Renesas Electronics Corporation

Nippon Telegraph and Telephone Corporation

Canon Anelva Corporation

Anelva Corporation

Other

Nec Platforms, Ltd.

Hiromi Sasaki

Naoki Watanabe

Osamu Watabe

Masashige Moritoki

Shinji Furukawa

Nobuyoshi Watanabe

Tomotake Morita

Kazunori Tani

Kenichi Yamamoto

Makoto Kobayashi

Toru Morimoto

In a telephone switching apparatus equipped with an automatic call recording function, when recording of a call is started, a PB signal cannot be sent by operating a button any longer. Further, a user mistakenly assumes that there is a problem because the PB signal cannot be sent. Means capable of selecting, when recording means starts recording of a call, whether a PB signal is sent or not is provided, thus making it possible to send a PB signal.

Telephone switching apparatus and method, and program

To improve performance of a semiconductor device. Over a semiconductor substrate, a gate electrode is formed via a first insulating film for a gate insulating film, and a second insulating film extends from over a side wall of the gate electrode to over the semiconductor substrate. Over the semiconductor substrate in a part exposed from the second insulating film, a semiconductor layer, which is an epitaxial layer for source/drain, is formed. The second insulating film has a part extending over the side wall of the gate electrode and a part extending over the semiconductor substrate, and a part of the semiconductor layer lies over the second insulating film in the part extending over the semiconductor substrate.

Semiconductor device and method of manufacturing the same

Semiconductor device with epitaxial semiconductor layer for source/drain on substrate, and method of manufacturing the same

An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.

Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus

Photoresist on a metal is removed with less oxidation of the metal surface by the invented ashing. During process, the matching of oxygen gas ratio and wafer temperature under downstream plasma which means no RF bias plasma is controlled for oxidation amount not to depend on ashing time with required photo resist rate in manufacturing.

Method of fabricating semiconductor device

An apparatus for depositing a protective film on a data recording disk, including the steps of depositing a magnetic film layer as a data recording layer on a surface of a substrate while the substrate is at a magnetic film deposition temperature; heating the substrate with the magnetic film layer thereon to a protective film deposition temperature; and depositing a protective film on the magnetic film layer while the substrate is at the protective film deposition layer; wherein the protective film deposition temperature is higher than the magnetic film deposition temperature.

Apparatus for depositing a thin film on a data recording disk

In manufacturing a magnetic recording disk, a magnetic film for a recording layer is deposited on a substrate of the magnetic recording disk in a magnetic-film deposition chamber, and the substrate is transferred from the magnetic-film deposition chamber to a lubricant-layer preparation chamber without exposing the substrate to the atmosphere. Then, a lubricant layer is prepared on the substrate in the lubricant-layer preparation chamber.

Method for manufacturing a magnetic recording disk

A method and apparatus for depositing a protective film on a data recording disk, including the steps of depositing a magnetic film layer as a data recording layer on a surface of a substrate while the substrate is at a magnetic film deposition temperature; heating the substrate with the magnetic film layer thereon to a protective film deposition temperature; and depositing a protective film on the magnetic film layer while the substrate is at the protective film deposition layer; wherein the protective film deposition temperature is higher than the magnetic film deposition temperature.

Growing community of inventors

Tokyo, Japan

Hiromi Sasaki