Sumitomo Chemical Company, Limited

Hiromu Nakamura

Koji Ichikawa

Tatsuro Masuyama

A resist composition includes (A1) a resin including a structural unit represented by formula (I) and a structural unit represented by formula (II), and no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein Rand Reach represent a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom, Xand Xeach represent a single bond or *—CO—O—, Lrepresents a single bond or a hydrocarbon group which may have a substituent, and —CH— included in the group may be replaced by —O—, —S—, —SO— or —CO—, ring W represents a hydrocarbon ring which may have a substituent, mi and mk represent an integer of 1 to 4, and Lrepresents a single bond or a hydrocarbon group which may have a substituent, and —CH— included in the group may be replaced by —O—, —S—, —SO— or —CO—.

Resist composition and method for producing resist pattern

A compound represented by the formula (I): wherein the values of R, R, R, Ar and Xin formula (I) are defined in the specification.

Growing community of inventors

Osaka, Japan

Hiromu Nakamura