Canon Kabushiki Kaisha

Hironori Maeda

Ken Minoda

Kazuhiko Mishima

Seiya Miura

Yoshihiro Shiode

Shinichi Egashira

Toshiki Iwai

Hironobu Fujishima

Ryo Takai

Kazuki Ota

Masaharu Kajitani

Masakatsu Yanagisawa

A detection apparatus including a plurality of detection systems arranged spaced apart from each other so as to detect, of a plurality of marks provided on an object held by a stage, marks different from each other, and a processing unit configured to perform a first process of obtaining a first detection value by detecting the plurality of marks by one or more detection systems in a first state in which the stage is arranged at a first rotation angle, and a second process of obtaining a second detection value by detecting the plurality of marks by two or more detection systems in a second state in which the stage is arranged at a second rotation angle, and obtain a difference between the first detection value and the second detection value for each of the plurality of marks.

Detection apparatus, detection method, exposure apparatus and article manufacturing method

A method for detecting a mark using a detection apparatus including a detection unit includes performing a first movement process that moves the detection unit to a first position, performing a second movement process that moves the detection unit to a second position, detecting the mark after the first movement process and the second movement process, and correcting a measurement value of the detected mark using first information about a movement of the detection unit in the first movement process and second information about a movement of the detection unit in the second movement process.

Detection method, detection apparatus, lithography apparatus, and article manufacturing method

A detection apparatus detects an orientation reference of an object to be detected which includes an edge including the orientation reference. The apparatus includes a first detection system configured to detect the edge such that the orientation reference is detected, and a second detection system configured to detect, by projecting a pattern to a surface of the object and detecting an image formed by reflected light from the surface, a position of the surface in a direction perpendicular to the surface. After a focusing operation of the first detection system is performed based on the position of the surface detected by the second detection system, the first detection system detects the orientation reference.

Detection apparatus, exposure apparatus, and article manufacturing method

Position detection apparatus includes illumination optical system for illuminating target, detection optical system for forming image of the illuminated target illuminated on photoelectric converter, first array having first aperture stops, second array having second aperture stops, first driving mechanism for arranging the selected first aperture stop on pupil of the illumination optical system by driving the first array such that first aperture stop crossing optical axis of the illumination optical system moves in first direction, second driving mechanism for arranging the selected second aperture stop on pupil of the detection optical system by driving the second array such that second aperture stop crossing optical axis of the detection optical system moves in second direction. The first and second driving mechanisms fine-tune positions of the selected first and second aperture stops in the first and second directions, respectively.

Position detection apparatus, exposure apparatus, and article manufacturing method

The present invention provides a measurement apparatus that measures a position of an object, including an illumination system configured to illuminate the object with illumination light, an image forming system configured to form, on a photoelectric conversion device configured to detect an image of the object, an image of detected light from the object, and a separation system including a reflective polarizer and a &#x3bb;/4 plate arranged between the illumination system and the image forming system, and configured to separate the illumination light and the detected light via the reflective polarizer and the &#x3bb;/4 plate, wherein the separation system includes at least one optical member arranged between the reflective polarizer and the &#x3bb;/4 plate, and each of the illumination system and the image forming system includes a transmission polarizer.

Measurement apparatus, exposure apparatus, and method of manufacturing article

The present invention provides a measurement apparatus including a first filter unit including a plurality of first filters, and each configured to allow light having a different wavelength band to pass, a second filter unit including a plurality of second filters, and each configured to reduce light intensity of light and allow the light to pass, an obtaining unit configured to obtain data representing a transmittance of each of the plurality of second filters for a wavelength band of light having passed through each of the plurality of first filters, and a selection unit configured to select, based on the data obtained by the obtaining unit, from the plurality of second filters, one second filter arranged on an optical path together with one first filter among the plurality of first filters.

The present invention provides a lithography apparatus including a sensor configured to detect each of an image of a first mark on a first surface of a substrate and a second mark on a second surface opposite to the first surface, and a processor configured to perform processing of deciding a measurement focus position at which the sensor can detect both the image of the first mark and the image of the second mark based on first mark detection information obtained in a focus state of the optical system in which the sensor can detect the image of the first mark, and second mark detection information obtained in a focus state in which the sensor can detect the image of the second mark.

