Applied Materials, Inc.

Hiromi Tsuruta

Fred Conrad Redeker

Brian J Brown

Boris Fishkin

Gee Sun Hoey

Raijiro Koga

Takashi Kumagai

Bruce Lu

Roland Shu

K Y Wang

Rex Lu

A chemical mechanical polishing apparatus includes a pad conditioner having a conditioner head, a cleaning cup for receiving and cleaning the conditioner head of the pad conditioner, and a fluid dispenser for dispensing a cleaning fluid onto the conditioner head.

Pad conditioner cleaning apparatus

A cleaning cup for holding and cleaning a pad conditioner having a conditioner head, the cleaning cup includes a spray nozzle for spraying a cleaning solution on a top side of the conditioner head. The cleaning cup further includes a plurality of support pins extending upwards from a base of the cleaning cup to receive the conditioner head thereon.

Growing community of inventors

Sakura, Japan

Hiromi Tsuruta