Screen Holdings Co., Ltd.

Canon Kabushiki Kaisha

Nissan Motor Company Limited

E.i. Dupont De Nemours and Company

Other

Hon Hai Precision Industry Co., Ltd.

Hitachi Maxell, Limited

Tai-sol Electronics Co., Ltd.

Otax Company Limited

Hiroshi Abe

Manabu Okutani

Takashi Ota

Naohiko Yoshihara

Osamu Matsuno

Kenji Kobayashi

Kazuhiko Fukutani

Shuichi Yasuda

Masayuki Otsuji

Nobusuke Toukura

Hiroaki Takahashi

Yukifumi Yoshida

Noriyuki Kikumoto

Hitoshi Nakai

Yasunori Kanematsu

Takeshi Ohno

Hiroshi Narita

Ayumi Kabata

Takaaki Ishizu

Chikara Maeda

Masae Torii

Koichi Suzuki

Kenji Suzuki

Masahiro Arai

Kenichi Nagae

Masahiro Iriyama

Hiroshi Sato

Shuichi Nakamura

Yukio Furukawa

Hiroyuki Itoyama

Takahiro Miura

Ryo Muramoto

Munetoshi Ueno

Masahiko Yuya

Toyohide Hayashi

Ryuichi Nanaumi

Sei Negoro

Yuta Sasaki

Takuji Oishi

Kouichi Kato

Kohtaro Umezawa

Takuro Miyasato

Satoru Fukushima

Takeshi Hirata

Naoki Hiyama

Takatsugu Katayama

Yoshitaka Baba

Naoki Osada

Kenji Ariga

Kazuhito Oka

Kouichi Kuroda

Yoshinori Iwasaki

Wataru Sakai

Tsutomu Osuka

Ken Shiozawa

Yoshiko Nakamura

Hironori Ito

Lien-Wan Lu

Katsuei Higashi

Ryosuke Takahashi

Motomu Kitamura

Yuta Nakagawa

Masato Ueno

Hideki Tsuruga

Yohei Hamaguchi

Toshio Honda

Fumio Andou

Yoshihiro Sato

A substrate processing method includes a liquid film forming step of forming a liquid film, a liquid film heat retaining step of keeping the liquid film warm, a gas phase layer forming step of forming a gas phase layer which holds the processing liquid on a center portion of the liquid film, an opening forming step of forming an opening in the center portion of the liquid film by excluding the processing liquid held by the gas phase layer, a substrate rotating step of rotating the substrate around a rotation axis, and an opening expanding step of expanding the opening, while a state in which the gas phase layer is formed on an inner circumferential edge of the liquid film is maintained, by moving the irradiation region toward a circumferential edge portion of the substrate while the liquid film heat retaining step and the substrate rotating step are performed.

Substrate processing method and substrate processing apparatus

In substrate processing, by supplying a first processing liquid onto an upper surfaceof a substrateheld in a horizontal state, a liquid filmof the first processing liquid which entirely covers the upper surfaceis formed. Further, by heating the substrate, a vapor layerof the first processing liquid is formed between the upper surfaceand the liquid filmof the first processing liquid on the upper surface. Then, by supplying a second processing liquid onto the upper surfaceof the substrate, the liquid filmof the first processing liquid is removed from the upper surface. It is thereby possible to appropriately remove extraneous mattersfrom the upper surfaceof the substrate, which are taken in the liquid filmof the first processing liquid as the vapor layeris formed.

A display control apparatus that performs rendering on volume data generated based on a signal obtained by receiving a photoacoustic wave generated by an object irradiated with light includes a first unit configured to obtain positional information of a surface of the object, a second unit configured to set a region inside the object between a surface located at a first distance from the surface of the object and a surface located at a second distance from the surface of the object as a display region on the basis of the positional information of the surface of the object, and a third unit configured to perform the rendering on the volume data in a manner that the display region and a region except for the display region can be discriminated from each other.

