Fuji Electric Co., Ltd.

Hiromitsu Ota

Sugao Saito

Shinji Fujikake

Porponth Sichanugrist

A transparent second electrode layer laminated over a laminated composite of a solar cell structure is connected to a third electrode layer disposed opposite the substrate via through holes spaced longitudinally and equidistantly apart from each other. The laminated composite and the third electrode layer are respectively segmented by separating grooves into regions involving through holes of a number inversely proportional to that of the series-connected solar cell units. A first electrode layer is connected to the third electrode layer via the through holes of the substrate or via conductors passing over the side thereof in the adjoining region across the separating grooves. The through holes for connected in the first electrode layer with the third electrode layer and the through holes for connecting the second electrode layer with the third electrode layer are formed and arranged equidistantly apart from each other, and the latter though holes which are not needed are removed.

Thin-film solar cell and method for the manufacture thereof

A transparent second electrode layer laminated over a laminated composite of a solar cell structure is connected to a third electrode layer disposed opposite the substrate via through holes spaced longitudinally and equidistantly apart from each other. The laminated composite and the third electrode layer are respectively segmented by separating grooves into regions involving through holes of a number inversely proportional to that of the series-connected solar cell units. A first electrode layer is connected to the third electrode layer via the through holes of the substrate or via conductors passing over the side thereof in the adjoining region across the separating grooves. The through holes for connected in the first electrode layer with the third electrode layer and the through holes for connecting the second electrode layer with the third electrode layer are formed and arranged equidistantly apart from each other, and the latter through holes which are not needed are removed.

Thin-film solar cell array and method of manufacturing same

Solar cells are formed of (a) a transparent substrate; (b) a transparent electrode; (c) a first doped layer comprising amorphous silicon oxide, optionally including nitrogen, said first doped layer containing a dopant whereby the first doped layer is of a first conductivity type and has an optical gap of from 2.0 to 2.3 eV and a ratio of light conductivity to dark conductivity of 5 or less at 25.degree. C.; (d) a layer of intrinsic amorphous silicon; (e) a second doped layer comprising amorphous silicon, said second doped layer containing a dopant whereby the second doped layer is of a second conductivity type different from the first conductivity type; and (f) a second electrode. The first doped layer may be of either n-type or p-type conductivity. The first doped layer can be formed over the transparent electrode by decomposing a gas mixture comprising SiH.sub.4, an oxygen source gas selected from N.sub.2 O or CO.sub.2, and a dopant, in a hydrogen carrier at a substrate temperature of 150.degree. to 250.degree. C., the amount of hydrogen being from 10 to 50 times the amount of SiH.sub.4, said first doped layer being of a first conductivity type. An interfacial layer of intermediate gap may also be included when the first doped layer is a p-type layer. Also described is a method for the formation of an amorphous silicon-oxide film to be utilized in making the thin-film solar cell.

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Yokosuka, Japan

Hiromitsu Ota