Nichia Corporation

Hiroki Narimatsu

Koji Tanizawa

Yukio Narukawa

Tomotsugu Mitani

Masayuki Eguchi

Masahito Yamazoe

Kazunori Sasakura

Tomoaki Sakai

A semiconductor device includes an active layer, an n-side contact layer, and a p-side contact layer. The nitride semiconductor device includes at least a first n-side layer, a second n-side layer, a third n-side layer and a fourth n-side layer formed in this order from the n-side contact layer between the n-side contact layer and the active layer, while at least the second n-side layer and the fourth n-side layer each contain an n-type impurity, and the concentration of the n-type impurity in at least the second n-side layer and the fourth n-side layer is higher than the concentration of the n-type impurity in the first n-side layer and the third n-side layer.

Nitride semiconductor device

A nitride semiconductor device comprising an n-type nitride semiconductor layer, an active layer having a quantum well structure including a well layer of a nitride semiconductor containing In, the p-type nitride semiconductor layer having a p-type contact layer, a p-type high concentration doped layer interposed between said active layer and said p-type contact layer and a p-type multi-film layer interposed between said active layer and said p-type high concentration doped layer.

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Anan, Japan

Hiroki Narimatsu