Toshiba Memory Corporation

Hiromasa Yoshimori

Masayuki Akou

Masayuki Ako

Yoshihiro Sobue

A semiconductor device includes a substrate, a first electrode provided apart from the surface of the substrate in a first direction intersecting the surface of the substrate, a second electrode extending completely through the substrate in the first direction and connected to the first electrode at one end in the first direction, a first structure covering a side surface of the second electrode, and an insulating film provided between the second electrode and the first structure. The second electrode includes first atoms, and the first structure includes second atoms. A diffusion coefficient of the second atoms in the insulating film is smaller than a diffusion coefficient of the first atoms in the insulating film.

Semiconductor device

A semiconductor device of an embodiment includes a semiconductor layer, a first conductor, a first conductive layer, a first insulating layer, a second conductive layer, and a plurality of second conductors. The semiconductor layer has a first region and a second region. The first conductor is provided in the semiconductor layer. The first conductive layer is electrically connected to the first conductor. The first insulating layer is provided in the semiconductor layer with at least part of the first insulating layer being provided between the first conductive layer and the semiconductor layer. A distance from the first insulating layer to the first region is smaller than a distance to the second region. A first distance to the first region from a plane that includes a first interface between the first insulating layer and the first conductive layer is larger than a second distance from the plane to the second region.

Growing community of inventors

Yokohama Kanagawa, Japan

Hiromasa Yoshimori