Display control apparatus, display method, and non-transitory storage medium

In a second liquid supply step, a second liquid film and a first liquid film surrounding a side of the second liquid film are formed on an upper surface of a substrate. Then, in a vapor layer formation step, by heating the substrate, a second vapor layer is formed by evaporating the second liquid contacting the upper surface of the substrate, and the second liquid film is held on the second vapor layer. Since the second liquid included in the second liquid film has a high vapor pressure, a height position of a lower surface of the floating second liquid film may be kept high. By blowing a gas to the floating second liquid film, a hole is formed in the second liquid film, and by expanding the hole toward an outer periphery of the substrate, the first liquid and the second liquid are removed outside the substrate.

Substrate processing method and substrate processing device

The present invention provides an image display method with which a structure of an imaging object can be easily understood on the basis of volume data. An image display method according to an aspect of the present invention includes obtaining photoacoustic image data, generating a first photoacoustic image corresponding to a first spatial region on the basis of photoacoustic image data and a second photoacoustic image corresponding to a second spatial region having a different thickness in a viewing direction of rendering from a thickness of the first spatial region and having a spatial region overlapped with the first spatial region on the basis of the photoacoustic image data, and generating and displaying a parallel image in which the first photoacoustic image and the second photoacoustic image are arranged side by side.

Display control apparatus, image display method, and non-transitory computer-readable medium

A substrate treatment apparatus includes: a substrate holding unit; a rotator for rotating the substrate holding unit; a first liquid nozzle for supplying a rinsing liquid; a second liquid nozzle for supplying a low surface tension liquid; a heater; a lifting mechanism for relatively moving up and down the heater between a contact position allowing the heater to be brought into contact with the lower surface of the substrate and a separation position allowing the heater to be separated from the substrate; a gas nozzle provided in an upper surface of the heater to suck the substrate; a suction pump for sucking an atmosphere above the heater through the gas nozzle; a gas supply source for supplying an inert gas toward above the heater through the gas nozzle; and a controller for selectively performing suction of the atmosphere or supply of the inert gas, through the gas nozzle.

Substrate treatment apparatus

An information processing apparatus includes an image data acquisition unit and a template data acquisition unit. The image data acquisition unit acquires a plurality of pieces of image data generated by performing a plurality of ultrasonic wave transmission and reception operations on a subject while changing an ultrasonic wave transmission and reception mode. The template data acquisition unit acquires a plurality of pieces of template data corresponding to the plurality of ultrasonic wave transmission and reception operations, respectively. The similarity information acquisition unit acquires information indicating a similarity between an image value sequence of the plurality of pieces of image data at a target position and a template data sequence of the plurality of pieces of template data at the target position.

Information processing apparatus, information processing method, and storage medium

A substrate processing method includes a first processing liquid supplying step of supplying a first processing liquid to an upper surface of a substrate, a holding-layer forming step of solidifying or curing the first processing liquid to form a particle holding layer on the upper surface of the substrate, a holding-layer removing step of peeling and removing the particle holding layer from the upper surface of the substrate, a liquid film forming step of forming, after removal of the particle holding layer from the substrate, a liquid film of a second processing liquid, a gas phase layer forming step of forming a gas phase layer for holding the liquid film between the upper surface of the substrate and the liquid film, and a liquid film removing step of removing the second processing liquid from the upper surface of the substrate by moving the liquid film on the gas phase layer.

A substrate processing apparatus includes a substrate holding unit which holds and rotates a substrate in a horizontal orientation, a substrate heating unit which has a heating surface which faces the substrate, held by the substrate holding unit, from below and overlaps with an outermost periphery of the substrate in top view, and heats the substrate in a state of contacting a lower surface of the substrate, a transferring unit which transfers the substrate between the substrate holding unit and the substrate heating unit, and a processing fluid supplying unit which supplies a processing fluid toward the substrate held by the substrate holding unit.

