Dai Nippon Printing Co., Ltd.

Toagosei Company, Ltd.

Toagosei Chemical Industry, Co., Ltd.

Hiromu Taguchi

Shinji Hayashi

Shunsuke Sega

Mitsutaka Hasegawa

Kanemasa Takashima

Takeshi Endo

Hiroyuki Kato

Eiichi Okazaki

Kiyokazu Mizutani

Keiji Maeda

Masatoshi Morita

Tatsuya Kanie

Kouji Ishikawa

Takashi Ihara

Disclosed is a method for producing chloropolysilane by which the yield of a fluid reaction to produce the chloropolysilane is improved while blockage in a reactor caused by attachment of higher-order silicon chloride as a by-product is prevented. In producing the chloropolysilane by reacting fluidized silicon particles or silicon alloy particles with a chlorine gas, an outlet filter is provided, upstream from a product outlet that releases a reaction product, above the area in which the silicon particles or silicon alloy particles are fluidized inside a reaction tank. The outlet filter prevents fine particles blown up by fluidization from flowing out of the reaction tank through the product outlet. A temperature of the outlet filter is set in a range of 210 to 350&#xb0; C.

Method for producing chloropolysilane and fluidized-bed reactor

A chlorination reaction can be carried out at a relatively low temperature by heating a mixture of granular metallic silicon and metallic copper or a copper compound in an inert atmosphere even when the metallic silicon has a high purity and does not contain aluminum and titanium and that chloropolysilane of high purity can be obtained by further adding metallic silicon as needed after the chlorination reaction is started.

Manufacturing method of high-purity chloropolysilane

A developing solution is disclosed with which it is possible to develop a photoresist disposed on a substrate including a conductive polymer. Also disclosed is a method for forming a resist pattern using the developing solution. The developing solution contains one or more acids and/or salts thereof, the acids being selected from inorganic acids, amino acids having an isoelectric point less than 7, and carboxylic acids having two or more carboxy groups. Use of this developing solution hence inhibits the phenomenon in which a substrate including a conductive polymer suffers an increase in surface resistivity due to a developing solution, and makes it possible to obtain a fine resist pattern.

Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern

There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.

Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel

There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (b) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.

Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel

Provided are a curable resin and a curable resin composition which have alkali-solubility and curability that can freely be adjusted and a high sensitivity, a liquid crystal panel substrate which can maintain an even cell gap, and a liquid crystal panel using the liquid crystal panel substrate to exhibit a superior display quality. A curable resin composition comprising an imide-containing copolymer having a molecular structure wherein a constitutional unit at least the following units are connected: a constitutional unit having a cyclic imide group represented by the formula (1), a constitutional unit having an acid functional group such as a carboxyl group; and a constitutional unit having a photopolymerizing functional group. In a liquid crystal panel substrate (color filter), plural spacers (column-shaped spacers) are disposed in a non-display region on a substrate

Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel

A process for producing spiro-orthocarbonate having glycol unit (2) is described, which comprises reacting a spiro-orthocarbonate having glycol unit (1) which is different from glycol unit (2), with a glycol having glycol unit (2) to release a glycol having glycol unit (1).

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Nagoya, Japan

Hiromu Taguchi