Hoya Corporation

Hiroki Takei

Hitoshi Kamura

Yuko Watanabe

Kenichi Shinde

Takeshi Mitsuishi

Yukihiro Takahashi

Akinori Kobayashi

A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.

Composition for vapor deposition, method for forming an antireflection film, and optical element

A method for producing a composition for vapor deposition comprising sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide. The method is capable of forming a high-refraction layer even in low-temperature vapor deposition on a substrate. An antireflection film is formed having good scratch resistance, good chemical resistance and good heat resistance, of which the heat resistance decreases little with time, that is useful in a variety of optical elements.

Method for producing composition for vapor deposition, composition for vapor deposition, and method for producing optical element with antireflection film

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Tokyo, Japan

Hiroki Takei