Tokyo Electron Limited

Kabushiki Kaisha Toshiba

Tdk Corporation

Hiromi Harada

Haruo Okano

Isahiro Hasegawa

Junichi Arami

Katsuya Okumura

Keiji Horioka

Yukimasa Yoshida

Hiromi Kumagai

Sinji Kubota

Masami Oguriyama

Toshihisa Nozawa

Jun-ichi Arami

Yoshio Ishigaki

The invention provides a novel magnetron plasma processing apparatus comprising the following, a vacuum chamber storing an etching object, the first electrode which is provided in the vacuum chamber and holds the etching object, the second electrode which is disposed in opposition from the first electrode, where the first and second electrodes are in parallel with each other, a gas-supply unit feeding etching gas to the vacuum chamber, a magnetic-field generating means which is disposed on the part opposite from the first electrode in opposition from the second electrode, and a power-supply unit which feeds power to either of these first and second electrodes and generates discharge between these parallel electrodes. Magnetic-field generating means is provided with a magnetic block whose both-end surfaces are provided with magnetic poles having polarity inverse from each other, and in addition, a plane recess opposite from the second electrode is provided between both-end surfaces of the magnetic block.

Magnetron plasma processing apparatus and processing method

A magnetron plasma processing apparatus includes, a vacuum chamber storing an etching object, a first electrode which is provided in the vacuum chamber and holds the etching object, a second electrode which is disposed in opposition from the first electrode and parallel with the first electrode. A gas-supply unit feeding etching gas to the vacuum chamber while, a magnetic-field generating means is disposed on the part opposite from the first electrode in opposition from the second electrode, and a power-supply unit feeds power to either the first or second electrodes and generates discharge between the electrodes. The magnetic-field generating means is provided with a magnetic block whose both-end surfaces are provided with magnetic poles having polarity inverse from each other, and in addition, a plane recess opposite from the second electrode is provided between both-end surfaces of the magnetic block.

A permanent magnet magnetic circuit comprises a main magnet block having a pair of opposite outer surfaces. A pair of main magnetic poles of opposite polarities are disposed on the respective outer surfaces of the main magnet block. The main magnet block is provided with a channel defined between the pair of outer surfaces and the channel has a pair of inner surfaces corresponding to the respective outer surfaces of the main magnet block. The main magnet block is also provided with a pair of oppositely polarized compensating magnetic poles arranged on the respective inner surfaces for controlling any vector of the magnetic field directed from one of the main magnetic pole to the other main magnetic pole. A pair of adjusting magnet blocks are arranged on the respective inner surfaces to adjust the magnetic field directed from one of the main magnetic poles to the other magnetic pole.

Permanent magnet magnetic circuit and magnetron plasma processing

A magnetron plasma processing apparatus including a vacuum chamber storing an object to be etched, a first electrode provided in the vacuum chamber to hold the object, a second electrode disposed to one side of the first electrode, where the first and second electrodes are in parallel with each other, a gas-supply unit feeding etching gas to the vacuum chamber, a magnetic-field generating means including a magnetic block disposed outside the chamber on the opposite side of the second electrode and rotatable about an axis normal to the object held by the first electrode, and a power-supply unit which feeds power to either of the first and second electrodes and generates discharge between these parallel electrodes. The magnetic block has end surfaces provided with magnetic poles having polarity inverse from each other, and in addition, a plane recess opposite from the second electrode is provided between the magnetic poles.

A permanent magnet magnetic circuit is provided capable of producing a unidirectional magnetic field substantially free of unnecessary perpendicular magnetic field components. A pair of main magnetic poles of opposite polarities are situated at a pair of opposite edge surfaces of a permanent magnet block for producing lines of magnetic force. One major surface of the block between the edge surfaces is provided with a channel where a pair of auxiliary magnetic poles are situated at opposed inner surface portions of the channel for controlling a middle portion of the lines of magnetic force to be linear.

Permanent magnet magnetic circuit

A heat-treatment furnace comprising a process tube for containing an object of treatment, a heater surrounding the process tube, and an infrared impermeable member located on the process tube side of the heater and at least one the side of an open end of the process tube through which the object of treatment is carried in and out.

Growing community of inventors

Hiratsuka, Japan

Hiromi Harada