Kioxia Corporation

Hiroki Kishi

Ryota Fujitsuka

Takanori Yamanaka

Ryota Suzuki

Takayuki Okada

Kenta Yamada

Hirokazu Ishigaki

Nobushi Matsuura

Takashi Yamane

In one embodiment, a semiconductor device includes a stacked film alternately including a plurality of electrode layers and a plurality of insulating layers, a charge storage layer provided on a side face of the stacked film via a first insulator, and a semiconductor layer provided on a side face of the charge storage layer via a second insulator. The device further includes a third insulator provided between an electrode layer and an insulating layer in the stacked film and between the electrode layer and the first insulator, and a first film provided between the third insulator and the insulating layer and/or between the third insulator and the first insulator, and including carbon, germanium, tin, aluminum, phosphorus or arsenic.

Semiconductor device and method of manufacturing the same

A semiconductor memory device according to an embodiment includes a semiconductor substrate; a laminated body formed by laminating a plurality of electrode layers on the semiconductor substrate; a memory film provided in the laminated body and including a first block insulation film disposed in a direction perpendicular to the electrode layer, a charge storage film facing the first block insulation film, a tunnel insulation film facing the charge storage film, and a channel film facing the tunnel insulation film; and a barrier layer provided at at least one of interface between the plurality of electrode layers and the memory film and an interface in the memory film and mainly composed of carbon.

Semiconductor memory device

Growing community of inventors

Yokkaichi, Japan

Hiroki Kishi