Sumitomo Chemical Company, Limited

Sumitomo Chemical Companylimited

Hiromu Sakamoto

Koji Ichikawa

Takashi Hiraoka

Masako Sugihara

Yuichi Mukai

Satoshi Yamaguchi

Ichiki Takemoto

Takashi Nishimura

Yukako Harada

Shingo Fujita

Takahiro Yasue

Mutsuko Higo

A photoresist composition comprising: a resin which has a structural unit represented by formula (I): wherein Rrepresents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and Rrepresents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin; an acid generator; and a solvent.

Photoresist composition

A resin comprising a structural unit represented by formula (I0): 

Compound, resin and photoresist composition

A salt represented by formula (I): wherein Rand Rindependently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group,Xrepresents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, andArepresents an organic anion.

Salt and photoresist composition containing the same

A salt represented by formula (I): wherein Qand Qindependently represent a fluorine atom or a Cto Cperfluoroalkyl group, Rand Reach independently represent a hydrogen atom, a fluorine atom or a Cto Cperfluoroalkyl group, z represents an integer of 0 to 6, Rrepresents a hydrogen atom, a fluorine atom, a Cto Calkyl group or a Cto Cfluorinated alkyl group, Rrepresents a Cto Cfluorinated alkyl group, Lrepresents a single bond, a Cto Cdivalent saturated hydrocarbon group, etc., Rrepresents a hydrogen atom, a halogen atom or a Cto Calkyl group that may have a halogen atom, Lrepresents a group represented by formula (b1-1), etc., * represents a bonding site to &#x2014;CRR; Land Leach independently represent a single bond or a Cto Cdivalent saturated hydrocarbon group; Zrepresents an organic cation.

Salt, resin, resist composition and method for producing resist pattern

A photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (1):  

Salt, acid generator, photoresist composition, and method for producing photoresist pattern

A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, 

Resist composition and method for producing resist pattern

The present invention is a salt represented by the formula (I) wherein Rand Rindependently represent a fluorine atom or a Cto Cperfluoroalkyl group; Lrepresents a Cto Cdivalent saturated hydrocarbon group, a &#x2014;CH&#x2014; contained in the saturated hydrocarbon group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;; ring Wrepresents a Cto Cheterocycle; Rrepresents a hydrogen atom or a Cto Chydrocarbon group, a &#x2014;CH&#x2014; contained in the hydrocarbon group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;; Rin each occurrence independently represent a Cto Chydrocarbon group, a &#x2014;CH&#x2014; contained in the hydrocarbon group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;; m represents an integer of 0 to 6; and Zrepresents an organic cation.

Salt, acid generator and resist composition

A resin comprising a structural unit represented by formula (aa): 

A salt represented by the formula (I): wherein Rand Reach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Xrepresents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, Rrepresents a group having a cyclic ether structure, and Zrepresents an organic cation.

The present invention provides a salt represented by the formula (I): wherein Rand Reach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Xrepresents a C1-C17 divalent saturated hydrocarbon group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014; and which can have one or more fluorine atoms, Rrepresents a hydrogen atom or a methyl group, and Zrepresents an organic counter cation, and a photoresist composition containing the same.

Salt and photoresist composition comprising the same

A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) at least one compound selected from the group consisting of a compound represented by the formula (II1) and a compound represented by the formula (II2), 

A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), 

The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R, X, R, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.

The present invention provides a photoresist composition comprising a salt represented by the formula (I):  wherein Rand Rindependently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, Xrepresents a C1-C17 divalent saturated hydrocarbon group, etc., s1 represents 1 or 2, and t1 represents 0 or 1, with proviso that sum of s1 and t1 is 1 or 2, Rrepresents a C1-C12 saturated hydrocarbon group, etc., u1 represents an integer of 0 to 8, and (Z)represents an organic cation, a salt represented by the formula (II-0):  wherein Rrepresents a C1-C24 hydrocarbon group etc., Xrepresents a C1-C6 alkanediyl group etc., and (Z)represents an organic cation, and a resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

Growing community of inventors

Osaka, Japan

Hiromu Sakamoto