Shimadzu Corporation

Hiroomi Goto

Takahiro Mori

Yuzo Nagumo

Rui Kato

Tsunehiro Inoue

Risa Kajiyama

Hirohisa Abe

Takahiro Nishimoto

Eiichi Ozeki

Hiroshi Iwata

Ippei Takeuchi

Yasuko Yoneda

Shigehiko Zoda

Aline Rotzetter

A testing method using a micro flow path device configured for a test liquid containing a specimen to be brought into contact with a drug therein and for a test on an action of the drug on the specimen includes: preparing the micro flow path device including: a plurality of micro flow paths, first and second openings which are disposed at both ends of each of the plurality of micro flow paths and communicate with an outside, a storage unit which is provided in each of the plurality of micro flow paths and stores the drug, and a gas-permeable membrane covering the first opening; applying a fluid pressure higher than an external pressure to the test liquid through the second opening from a syringe pump connected to the second opening to pressure-feed the test liquid to the storage unit; and observing a target region set in the micro flow path.

Micro flow path device, testing method using micro flow path device, and testing apparatus using micro flow path device

A gas-liquid separator according to an embodiment of the present invention separates a mobile phase containing a gas and a liquid into a gas and a liquid. The gas-liquid separator according to the embodiment of the present invention includes an introduction flow channel to which a mobile phase is introduced, and a plurality of discharge flow channels connected to the introduction flow channel. A gas and a liquid are discharged from a discharge port of the discharge flow channel.

Gas-liquid separator and super-critical fluid device

A feedback control apparatus includes: a detector configured to detect an output value based on a controlled object; a P control circuit including a differential amplifier circuit and an analog circuit, the differential amplifier circuit being configured to receive a detection value of the detector and a target value, the analog circuit being configured to output a P control component Vto an output of the differential amplifier circuit; an I control unit configured to output an I control component Vby integrating a deviation of the detection value from the target value by digital processing; and a driver element configured to be driven based on the P control component Vfrom the P control circuit and the I control component Vfrom the I control unit to control the controlled object.

Feedback control apparatus

Provided is a supercritical fluid device equipped with a back pressure regulator for creating a pressurized state in which a mobile phase in a separation/extraction unit of an analysis flow passage is kept in a supercritical fluid state. One end of a pipe is connected to an outlet side of the back pressure regulator, and the other end of the pipe is open to the atmosphere. A heating unit is provided on the pipe, and the heating unit includes a plurality of electrically independent heaters arranged on mutually different portions of the pile along the pipe. A power supply controller is connected to the heaters, and the power supply controller is configured to supply heating power to one or more heaters selected among the plurality of heaters, but to not supply heating power to the other heaters.

Supercritical fluid device

A pressure control valve includes a pressure control block including a bore hole that is bored perpendicularly from one outer surface, and two internal channel openings of whose end portions are at a bottom surface of the bore hole, a valve body having elasticity and covering the bottom surface of the bore hole, a sealing member for pressing a portion of the valve body against the bottom surface of the bore hole, the portion abutting a peripheral edge portion of a portion of the bottom surface where the openings are provided, and an actuator for driving a portion, of the valve body, abutting the portion where the openings are provided in a direction perpendicular to the bottom surface of the bore hole.

Pressure control valve and supercritical fluid chromatograph

A supercritical fluid chromatograph includes a supercritical flow path, a mobile phase supply section for supplying a mobile phase containing liquid carbon dioxide, a sample introduction section, a sample separation section, a detector, and a pressure control valve. A valve post-stage flow path is connected to a fluid outlet of the pressure control valve, and the inside of the valve post-stage flow path is maintained by pressure maintaining means at a pressure by which a mobile phase from the fluid outlet of the pressure control valve is not vaporized.

Supercritical fluid processing device

A system including an index assigning section estimating the thickness of a thin film based on the intensity of light reflected on a substrate and a theoretical formula expressing a relationship between the thickness of the thin film and the intensity of an interference light when the spectrum is obtained for the first time, and assigning indexes for each candidate value for the layer thickness; a layer thickness wide-range estimating section estimating the layer thickness within the range of the value of a layer thickness wide-range estimation width including the previously estimated value of the layer thickness based on the theoretical formula; a selecting section selecting an index from the indexes; a determining section determining a layer thickness wide-range estimation result; and a layer thickness determining section determining the thickness of the thin film based on the theoretical formula after calculating the layer thickness wide-range estimation result.

Surface processing progress monitoring system

A thickness monitoring device capable of performing thickness measurement of an object of measurement in real time even when using a relatively narrow band light source. This etching monitoring device (thickness monitoring device) includes a light source which produces measurement light having a predetermined wavelength bandwidth; an array detector which detects, for each wavelength, interference light of measurement light reflected from mask, whereof the thickness changes over time; and data processing unit which computes the thickness of the mask based on change over time of a plurality of single-wavelength components of the interference light detected by the array detector.

Thickness monitoring device, etching depth monitoring device and thickness monitoring method

A measurement light having a predetermined wavelength bandwidth from a light source is radiated onto the structure to be measured in a specimenlight reflected from a first plane and second plane of the structure to be measured is made to interfere in an optical fiber, and a spectrum of the interference light is generated. This interference light spectrum is acquired by a spectrometric unit at two time points separated in time, and in data processing unit, absolute difference area computation unit determines the absolute difference area of the difference spectrum. This absolute difference area changes periodically each time the dimension of the structure to be measured changes by &#x3bb;/4, making it possible to determine the dimension of the structure to be measured based on that change.

Depth of hole measurement by subtracting area of two spectra separated by time

An etching monitor device capable of high precision measurement in the presence of a mask region capable of producing interference. The device including an interference optical system which acquires reflected interference light containing three interference component signals, which are due respectively to optical path differences of reflected light between three sets of surfaces. The three interference component signals include a first interference based on an optical path between light reflected off of a mask surface and light reflected off of a top surface of the substrate, a second interference based on an optical path between the light reflected off of the top surface of the substrate and light reflected off of a surface to be etched, and a third interference based on an optical path between the light reflected off of the surface to be etched and the light reflected off of the mask surface.

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Kyoto, Japan

Hiroomi Goto