Hitachi, Ltd.

Hitachi Plant Mechanics Co., Ltd.

Hironobu Ueda

Jun Yoshida

Takeshi Harada

Toshio Hatada

Norio Nakazato

Yutaka Kakehi

Makoto Nawata

Yoshifumi Kunugi

Fumio Shibata

Kyoji Kohno

Tomihisa Oouchi

Katsuaki Nagatomo

Yutaka Omoto

Ryoji Fukuyama

Shinichirou Kawane

Tamio Shimizu

Munenori Kawamura

Sigeo Sugimoto

[Problem] To present a solar heat collecting device capable of enhancing the heat collecting efficiency by effectively utilizing the sunlight entering an area near the end part of the reflector at the opposite side of the direction of location of the sun. [Solving Means] In the solar heat collecting device for collecting the reflected light of sunlight Sb, Sbentering a trough type reflectorhaving a parabolic section to a heat collecting pipeerected at a position of focus of the reflector, and transmitting energy to a heat medium passing inside of the heat collecting pipe, the solar heat collecting device is installed so that central axis Lof the reflectormay be directed along the north-south axis, and a plane reflectoris disposed orthogonally to central axis L, at the end part of the reflectorat the opposite side of the direction of location of the sun.

Solar heat collecting device

Louver segments of a heat transfer fin each have a longitudinal central portion disposed at the center of the louver segment in a direction crossing the flow of a fluid and longitudinal end portions each disposed on either side of the longitudinal central portion and sectioned into parts. Each louver segment has a configuration such that an area of the longitudinal central portion projected in the direction of the flow of the fluid is larger than an area of each of the longitudinal end portions projected in the direction of the flow of the fluid, with respect to the same width of the passage of the fluid.

Heat transfer fins and heat exchanger

The present invention relates to a plasma processor, and the plasma processor comprises a processing chamber, means to reduce a pressure in the processing chamber so as to evacuate the interior thereof, means to introduce a processing gas into the processing chamber, means to generate an electric field within the processing chamber, and means to establish a magnetic field orthogonal to the electric field, this means being rotatable relative to a surface to-be-processed of a sample which is processed in a plasma arising under the action of the electric field and the magnetic field, whereby a space required for the movement of the means to establish the magnetic field orthogonal to the electric field can be reduced to miniaturize the processor, and the uniform processing of the sample can be attained using rotatable plasma.

Plasma processor

Growing community of inventors

Tokyo, Japan

Hironobu Ueda