Nitto-Denko Corporation

Hiromoto Haruta

Kozo Nakamura

Hiroyuki Takemoto

Daisuke Hattori

Nao Murakami

Kazuki Uwada

Shusaku Shibata

Shuichi Wakaki

Tsuyoshi Inoue

Osamu Kondo

Hiroshi Yamazaki

Hisashi Tsuda

Masami Inoue

Kazuhito Okumura

Hirokazu Matsuda

Hajime Nishio

Taiki Sueyoshi

Takahiro Takano

Yuka Sekiguchi

Masato Yamagata

Seong Jin Ryu

Yoko Muraoka

Kenjiro Niimi

The present invention is intended to provide a laminated film including a void-provided layer achieving both a high proportion of void space and a high film strength. The laminated film of the present invention includes a void-provided layerand a resin film, the void-provided layerbeing stacked on the resin film. The laminated film is produced by a production method, including steps of forming a void-provided structure', which is a precursor of the void-provided layeron the resin film; and causing a crosslinking reaction in the precursor&#x2032; after the precursor forming step. The precursor&#x2032; contains a substance that generates a basic substance by light irradiation or heating, the basic substance is not generated in the precursor forming step, the basic substance is generated by light irradiation or heating in the crosslinking reaction step, and the crosslinking reaction step has multiple stages.

Laminated film, optical element, and image display

A film is provided with void spaces having a porous structure with less cracks and a high proportion of void space as well as having strength. The film with void spaces includes one kind or two or more kinds of structural units that form a structure with minute void spaces, wherein the structural units are chemically bonded through catalysis. For example, the abrasion resistance measured with BEMCOT&#xae; is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The film with void spaces can be produced by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products.

Film with void spaces bonded through catalysis and method of producing the same

The present invention provides a new member having a low refractive index as a substitute for an air layer, for example. The laminated film roll of the present invention includes a long laminated film roll including: an ultra-low refractive index layer having a refractive index of 1.20 or less; and a resin film, wherein the ultra-low refractive index layer is stacked on the resin film. The method of forming the long laminated film roll of the present invention includes steps of: preparing a liquid containing microporous particles; coating a resin film with the liquid; and drying the liquid applied on the resin film, for example.

Laminated film roll and method of producing the same

The present invention is intended to provide an optical laminate that achieves a superior film strength and a property that a void-provided layer and a pressure-sensitive adhesive/adhesive layer are not easily peeled from each other. The optical laminate of the present invention includes: a void-provided layer; an intermediate layer; and a pressure-sensitive adhesive/adhesive layer, wherein the void-provided layer, the intermediate layer, and the pressure-sensitive adhesive/adhesive layer are stacked in this order, and the intermediate layer is formed by forming the pressure-sensitive adhesive/adhesive layer on the void-provided layer.

Optical laminate, method of producing optical laminate, optical element, and image display

A wiring circuit board includes an insulating layer, a wire embedded in the insulating layer, and an alignment mark electrically independent from the wire and disposed in the insulating layer so as to allow a one-side surface in a thickness direction of the alignment mark to be exposed from the insulating layer. A peripheral portion of the alignment mark consists of only the insulating layer and has a thickness of 30 &#x3bc;m or less.

Wiring circuit board

A board assembly sheet includes a plurality of mounting boards each for mounting an electronic component. The mounting boards are defined in the board assembly sheet. The mounting board has a total thickness of 60 &#x3bc;m or less. The board assembly sheet has a through hole passing through the board assembly sheet in a thickness direction. The through hole is formed to be along an end edge of the mounting board or along a phantom line extending along the end edge.

Board assembly sheet

The present invention aims to provide a method for producing a porous gel-containing liquid that is inexpensive and excellent in homogeneity. The porous gel-containing liquid production method according to the present invention is a method including: a pulverization step of pulverizing a gel of a porous body, wherein the pulverization step is carried out as multi-stage pulverization including a plurality of pulverization stages.

Method for producing porous gel-containing liquid, porous gel-containing liquid, method for producing high-void layer, method for producing high-void porous body, and method for producing laminated film roll

A wireless power transmission system includes a power transmission device including a plurality of power transmission portions, and a power receiving object including a power receiving portion capable of receiving an electric power wirelessly transmitted from the power transmission portion. Of the plurality of power transmission portions, a specific power transmission portion transmits the electric power to the power receiving portion.

Wireless power transmission system

The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT&#xae; is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.

Silicone porous body and method of producing the same

The present invention provides a coating material that allows a structure with void spaces having a strength and flexibility to be formed. The coating material of the present invention includes: pulverized products of a gelled silicon compound obtained from a silicon compound containing at least three or less functional groups having saturated bonds; and a dispersion medium, wherein the pulverized product contains a residual silanol group. The method of producing a coating material according to the present invention includes steps of: causing gelation of a silicon compound containing at least three or less functional groups having saturated bonds and mixing the gelled silicon compound and a dispersion medium. According to the coating material of the present invention, for example, a coating film is formed by coating a base with the coating material and a porous structure is formed by chemically bonding the pulverized products contained in the coating film.

Coating material and method of producing the same

A transparent film, the back-face of which has excellent resistance to scratch and printability, and a surface protection film which has such a transparent film are provided. A transparent filmhas a substrate layerformed of a transparent resin material, and a back-face layerwith a thickness of 1 &#x3bc;m or less provided on a first faceA thereof. A percent change in coefficient of friction &#x394;&#x3bc; is less than 10% for the transparent filmwhen the percent change is determined from a coefficient of friction &#x3bc;of the back-face layer after being conserved at 50&#xb0; C. and 15% RH for three days and a coefficient of friction &#x3bc;of the back-face layer after being conserved at 80&#xb0; C. and 80% RH for three days, with an absolute value of difference between the two coefficients of friction |&#x3bc;&#x2212;&#x3bc;| being divided by the smaller value of the two coefficients of friction.

Transparent film and use thereof

A surface protective film that exhibits superior adhesiveness to an adherend and exhibits only small differences in peel strength according to the surface state of an adherend is provided. The surface protective filmis provided with an acrylic pressure-sensitive adhesive (PSA) layeron one side of a support, and satisfies the following conditions: a thickness reduction ratio (indentation strain E) when a compressive stress of 0.195 MPa is applied for 10 minutes to a laminateobtained by laminating 24 of the protective filmsis 7.0% or more, and a ratio (E/E) of Eto a thickness reduction ratio (permanent strain) Ethat remains 10 minutes after the stress is released is 30 or less; and a peel strength Son a plain TAC polarizing plate is two times or less a peel strength Son a TAG polarizing plate that has been subjected to AG treatment.

Growing community of inventors

Ibaraki, Japan

Hiromoto Haruta