Sharp Kabushiki Kaisha Corporation

Hiroki Taniyama

Tohru Okabe

Ryosuke Gunji

Akira Inoue

Shinsuke Saida

Yoshihiro Nakada

Hiroharu Jinmura

Shinji Ichikawa

Koji Tanimura

Yoshihiro Kohara

Kohji Ariga

Takeshi Yaneda

Shoji Okazaki

Tokuo Yoshida

Masashi Maekawa

Yoshiyuki Itoh

Norihisa Asano

A TFT layer and an organic EL element layer are provided in this order on a resin substrate layer, the TFT layer includes source wiring lines, high-level power source wiring lines, conductive portions including connection wiring lines between TFTs, and a flattening film covering the conductive portions provided on the interlayer insulating film, a frame region is provided with a bending portion including a portion where a slit is formed in an inorganic insulating film including the interlayer insulating film, and a flattening auxiliary film is provided between each adjacent ones of the conductive portions, formed of a material identical to a material of the frame flattening film that fills the slit of the bending portion, in a layer identical to a layer of the frame flattering film, and covered with the flattening film together with the conductive portions.

Display device including bending portion with frame flattening film and slits

Frame wiring lines are provided in a frame region, a flattening film in which a frame-shaped slit is formed in the frame region is provided in the display region and the frame region, a plurality of first electrodes constituting light-emitting elements are provided on the flattening film, and conductive layer made of the same material and formed in the same layer as those of each of the plurality of first electrodes are provided covering at least end faces of the frame wiring lines exposed from the slit.

Display device

An organic EL display () has a bend (B) where a slit () is bored in a base coat film (), gate insulating film (), first interlayer insulating film () and second interlayer insulating film (). The bend is provided with a filler layer () filling the slit and covering both edges of the slit. The filler layer has a protrusion () overlapping each edge in the width direction of the slit. A routed wire () routed from the display region (D) and then routed over the filler layer to reach a terminal section (T) extends over the protrusion.

Display device and method for manufacturing same

A display device includes: a plurality of control lines; a plurality of power supply lines; a plurality of data signal lines; an oxide semiconductor layer; a first metal layer; a gate insulation film; a first inorganic insulation film; a second metal layer; a second inorganic insulation film; and a third metal layer. The oxide semiconductor layer, in a plan view, contains therein semiconductor lines formed as isolated regions between a plurality of drivers and a display area. The semiconductor lines cross the plurality of control lines and the plurality of power supply lines, are in contact with the plurality of control lines via an opening in a gate insulation film, are in contact with the plurality of power supply lines via an opening in the first inorganic insulation film, and have a plurality of narrowed portions, such that thicker and thinner regions exist along the same line.

Display device with reduced occurrences of electrostatic discharge

A first conductive layer in the same layer as that of a first electrode is coupled to a third conductive layer and a second electrode in the same layer as that of a third metal layer through a slit formed in a flattening film of a non-display area. Second conductive layers in the same layer as that of a second metal layer are provided to overlap with the slit.

An active matrix substrate including a resin substrate including a plurality of external connection terminals arranged near a display region, the active matrix substrate includes: a plurality of first lead wires each extending from one of the external connection terminals to the display region; and a plurality of second lead wires each extending from one of the external connection terminals to a separation line, the second lead wires being arranged with an arrangement pitch along the separation line, and the arrangement pitch of the second lead wires being greater than an arrangement pitch of the first lead wires.

Active matrix substrate, display device, and motherboard

A display device includes: a resin substrate; a TFT layer; and a light-emitting element. A bending portion is provided with a first resin film formed of the same material and in the same layer as those of a first flattening film, and the first resin film fills a slit. An upper face of the first resin film is provided with a plurality of first connection wiring lines formed of a third metal film, and the plurality of first connection wiring lines extend in parallel to each other in a direction intersecting the extending direction of the bending portion. The plurality of first connection wiring lines are electrically connected to a plurality of first lead-out wiring lines, respectively in a display region side of the slit, and electrically connected to a plurality of second lead-out wiring lines, respectively in a terminal portion side of the slit.

In the display device according to the disclosure, a first bank includes a first bank lower portion in the same layer as a flattening film and a first bank upper portion in the same layer as an edge cover. A second bank includes a second bank lower portion in the same layer as the flattening film and a second bank upper portion in the same layer as the edge cover. The first bank upper portion covers an upper surface and a side surface of the first bank lower portion, the side surface being on a side close to a display region. An inclination angle of a side surface of the first bank upper portion on a side close to the display region is larger than an inclination angle of the side surface of the first bank lower portion on the side close to the display region.

The disclosure has an object to achieve a high level of height precision for spacers on a back plane. A display device includes: edge covers having a plurality of openings in which first electrodes are exposed; and a planarization film having first flat portions, second flat portions, and contact holes. The plurality of openings respectively overlap the first flat portions in a plan view. The second flat portions are located between the plurality of openings in a plan view. Each edge cover overlapping one of the first flat portions in a plan view has, on a second electrode side, a surface that has a first height from a bottom surface of the planarization film on a substrate side. Each second flat portion has, on the second electrode side, a surface that has a second height from the bottom surface. The first height is smaller than the second height.

Display device, method of manufacturing display device, apparatus for manufacturing a display device

In a TFT layer provided on a base substrate, a first metal film, a first inorganic insulating film, a second metal film, a second inorganic insulating film, a third metal film, a first flattening film, a fourth metal film, and a second flattening film are sequentially layered. In a frame region, a slit is formed in the second flattening film to surround a display region, a first conductive layer formed by the fourth metal film is provided on the first flattening film exposed from the slit, and a TFT of a drive circuit is provided on the base substrate side of the first conductive layer to overlap with the first conductive layer.

Display device having a slit passing through the second flattening film

In a display region, each first power-source line and each second power-source line intersecting with the first power-source line are electrically connected together via a contact hole in a second inorganic insulating film. In addition, each source line and each second power-source line intersect with each other via the second inorganic insulating film and a first organic insulating film.

In a display device, an inorganic insulating layer, a metal layer, a flattering film, a first electrode, an edge cover, a function layer, and a second electrode are formed, in that order, on a base substrate. The edge cover covers an edge of the first electrode and includes a first opening exposing the first electrode. The function layer is formed covering the first opening and an edge of the edge cover. The flattening film includes a first planar portion and a second planar portion having a film thickness smaller than that of the first planar portion, is configured to electrically connect the first electrode and the metal layer via a contact hole formed in the first planar portion, and overlaps the first opening of the edge cover at at least a portion of the second planar portion.

Display device and method for producing display device

In a cross section of a bending section of a frame region, a first opening opening upward is formed in at least one layer of inorganic film included in a TFT layer. A first organic film is provided to plug the first opening. A frame wiring line is provided on the first organic film. A second organic film is provided to cover the frame wiring line. A second opening opening upward is formed in the first organic film on an inner side with respect to the first opening.

A slit has ends each close to one of a display area and a terminal. The ends are each formed of a stepwise side face, including etch stop films.

In a display device, a second wiring line extends in a display region and includes an imaginary straight line that extends from the second wiring line in an extension direction of the second wiring line and intersects with an opening of an edge cover. The second wiring line extends along the peripheral edge of the opening without intersecting with the opening of the edge cover.

Growing community of inventors

Sakai, Japan

Hiroki Taniyama