Hitachi, Ltd.

The University of Texas System

Other

Hitachi-high-technologies Corporation

Hitachi Setsubi Engineering Co., Ltd.

Ricoh Company, Ltd.

Hitachi Systems, Ltd.

Hiroshi Akiyama

Yusuke Vincent Fujii

Masahiko Nakayama

Takeshi Fujita

Yoshitaka Takahashi

Kazuo Hiramoto

Masaki Yanagisawa

Koji Matsuda

Hisataka Fujimaki

Yoshihiko Nagamine

Kohei Kato

Masahiro Tadokoro

Alfred Smith

Rintaro Fujimoto

Wayne David Newhauser

Masumi Umezawa

Toru Umekawa

Shinichiro Fujitaka

Masayuki Kojima

Motohiko Yoshigai

Hiroshi Kawakami

Manabu Seo

Hiroshi Hasegawa

Junichi Yamashita

Kazuo Nojiri

Naoyuki Kofuji

Goichi Akanuma

Takafumi Tokunaga

Go Miya

Hideaki Nishiuchi

Kazuyoshi Saito

Tomonari Morioka

Taisuke Takayanagi

Hideki Fukushima

Shigeru Oouchida

Yukiko Hamano

Hidehito Asano

Tsutomu Yamashita

Yutaka Muramatsu

Wataru Sagawa

Hiroshi Kubo

Mamoru Katane

Tetsuro Norimine

Hideaki Nihongi

Shunji Kakiuchi

Takurou Honda

Masahiro Nagatani

Tadashi Umezawa

Shin Nakamura

Hiroyuki Sadamori

Masanori Gunji

Yusuke Fujii

Arao Nishimura

Ryosuke Shinagawa

Michiori Yoshitake

Ken Iikura

Takahiro Tanae

Yuuji Hosoda

Yoshiyuki Takezawa

Kouhei Satou

Kyouichi Kawasaki

Yoshiyuki Nakamura

Naoki Tadakuma

Kazuo Ichiki

Kunihiko Katou

Tetsuo Norimine

Koji Mtsuda

Akifumi Kawato

Yusuke Fuji

Hideaki Nihonghi

Provided are a contamination inspection method and a contamination inspection device for highly accurately detecting a defect in a wafer, a liquid crystal substrate and media or the like including patterns, for example, a semiconductor device or the like. The first aspect of the present invention is a contamination inspection device comprising: an irradiation optical system for irradiating lights on the inspection target substrate; and a spatial filter for shading diffracted lights form the inspection target substrate. Herein, the spatial filter comprises: a plurality of light shading materials; a control member for changing at least one of parameters selected from a shape, an angle and an interval with respect to the light shading material, and a control unit for controlling the control members.

Contamination inspection method and contamination inspection device

In a particle therapy treatment planning system for creating treatment plan data, the movement of a target (patient's affected area) is extracted from plural tomography images of the target, and the direction of scanning is determined by projecting the extracted movement on a scanning plane scanned by scanning magnets. Irradiation positions are arranged on straight lines parallel with the scanning direction making it possible to calculate a scanning path for causing scanning to be made mainly along the direction of movement of the target. The treatment planning system can thereby realize dose distribution with improved uniformity.

Treatment planning system, device for calculating a scanning path and particle therapy system

The present invention provides, at low cost, a multilayer radiation detector whose position relative to a beam axis can be verified. The radiation detector includes a plurality of sensors that react to radiation and are stacked in parallel inlayers in a traveling direction of the radiation. The sensors are each sectioned into a central region including the center of the sensor and another region surrounding the central region. The radiation detector independently measures signals measured by the central regions and signals measured by the other regions. Thus, the position of the radiation detector can be verified.

Radiation detector and verification technique of positioning accuracy for radiation detector

A charged particle beam reduces treatment time in the uniform scanning or in the conformal layer stacking irradiation. In the uniform scanning, an optimum charged particle beam scan path for uniformly irradiating a collimator aperture area is calculated. In the conformal layer stacking irradiation, an optimum charged particle beam scan path for uniformly irradiating a multi-leaf collimator aperture area of each layer for each of the layers obtained by partitioning the target volume is calculated. Alternatively, a minimum irradiation field size that covers the multi-leaf collimator aperture area of each layer is calculated, and a scan path corresponding to the irradiation field size, prestored in a memory of a particle therapy control apparatus, is selected. The charged particle beam scan path is optimally changed in the lateral directions in conformity with the collimator aperture area in the uniform scanning or in each layer in the conformal layer stacking irradiation.

Treatment planning apparatus and particle therapy system

A charged particle beam irradiation system includes a synchrotron which accelerates an ion beam, an irradiation apparatus for irradiating an object with the ion beam introduced from the synchrotron, detection means for measuring an amount of accumulated charge of the ion beam that orbits in the synchrotron immediately before an extraction control period in an operating cycle of the synchrotron, and beam extraction control means for controlling extraction of the ion beam based on the measurement result of the accumulated beam charge amount so that extraction of a total amount of the ion beam is to be completed with an expiration of an extraction control time, the extraction control time representing a length of the extraction control period of the synchrotron and being set in advance.

