Canon Kabushiki Kaisha

Hiromitsu Takase

Shin Kobayashi

Taiko Motoi

Takashi Noma

Toyoko Kobayashi

Naoko Miura

Tadashi Okamoto

Akira Miyake

Hiroyuki Hashimoto

Ichiro Tanaka

Hideki Morishima

Hiroshi Takagi

Shigeru Terashima

Takao Kusaka

Takahiro Sasaki

Toshiaki Aiba

Noriaki Ohguri

Kazuo Kuroda

Yoshio Gomei

A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.

In situ cleaning device for lithographic apparatus

The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens.

Charged particle beam drawing apparatus and article manufacturing method

A cleaning apparatus for an exposure apparatus that projects a pattern of an exposing mask onto a substrate with first light through an optical element is provided. The cleaning apparatus cleans the optical element with second light having a wavelength different from that of the first light, and includes a recording part configured to record information on exposure history of the exposure apparatus, and an information producing part configured to produce information on a cumulative irradiation light amount of the second light at each of regions in a predetermined cleaning area on the optical element, based on the information on the exposure history.

Cleaning apparatus for exposure apparatus and exposure apparatus

An exposure apparatus for exposing a substrate to exposure light via an original. The apparatus includes a reflector, which includes a multilayer film and a ruthenium film, and reflects the exposure light. The multilayer film reflects the exposure light, and the ruthenium film is arranged on the multilayer film. A vacuum container contains the reflector, an exhauster exhausts exhaust gas in the vacuum container, and a regulator supplies water vapor into the vacuum container and regulates an amount of the water vapor in the vacuum container, based on an amount of carbonaceous gas in the vacuum chamber, so as to retard oxidation of the ruthenium film.

Exposure apparatus and method, and device manufacturing method

To reuse glass used in a flat panel display, processing suitable for global environment such as processing of separating a lead component must be realized. A disassembly processing method for a flat panel display having a structure in which a face plate and rear plate mainly containing glass are airtightly joined via a frame with frit glass is characterized by including the step of separating the face plate and rear plate joined with the frit glass. The separation step is characterized by separating the face plate and rear plate by cutting, dissolution, or melting.

Glass substrate processing method and material removal process using x-ray fluorescence

Nucleic acid probes arranged on a nucleic acid chip substrate in a matrix form can be analyzed quantitatively by TOF-SIMS with accuracy by forming a phosphorus-containing area which can be used as a standard on the substrate.

Probe carrier and method for analyzing the probe carrier

A measurement method is provided, which enables to obtain a two-dimensional image with better quantitative-ability by suppressing the influence of the charge-up, when the two-dimensional secondary ion image is obtained for a biological material fixed on a substrate having a high resistivity by utilizing a TOF-SIMS method in a certain wide area. A two-dimensional image having considerably high positioning resolution-ability can be obtained by the procedure in which the pulsed primary ion beam is irradiated at a spot, and the pulse-wise spot-applications of the primary ion beam and the simultaneous detection of the secondary ion generated from the irradiated primary ion beam proceed along with a discontinuous scanning pattern, and eventually the results of these secondary ion measurements are reconstructed into a two-dimensional image in line with the aforementioned discontinuous scanning pattern.

Method for acquiring information of a biochip using time of flight secondary ion mass spectrometry and an apparatus for acquiring information for the application thereof

Spacer recovery method and apparatus used during disassembling of an image display apparatus

Image display apparatus, disassembly processing method therefor, and component recovery method

An electron beam apparatus includes an electron source and a radiative member on which electrons emitted from the electron source are radiated. In addition, a member is provided between the electron source and the radiative member, with the member having an electroconductive first member and a second member formed on the first member to partially exposed the first member.

Growing community of inventors

Utsunomiya, Japan

Hiromitsu Takase