Konica Corporation

Konica Minolta, Inc.

Merck Patent Gmbh

Konica-minolta Holdings, Inc.

Hiromoto Ii

Noriyuki Kokeguchi

Hiroyuki Hoshino

Sadayasu Ishikawa

Yasuo Miyata

Kiyoshi Oishi

Taketo Namikawa

Kenichi Tabata

Yuta Nakamura

Makoto Honda

Satoshi Ito

Katsuhiko Suzuki

Kazuhiro Fukuda

Yoshihiko Suda

Chikao Mamiya

Takakazu Kiyomura

Toshio Tsuji

Issei Suzuki

Rieko Ren

Hiromichi Mizukami

A luminescent film includes a host compound, a blue phosphorescent compound, and a blue fluorescent compound, in which an emission spectrum of the blue phosphorescent compound and an absorption spectrum of the blue fluorescent compound have portions overlapping with each other; shortest wavelength-side maximum emission wavelengths of the blue phosphorescent compound (abbreviated as 'BPM' in the expression) and the blue fluorescent compound (abbreviated as “BFM” in the expression) satisfy the following expression (1): λ≥λ: expression (1) in which λrepresents the shortest wavelength-side maximum emission wavelength of the blue fluorescent compound and λrepresents the shortest wavelength-side maximum emission wavelength of the blue phosphorescent compound; and light emission derived from the blue fluorescent compound is detected.

Luminescent film, organic electroluminescent element, organic material composition and method for producing organic electroluminescent element

A luminescent film includes a host compound, a blue phosphorescent compound, and a blue fluorescent compound, in which an emission spectrum of the blue phosphorescent compound and an absorption spectrum of the blue fluorescent compound have portions overlapping with each other; shortest wavelength-side maximum emission wavelengths of the blue phosphorescent compound (abbreviated as 'BPM' in the expression) and the blue fluorescent compound (abbreviated as 'BFM' in the expression) satisfy the following expression (1): &#x3bb;&#x2265;&#x3bb;: expression (1) in which &#x3bb;represents the shortest wavelength-side maximum emission wavelength of the blue fluorescent compound and &#x3bb;represents the shortest wavelength-side maximum emission wavelength of the blue phosphorescent compound; and light emission derived from the blue fluorescent compound is detected.

An organic electroluminescent element contains, on a base, at least a pair of electrodes that are arranged so as to face each other and a group of organic function layers including a light emitting layer, the group of organic function layers being held between the pair of electrodes. The base is a resin base having a thickness within the range of 3-50 &#x3bc;m, and the resin base-side electrode is a transparent positive electrode that is mainly composed of silver and has a thickness within the range of 2-20 nm.

Organic electroluminescent element and method for manufacturing same

An organic electroluminescent element provided with a gas barrier film includes a pair of electrodes and an organic functional layer having at least one light-emitting layer between the electrodes. The gas barrier film includes a base material; a vapor deposition layer that is of a surface-treated silicon compound including at least one element selected from carbon (C), nitrogen (N), and oxygen (O), and has a continuous change in composition from a surface toward a direction of thickness; and a polysilazane modified layer.

Gas barrier film, method for producing gas barrier film, and organic electroluminescent element

The present invention provides a gas barrier film having high barrier properties, folding/bending resistance and smoothness and excellent cutting suitability, and also provides an organic photoelectric conversion element equipped with the gas barrier film. The gas barrier film is characterized by having a gas barrier layer unit () on a side face of at least one surface of a base material (), wherein the gas barrier layer unit () comprises a first barrier layer () formed by a chemical vapor deposition method and a second barrier layer () formed by applying a silicon compound onto the first barrier layer () to form a coating film and modifying the coating film, and wherein the second barrier layer () has an unmodified region (B) on a side facing the base material and a modified region (A) on a side facing the front layer of the film.

Gas barrier film, process for production of gas barrier film, and electronic device

A method for forming a film comprising a first process and a second process, the first process comprising the steps of: supplying a discharge gas to a first discharge space where high frequency electric field A is generated at or near atmospheric pressure, whereby the discharge gas is excite; transferring energy of the excited discharge gas to a film forming gas, whereby the film forming gas is excited; and exposing a substrate to the film forming gas to form a film on the substrate, and the second process comprising the steps of: supplying a gas containing an oxidizing gas to a second discharge space where high frequency electric field B is generated at or near atmospheric pressure, whereby the gas containing the oxidizing gas is excite; and the film formed in the first process is exposed to the excited gas containing the oxidizing gas.

Method for forming thin film and base and having thin film formed by such method

A color image forming method is disclosed, comprising exposing a silver halide color photographic material and developing the exposed photographic material at 43 to 180&deg; C. to form a color image, wherein at least one light-sensitive layer comprising a silver halide emulsion comprising tabular silver halide grains having an average aspect ratio of at least 8. There is also disclosed a digital image forming process, wherein image recording information of the photographic material which was formed by use of the color image forming method is coverted to digital image information through an image sensor.

Color image forming method and digital image forming method

A color image forming method is disclosed, comprising exposing a silver halide color photographic material and developing the exposed photographic material at 43 to 180&deg; C. to form a color image, wherein when the photographic material is exposed so that the light-sensitive layer has a transmission density of a minimum density plus 0.1, the light-sensitive layer comprises dye-clouds having an average diameter of 3.0 to 20.0 &mgr;m. There is also disclosed a digital image forming process, wherein image recording information of the photographic material which was formed by use of the color image forming method is converted to digital image information through an image sensor.

Color imaging forming method and digital image forming method

An image formation process is disclosed, comprising overlapping an imagewise exposed silver halide photographic material onto a processing element with an aqueous medium being present between the photographic material and the processing element to perform development, thereby forming an image in the photographic material, wherein the aqueous medium contains at least a color developing agent or a precursor thereof, and the aqueous medium having a viscosity of 10.0 to 15000 cp at 25&deg; C.

Image forming process

A silver halide emulsion is disclosed, comprising tabular grains having an aspect ratio of 5 or more, the tabular grains further having dislocation lines of 30 or more per a grain, in a fringe portion of the grain and the tabular grains each containing silver iodide, the content of which gradually and continuously varies in the direction of from the grain center to the edge.

Silver halide emulsion

A silver halide emulsion is disclosed, comprising silver halide grains having a variation coefficient of a grain diameter of 20% or less, at least 50% of total grain projected area being accounted for by tabular silver halide grains having an aspect ratio of 2 or more, said tabular grains each having 10 or more dislocation lines per grain in the peripheral region of the grain and having a variation coefficient of dislocation line length of 20% or less. A color photographic material by use of the emulsion is also disclosed.

Growing community of inventors

Tokyo, Japan

Hiromoto Ii