Teijin Limited

Dai Nippon Printing Co., Ltd.

Other

Hiroko Tanaka

Atsuo Hazato

Kenji Manabe

Masayasu Tabe

Kenichiro Kataoka

Qingzhi Gao

Noriaki Endo

Noriyuki Takahashi

Tatsuki Shiota

Toru Minoshima

Shu Shimada

Hiroyuki Ishii

Jonathan W Greene

Christine M Tarby

Seiichi Ishizuka

Hiroyuki Nakajima

Takaharu Tsutsumi

Wilna J Moree

Minoru Furuya

Masashi Ohtsuki

Takahiko Hada

Takuya Morita

Yasuji Sakuma

Nobuyuki Kanda

Hiroaki Mitsuhashi

Manabu Chokki

Koji Ishii

Tadashi Kishimoto

Qinqzhi Gao

Shinsuke Yamagami

Michele Ramirez Weinhouse

Doug Barnum

Yusuke Shoji

The present invention provides a method of cleaning a storage case to be used for storing or transporting mask substrates such as photomasks and photomask blanks, semiconductor substrates such as semiconductor wafers, pellicles, or the like. The present invention: facilitates a regular cleaning operation, can be used also for a storage case of a complicated shape, does not require a large scale equipment or an expensive equipment to facilitate an environmental countermeasure, and provides high cleaning effect. The method of cleaning a storage case polluted by adhesion of a foreign substance of an organic material, an ionic foreign substances or an ionic crystal foreign substance physically absorbed, comprises a step of placing the storage case still in air flow of cleaned air or an inert gas in a temperature range from room temperature to 80&#xb0; C. for desorbing and removing the foreign substance adhered to the storage case.

Method of cleaning storage case

The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and without the increase of the production cost. The method for cleaning a photo mask with a pellicle mounted, in which the pellicle frame has a gas introducing hole and a gas discharging hole, comprises: a step of introducing a gaseous substituting substance from the gas introducing hole in a pellicle inner space surrounded by the photo mask and the pellicle, substituting foreign substances on the photo mask, and discharging the foreign substances from the gas discharging hole; and a step of irradiating an ultraviolet ray to the photo mask, while an air or a nitrogen gas or a rare gas is introduced from the gas introducing hole, for degrading the substituted substituting substance so as to be gaseous, and discharging the same from the gas discharging hole.

Method for cleaning photo mask

Cyclic diamines of formula (I) or their pharmacologically acceptable acid addition salts, and their medical applications are described. These compounds inhibit the action of chemokines such as MIP-1a and/or MCP-1 on target cells, and are useful as a therapeutic drug and/or preventative drug in diseases, such as atherosclerosis, rheumatoid arthritis, and the like where blood monocytes and lymphocytes infiltrate into tissue.

Diarylalkyl cyclic diamine derivatives as chemokine receptor antagonists

The starting materials for a production process of a vitamin D,derivative are disclosed, e.g., a cyclopentene derivative represented by the formula (1-2):

Vitamin D3 derivative and production process thereof

Vitamin D.sub.3 derivative and treating agent for inflammatory

Prostaglandins and processes for production thereof

A vitamin D.sub.3 derivative represented by the following formula: wherein, R is, independently, a hydrogen atom, tri(C.sub.1 to C.sub.7 hydrocarbon)silyl group, C.sub.2 to C.sub.8 acyl group, or group forming an acetal bond together with an oxygen atom of a hydroxyl group, A is ##STR1## where, R.sup.1 is a methyl group or methylene group, and when R.sup.1 is a methylene group, the bond between the R.sup.1 and the 3-position of the lactone ring is a double bond, R.sup.2 is a hydrogen atom or C.sub.1 to C.sub.3 alkyl group, R.sup.3 is a hydrogen atom, or R.sup.2 and R.sup.3 together indicate a substitutable single methylene group.

Vitamin D.sup.3 derivative and production process thereof

7-thiaprostaglandins and method of production thereof

Vitamin D.sub.3 derivatives and production process thereof

Growing community of inventors

Tokyo, Japan

Hiroko Tanaka