Charged particle beam irradiation system and charged particle beam extraction method

The invention provides a plasma processing apparatus for processing a wafer mounted on a sample stage placed in a vacuum processing chamber using a plasma generated in the vacuum chamber. The plasma processing apparatus comprises a plate placed in the vacuum processing vessel above and opposed to the wafer, the plate having a through hole through which a first processing gas is introduced; a first and second cylindrical member arranged vertically and adjacently; and means communicating with the gap between the first and second cylindrical member for supplying a second processing gas. The wafer is processed while the first processing gas and the second processing gas having different compositions are supplied.

Vacuum processing apparatus

A charged particle beam irradiation system and a charged particle beam extraction method which can prevent erroneous irradiation of a charged particle beam in the direction of advance of the charged particle beam. The system and method are featured in stopping supply of an ion beam to one or more of a plurality of angle zones in each of which a target dose is attained, the angle zones being formed by dividing an RMW in a rotating direction thereof, and in allowing the supply of the ion beam to one or more other angle zones in each of which a target dose is not yet attained. The invention can easily adjust beam doses at various positions in an affected part of the patient body in the direction of advance of the ion beam, and can greatly reduce the probability of erroneous irradiation that the beam dose becomes excessive or deficient at the various positions within the affected part of the patient body in the direction of advance of the ion beam.

A control method which quickly adjusts a plasma processing apparatus to a desired pressure regardless of gas type, gas flow rate or target pressure simply by optimizing constants. The plasma processing apparatus includes: gas supply means which supplies processing gas to a low pressure processing chamber; plasma generating means which supplies electromagnetic energy to the processing gas in the low pressure processing chamber and generates plasma; exhaust means which exhausts gas in the low pressure processing chamber; gas pressure measuring means which measures gas pressure in the low pressure processing chamber; exhaust speed adjusting means which adjusts exhaust speed of gas to be exhausted by the exhaust means; and an arithmetic and control unit calculates an exhaust speed to make the gas pressure measured by the pressure measuring means equal to a target value, and controls the exhaust speed adjusting means according to the calculation result.

Pressure control device for low pressure processing chamber

The invention is intended to increase the number of patients treatable using one wheel having a thickness varied in the rotating direction to change energy of an ion beam passing the wheel. Ion beam delivery equipment for irradiating an ion beam to a patient for treatment comprises a beam generator for producing and accelerating the ion beam, an beam delivery nozzle including a range modulation wheel which has a predetermined thickness distribution in the rotating direction and is rotated on a travel passage of the ion beam generated from the beam generator to control a range of the ion beam, and an irradiation controller for controlling the beam producing and accelerating operation of the beam generator in accordance with the phase of rotation of the range modulation wheel.

Ion beam delivery equipment and an ion beam delivery method

Ion beam delivery equipment and ion beam delivery method

A ridge filter or a range modulation wheel (RMW) is formed to have a shape corresponding to an affected part in the patient body. A plurality of spread-out Bragg peaks with the same dose or different doses are formed in the affected part by executing beam-on/off control of the RMW, beam current control with rotation of the RMW, intensity modulation control, or scanning irradiation. As an alternative, a spread-out Bragg peak containing a portion with a different dose is formed. A treatment time is cut.

Charged particle beam extraction system and method

Particle beam irradiation equipment and a method of adjusting irradiation nozzle, which can ensure a long range and high dose uniformity at any field size are provided. The particle beam irradiation equipment comprises charged particle beam generation equipment and an irradiation nozzle for irradiating a charged particle beam extracted from the charged particle beam generation equipment to an irradiation target. The irradiation nozzle comprises a first scatterer device including a first scatterer for spreading out the charged particle beam into a Gaussian-like distribution, and multiple stages of second scatterer devices including second scatterers for producing a uniform intensity distribution of the charged particle beam having been spread out into a Gaussian-like distribution by the first scatterer. For forming irradiation fields having sizes different from each other, the second scatterer devices are disposed downstream of the first scatterer device in the direction of travel of the charged particle beam at the spacing depending on the difference in the field size.

Particle beam irradiation equipment and particle beam irradiation method

A therapy system using an ion beam, which can shorten the time required for positioning a couch (patient). The therapy system using the ion beam comprises a rotating gantry provided with an ion beam delivery unit including an X-ray tube. An X-ray detecting device having a plurality of X-ray detectors can be moved in the direction of a rotation axis of the rotating gantry. A couch on which a patient is lying is moved until a tumor substantially reaches an extension of an ion beam path in the irradiating unit. The X-ray tube is positioned on the ion beam path and the X-ray detecting device is positioned on the extension of the ion beam path. With rotation of the rotating gantry, both the X-ray tube emitting an X-ray and the X-ray detecting device revolve around the patient. The X-ray is emitted to the patient and detected by the X-ray detectors after penetrating the patient. Tomographic information of the patient is formed based on signals outputted from the X-ray detectors. Information for positioning the couch is generated by using the tomographic information.

Ion beam therapy system and its couch positioning method

Growing community of inventors

Hitachiohta, Japan

Hiroshi Akiyama