Lithography apparatus, and method of manufacturing article

The present invention provides a detection apparatus which causes light to be incident obliquely on a substrate including a plurality of layers whose refractive indices are different from each other and detects a height of the substrate using light reflected from the substrate, the apparatus comprising an optical system including a polarizer for reducing s-polarized light and configured to cause light, in which s-polarized light has been reduced by the polarizer, to be incident on the substrate at an angle of incidence within a range of 40&#xb0; to 55&#xb0;.

Detection apparatus, measurement apparatus, lithography apparatus, and method of manufacturing article

An imprint lithography apparatus uses a mold having a pattern formed thereon and transfers the pattern to an imprint material fed to a substrate. The apparatus includes a light-receiving element; a detection system that irradiates a mark formed on the substrate and a mark formed on the mold with light which is reflected therefrom, and guides the light reflected from the mark formed on the substrate and from the mark formed on the mold to the light-receiving element; a relay optical system that causes the light reflected to focus between the mold and the detection system; an illumination system that emits illumination light for curing the imprint material; an optical element having a surface that transmits one of the illumination light and the light from the detection system and reflects the other; and a plate-shaped optical member that corrects aberration of the relay optical system.

Imprint lithography apparatus and device manufacturing method therefor

An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element.

Imprint apparatus, imprint method, and device manufacturing method

A position detector (), configured to detect a position of a mark on an object to be detected, comprises an image pickup unit (), an optical system, a noise obtaining unit () and a correction unit (). The image pickup unit picks up an image of the object to be detected. The optical system forms an image of the object to be detected on an image pickup surface of the image pickup unit. The noise obtaining unit obtains noise information by picking up an image of a region other than the mark using the optical system and the image pickup unit in accordance with the result of adjustment of an optical member included in the optical system. The correction unit corrects, using the noise information obtained by the noise obtaining unit, the image of the mark obtained using the optical system and the image pickup unit.

Position detector, position detection method, exposure apparatus, and method of manufacturing device

The imprint apparatus of the present invention molds an uncured resin on a substrate using a mold to form a resin pattern on the substrate. The apparatus includes a measuring device configured to project a light onto the mold, to receive a light scattered by the mold, and to measure the scattered light; and a controller. The controller is configured to store a reference signal, to cause the measuring device to measure the mold to obtain a measurement signal, and to obtain an index indicating a discrepancy between the measurement signal and the reference signal.

Imprint apparatus and article manufacturing method

A detection apparatus, which detects a mark formed on a lower surface of a target object, includes: a first detector which illuminates the mark from an upper surface side of the target object to detect an image of the illuminated mark; a second detector which detects an upper surface position of the target object; and a processor which obtains information indicating a focus position to focus on the mark in the first detector, based on the upper surface position detected by the second detector.

Exposure apparatus with detection apparatus for detection of upper and lower surface marks, and device manufacturing method

A detection device that detects a mark provided on the back side of an object, the detection device includes a first detection unit configured to detect the mark from a surface side of the object; a second detection unit configured to detect a surface position of the object; and a processing unit. The processing unit determines a thickness of the object based on a difference between a first focus position acquired with reference to the position of the mark detected by the first detection unit and a second focus position acquired with reference to the surface position detected by the second detection unit.

Detection device, exposure apparatus, and device manufacturing method using same

The present invention provides a detection apparatus which detects an object to be detected, the apparatus including an illumination system configured to illuminate the object with light containing a first wavelength range and a second wavelength range different from the first wavelength range, a detector configured to detect light from the object illuminated by the illumination system, and an optical member configured to set a transmittance for light in the first wavelength range and a transmittance for light in the second wavelength range to be different from each other, thereby reducing a difference between an intensity value of the light which has the first wavelength range and is detected by the detector and an intensity value of the light which has the second wavelength range and is detected by the detector.

Detection apparatus, exposure apparatus, device fabrication method and filter to reduce a difference between detected intensity values of lights having different wavelength ranges

Growing community of inventors

Utsunomiya, Japan

Hironori Maeda