Substrate processing apparatus and substrate processing meihod

An apparatus in related art has a problem in a presentation method of data to a user or a usability. A subject information obtaining apparatus includes a plurality of transducer elements that receive acoustic waves generated in a subject irradiated with light from a light source and transduce the acoustic waves into a plurality of reception signals, a processing unit configured to obtain a characteristic distribution indicating a distribution of characteristic information respectively corresponding to a plurality of positions in the subject by using the plurality of reception signals, in which the processing unit outputs image information for displaying a distribution image created by using the characteristic distribution and data indicating a time fluctuation of the characteristic information in a predetermined region of the distribution image within a same screen of a display unit.

Subject information obtaining apparatus, display method, program, and processing apparatus

A substrate processing method includes a processing liquid film forming step of supplying a processing liquid, containing a sublimable substance, to a pattern forming surface of a substrate, to form a processing liquid film on the pattern forming surface, a temperature maintaining step of maintaining a temperature of the processing liquid film, formed on the pattern forming surface, in a temperature range not lower than a melting point of the sublimable substance and lower than a boiling point of the sublimable substance, a film thinning step of thinning the processing liquid film while the temperature of the processing liquid film is in the temperature range, a freezing step of making the processing liquid film, thinned by the film thinning step, freeze on the pattern forming surface after the temperature maintaining step to form a frozen body of the sublimable substance, and a sublimating step of sublimating the frozen body to remove the frozen body from the pattern forming surface.

A substrate processing method includes a liquid film forming step of forming a liquid film of the processing liquid on the upper surface of the substrate; a liquid filling heating step of supplying a heating medium to a space between a heater unit and the substrate to thereby fill the space with the heating medium, and heating the heating medium by the heater unit, an opening defining step of defining an opening in the central region of the liquid film in a state where the substrate is heated in the liquid filling heating step such that the temperature of the substrate is the boiling point of the processing liquid or higher, and an opening enlarging step of enlarging the opening while rotating the base to thereby rotate the substrate. The liquid filling heating step is executed in parallel with the opening enlarging step at least during part of a period of the opening enlarging step.

A substrate processing method includes a first processing liquid supplying step of supplying a first processing liquid to an upper surface of the substrate, a holding layer forming step of solidifying or curing the first processing liquid to form a particle holding layer on the upper surface of the substrate, a holding layer removing step of peeling and removing the particle holding layer from the upper surface of the substrate, a liquid film forming step of forming, after removing the particle holding layer from the substrate, a liquid film of the second processing liquid, a solidifying step of cooling the liquid film to a temperature not more than a melting point of the sublimable substance to make the liquid film solidify on the substrate and form a solid film, and a sublimating step of sublimating and thereby removing the solid film from the substrate.

An image processing apparatus includes an acquisition unit configured to obtain information indicating a discrepancy in the oxygenation index of a blood vessel related to a region of interest based on image data indicating a spatial distribution of an oxygenation index in a subject and information indicating the blood vessel related to the region of interest, and a display control unit configured to display an image on a display unit based on the information indicating the discrepancy in the oxygenation index of the blood vessel related to the region of interest, the image indicating a condition of a tissue included in the region of interest.

Image processing apparatus, image processing method, and non-transitory storage medium

A substrate drying method includes a sublimation-agent-liquid-film placing step of placing a liquid film of a liquid sublimation agent on the front surface of the substrate, a high vapor-pressure liquid supply step of supplying a high vapor-pressure liquid that has vapor pressure higher than the sublimation agent and that does not include water to a rear surface that is a surface on a side opposite to the front surface in the substrate, a vaporizing/cooling step of, after the liquid film of the sublimation agent is placed on the front surface of the substrate, stopping supplying the high vapor-pressure liquid, and, as a result, losing vaporization heat in response to vaporization of the high vapor-pressure liquid, and, as a result, cooling the sublimation agent, and, as a result, solidifying the liquid film of the sublimation agent and a sublimating step of sublimating a sublimation-agent film.

Substrate drying method and substrate processing apparatus

Growing community of inventors

Kyoto, Japan

Hiroshi Abe