Hitachi, Ltd.

Hitachi Global Storage Technologies Japan, Ltd.

Hiatchi, Ltd.

Hiromu Chiba

Hirotaka Imayama

Yasuo Hira

Nobuo Suzuki

Masayasu Fujisawa

Noriyuki Saiki

Eisei Togawa

Kiyoshi Akamatsu

Hiroshi Agari

Atsuko Okawa

Saburou Suzuki

Toshio Tamura

Hideaki Tanaka

Kenji Furusawa

Shinji Sasaki

Hiroshi Inaba

Takateru Seki

Nobuto Yasui

Akio Takakura

Yuji Ochiai

Toshio Takahashi

Minoru Yamasaka

Xudong Yang

Since structural portions of a device made of a plurality of materials are different from one another in mechanical hardness, it is very difficult to uniformly lap the structural portions. This is attributable to generation of machining recessions due to differences in lapped amount when large fixed abrasive grains are used, and generation of lapping marks caused by that the dropped abrasive grains rotate. Accordingly, in order to cope with the disadvantage, it is essential to surely grip abrasive grains of small size to a surface of a surface plate. [Solving Means]Abrasive grains are fixedly forced into a surface of a lapping tool with mechanical pressure and then the surface of the lapping tool including the abrasive grains is subjected to plasma processing, whereby an improvement in adhesion between the abrasive grains and a surface plate and reduction in the number of loose abrasive grains, which are dropped from the surface of the lapping tool, can be achieved, so that it is possible to realize lapping, in which a surface of a device made of a plurality of materials is made very plane.

Lapping tool and method for manufacturing the same

An L-shaped slide plate mounted with a workpiece holding device on a slide guide is firmly attached to an angle adjustment mechanism, and a reciprocating motion drive unit mounted with the angle adjustment mechanism on a slider table is firmly attached to a bridge so that an angle between a surface of a workpiece to be lapped and a surface of a lapping plate is kept substantially constant, and also the bridge is disposed so as to stride the lapping plate. Thereby, in a state of row bar in which a plurality of magnetic head sliders run in a line, an air bearing surface of magnetic head can be lapped with high accuracy with an element recession being decreased and an occurrence of a scratch being restrained.

Method of manufacturing magnetic head

A magnetic head slider including a plurality of rails adapted to face a magnetic disk. Each of the rails has a longitudinal extension direction substantially in a direction of rotation of the magnetic disk, and a protective film is provided on a floating surface of at least one of the rails. A thickness of the protective film at least in a direction transverse to the longitudinal extension direction of the at least one of the rails is not uniform in the transverse direction.

Magnetic head and magnetic head manufacturing method

A magnetic head is formed of materials having different hardnesses. The head includes a base coat formed on a substrate having a high hardness, for example alumina titanium carbide, upon which a base coat, for example alumina, is formed. The base coat typically had a thickness in the range of 0.05 to 0.5 &mgr;m. This structure provides an improved flying height for heads manufactured using a lapping process.

Thin film magnetic head with base coat and small pole-tip recess

A method of manufacturing a magnetic head slider for a magnetic head and the magnetic slider wherein the slider has non-linear rails formed in a floating surface thereof by processing including one of reactive ion etching, sputter etching and an ion milling, and side walls of the non-linear rails are polished after formation of the non-linear rails by the processing.

For removing re-deposited particulates produced during an etching process of a magnetic head slider and forming a minute chamfered portion, a polishing process is carried out by using polishing cloth such as non-woven polyester fabric after having formed rails of non-linear shape on a floating surface by the etching process. Thus, the re-deposited particulates produced during the etching process are removed, whereby the reliability of the floating characteristic of magnetic head is improved.

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Yokohama, Japan

Hiromu Chiba