Sumitomo Electric Industries, Limited

Tokyo Tungsten Co., Ltd.

Director-general of Agency of Industrial Science and Technology

Hiromu Kawai

Yasuhiro Katoh

Hisanori Ohara

Shigehiko Takaoka

Hideo Itozaki

Nobuhiko Fujita

Shosaku Yamanaka

Hajime Hitotsuyanagi

Akira Doi

A heat transfer insulated part including a heat transfer substrate formed of a sintered metal of Cu-W or Cu-Mo, an insulating ceramic layer for electrically insulating the heat transfer substrate, formed of ceramic such as Al.sub.2 O.sub.3, SiO.sub.2 and Si.sub.3 N.sub.4, and a barrier layer provided between the heat transfer substrate and an insulating ceramic layer composed of at least either one of metal layers of W and Mo. Furthermore, preferably, an intermediate layer composed of titanium carbide and/or titanium nitride and so forth for enhancing the adhesive property between the insulating ceramic layer and the barrier layer is provided.

Heat transfer insulated parts and manufacturing method thereof

A method for manufacturing a rotary anode for use in an X-ray tube is proposed. The method has the step of forming, on a graphite substrate plate, an intermediate layer of rhenium by subjecting a metallic chloride to the thermal decomposition CVD process at a substrate temperature of 1200.degree. C. or more. The method further has the step of forming, on the intermediate layer, an X-ray generating layer of tungsten or tungsten-rhenium alloy by subjecting a metallic fluoride to the hydrogen reduction thermal CVD process.

Method for manufacturing a rotary anode for X-ray tube

A rotary anode for use in an X-ray tube has a graphite substrate plate, an intermediate layer made of a metal that does not react with graphite, and an X-ray generating layer provided on the intermediate layer for generating X-rays when electron impact is applied. The intermediate layer is a rhenium film having an equiaxed grain structure. A method for manufacturing such a rotary anode is proposed. The method has the step of forming, on a graphite substrate plate, an intermediate layer of rhenium by subjecting a metallic chloride to the thermal decomposition CVD process at a substrate temperature of 1200.degree. C. or more. The method further has the step of forming, on the intermediate layer, an X-ray generating layer of tungsten or tungsten-rhenium alloy by subjecting a metallic fluoride to the hydrogen reduction thermal CVD process.

Rotary anode for X-ray tube and method for manufacturing the same

A multicomponent amorphous silicon film suitable for a solar cell is produced at a higher deposition rate by a novel process comprising using jointly a sputtering method and a plasma CVD method within a pressure range of not lower than a pressure at which the maximum film formation rate is given in the sputtering method.

Process for the production of a multicomponent thin film

Growing community of inventors

Itami, Japan

Hiromu Kawai