Tokyo Electron Limited

Covalent Materials Corporation

Hiroo Kawasaki

Teruo Iwata

Manabu Amikura

Kentaro Asakura

Kazuo Shibata

A mounting table structure arranged in a processing chamber is provided for mounting a target object to be processed on the upper surface. The mounting table structure is characterized in having a mounting table wherein a heating unit are embedded to heat the target object to perform a specified heat treatment to the target object, and a supporting column which stands on the bottom portion of the processing chamber and supports the mounting table. The mounting table structure is also characterized in that a heat-equalizing member spread in a planar direction is embedded above the heating unit in the mounting table.

Mounting table structure and heat treatment apparatus

To provide a plane heater, including a carbon wire heating element CW, in which surface arrangement density of the heating element CW in an outer area is denser than that in an inner area. A power supply terminal unit having connection wires for supplying electricity to the heating element CW is arranged in the center on the back side of a silica glass plate-like member. Connection wiresandconnected with the heating element CW in the inner area are connected with the heating element in the inner area in the center of the silica glass plate-like member. Connection wiresandconnected with the heating element in the outer area are extended from the center of the silica glass plate-like member toward the outer area and connected with the heating element CW in the outer area, without intersecting the heating element CW in the inner area.

Plane heater

A thermal processing system has a processing vessel, a support poststood on the bottom wall of the processing vessel, and a support tableinternally provided with a heating meansand supported on the support post. A workpiece W is placed on the upper surface of the support tableand is subjected to a predetermined thermal process. The upper, the side and the lower surface of the support tableare covered with heat-resistant covering membersandto prevent the thermal diffusion of metal atoms causative of contamination from the support table. thus, various types of contamination, such as metal and organic contamination, can be prevented.

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Nirasaki, Japan

Hiroo Kawasaki