growing community of inventors

Mito, Japan

Hiroshi Asakawa