Jsr Corporation

Dai Nippon Printing Co., Ltd.

Hiroki Nakagawa

Hiroshi Kojima

Atsushi Nakamura

Yukio Nishimura

Hiromitsu Nakashima

Gouji Wakamatsu

Hiroshi Ikeda

Toru Kimura

Takashi Chiba

Isao Inoue

Seiichi Isojima

Koujiro Ohkawa

Hirokazu Sakakibara

Hiroaki Nemoto

Takayuki Tsuji

Kazunori Takanashi

Naoya Nosaka

Kazuhiro Watanabe

Takanori Yamashita

Rikiya Yamashita

Takashi Kuroda

Gen Furui

Yuichi Hirai

Kazuki Yamada

Takehiko Naruoka

Norihiko Ikeda

Hayato Namai

Junya Eguchi

Goji Wakamatsu

Kentaro Harada

Seiji Shinohara

Kazuki Kasahara

Takeo Shioya

Kentarou Gotou

Tomohiro Utaka

Hiroshi Dougauchi

Takaki Miyachi

Hiroki Nakatsu

Yuushi Matsumura

Daita Kouno

Kasumi Oi

Masataka Nakashima

Tsubasa Abe

Takakazu Goto

Kazunori Sakai

Takuma Ebata

Hideki Arao

Yasuhiko Matsuda

Jun Fukuda

Kaori Sakai

Kentaro Hata

Hitoshi Sekino

Takahisa Nomura

Ichihiro Miura

Takanori Hamada

Kentarou Harada

Kenji Hoshiko

Kengo Ehara

Kasumi Ol

Saki Harada

Youichi Mochiduki

Kouichi Mikami

Miho Miyahara

Chie Kawai

Provided is an optical film that, when being incorporated into an image display device, can suppress the image display device from appearing pale. An optical film including a UV-absorbing layer containing a UV-absorbing agent B on a plastic film containing a UV-absorbing agent A, wherein fluorescence emission when the plastic film side is irradiated with excitation light having a wavelength of 365 nm and fluorescence emission when the UV-absorbing layer side is irradiated with excitation light having a wavelength of 365 nm satisfy a specific condition.

Optical film, polarizing plate, surface plate for image display device, and image display device

An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

The composition contains a compound and a solvent. The compound includes a group represented by formula (1). The compound has a molecular weight of no less than 200 and has a percentage content of carbon atoms of no less than 40% by mass. In the formula (1), Rand Reach independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms, or Rand Rtaken together represent a part of an alicyclic structure having 3 to 20 ring atoms constituted together with the carbon atom to which Rand Rbond; Arrepresents a group obtained by removing (n+3) hydrogen atoms from an arene or heteroarene having 6 to 20 ring atoms; and X represents an oxygen atom, &#x2014;CRR&#x2014;, &#x2014;CRR&#x2014;O&#x2014; or &#x2014;O&#x2014;CRR&#x2014;. 

Composition, film, film-forming method and patterned substrate-producing method

A composition for resist underlayer film formation, includes a compound represented by formula (1) and a solvent. Arrepresents an aromatic heterocyclic group having a valency of m and having 5 to 20 ring atoms; m is an integer of 1 to 11; Aris a group bonding to a carbon atom of the aromatic heteroring in Arand represents an aromatic carbocyclic group having 6 to 20 ring atoms and having a valency of (n+1) or an aromatic heterocyclic group having 5 to 20 ring atoms and having a valency of (n+1); n is an integer of 0 to 12; and Rrepresents a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, a halogen atom, or a nitro group.ArArR))&#x2003;&#x2003;(1)

Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compound

A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): Rand Reach independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of Rand Rrepresents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or Rand Rtaken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which Rand Rbond. 

Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production method

Provided is an optical filmincluding a light-transmitting base materialand a light-transmitting functional layerprovided on one surface of the light-transmitting base material, wherein the optical filmhas a spectral transmittance of less than 1% at a wavelength of 380 nm, a spectral transmittance of 10% or more and less than 60% at a wavelength of 410 nm, and a spectral transmittance of 70% or more at a wavelength of 440 nm, and wherein the light-transmitting functional layerhas a film thickness of 9 &#x3bc;m or less.

Optical film, polarization plate, and image display device

The present invention provides a display device having excellent light energy conversion efficiency. The present invention relates to a display device including a light-diffusing layered body. The light-diffusing layered body includes a wavelength conversion layer containing optically isotropic semiconductor particles and a light-diffusing layer on at least one surface of the wavelength conversion layer. The light-diffusing layer contains a binder component and light-diffusing particles that contain an organic material or an inorganic material. The light-diffusing particles protrude in a range of 3 to 50% of the particle size of the light-diffusing particles from an outermost surface of the light-diffusing layer. The light-diffusing layer has projections and depressions on the outermost surface due to the light-diffusing particles protruding therefrom. The light-diffusing layer has a film thickness of 1 to 30 &#x3bc;m.

Display device

A fluorine-containing polymer for use in a radiation-sensitive resin composition is used for forming a photoresist film in a process of forming a resist pattern, including a liquid immersion lithographic process in which radiation is emitted through a liquid having a refractive index larger than the refractive index of air at a wavelength of 193 nm, and being present between a lens and the photoresist film. The fluorine-containing polymer has a weight average molecular weight determined by gel permeation chromatography in the range from 1,000 to 50,000 and a receding contact angle with water and the photoresist film formed therefrom is 70&#xb0; or more.

An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.

Immersion upper layer film forming composition and method of forming photoresist pattern

A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.

Pattern-forming method

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Tokyo, Japan

Hiroki Nakagawa