Sony Corporation

Tokyo Ohka Kogyo Co., Ltd.

Other

Sumitomo Chemical Company, Limited

Hiroki Endo

Taichi Natori

Kazuhiro Machiguchi

Yuuji Ueda

Toyomi Jinwaki

Koji Ueda

Hideya Kobari

Hidenori Miyamoto

Hideshi Abe

Yoshinori Uchida

Hiroyoshi Sago

Toshimasa Nakayama

Akihiko Nakamura

Futoshi Shimai

Yukihiro Sayama

Yoshio Hagiwara

Tsutomu Sahoda

Shigemi Fujiyama

Hiroyuki Iida

Taiichiro Aoki

Hirotsugu Kumazawa

Masanori Shinada

Yoji Takamura

Syunji Horiuchi

A solid-state image device is provided which has a semiconductor substrate, pixels A each containing a photoelectric conversion portion in which at least two PN junction parts are provide in a depth direction of the semiconductor substrate, pixels B each containing a photoelectric conversion portion in which at least one PN junction part is provided, first color filters provided above the pixels A, second color filters provided above the pixels B; and a detection mechanism for detecting a first color signal and a second color signal from the two PN junction parts of each of the pixels A and a third color signal from the PN junction part of each of the pixels B. According to the above solid-state image device, light can be more efficiently used than a color filter separation method, and superior color reproducibility to that of a three-well structure can be realized.

Solid state image device having multiple PN junctions in a depth direction, each of which provides an output signal

Solid-state image device having multiple PN junctions in a depth direction, each of which provides and output signal

A method for forming a coating film, comprises the steps of: applying a raw material of a low dielectric constant onto a surface of a plate-like material; reducing oxygen concentration in the atmosphere surrounding the plate-like material to be less than or equal to 1% before a surface temperature of said plate-like material to be treated rises to 200&#xb0; C.; thereafter heating said plate-like material to a temperature greater than or equal to 400&#xb0; C.; and then maintaining the oxygen content in the atmosphere to be less than or equal to 1% until the surface temperature of said plate-like material to be treated lowers to 200&#xb0; C. The raw material is an organic SOG obtained by hydrolyzing and condensing at least one alkoxysilane compound into an organic solvent under an acid catalyst.

Method for forming a coating film on a plate-like workpiece

A method of producing a color filter composed of filter elements of RGB is used for a solid-state imaging device, which color filter is capable of improving the resolution of the device. The method includes the steps of: forming a filter layer of a second color in a region in which a filter element of a first color is to be formed; and stacking a filter layer of a third color different from the second color on the filter layer of the second color. In the method, the color filter is preferably composed of filter elements of a plurality of the first colors each of which is either of red, green and blue colors. The filter elements are preferably produced by the steps of: forming a yellow filter layer as a filter layer of the second or third color in a region in which the filter elements of red and green colors as the first colors are to be formed; forming a cyan filter layer as a filter layer of the second or third color in a region in which the filter elements of green and blue colors as the first colors are to be formed; and forming a magenta filter layer as a filter layer of the second or third colors in a region in which filter elements of red and blue colors as the first colors are to be formed.

Method of producing color filter for solid-state imaging device

A positive type colored photosensitive resin composition containing an alkali-soluble copolymer resin which comprises repeating units derived from styrene and repeating units derived from hydroxystyrene, a ratio (molar ratio) of the latter repeating units to the former repeating units is from 1:0.7 to 1:20 and has a polystyrene-converted weight average molecular weight of 6,000 to 15,000.

Colored photosensitive resin composition and color filter comprising the same

A color filter array having a blue filter layer on a substrate wherein the blue filter layer comprises triallylmethane dye showing its absorption maximum at a wavelength within the range of from 550 to 650 nm; and has a transmittance at a wavelength of 450 nm of 70% or more and that at 650 nm of 5% or less is provided; and the color filter array shows excellent spectroscopic characteristics with respect to blue light and has a blue filter layer excellent in light fastness.

Color filter array having a blue filter layer

A color filter array having a green filter layer on a substrate wherein the green filter layer comprises a copper phthalocyanine dye having its absorption maximum at a wavelength of 600 to 700 nm, and a pyridone azo dye having its absorption maximum at a wavelength of 400 to 500 nm; and has a transmittance at a wavelength of 450 nm of 5% or less and that at 535 nm of 62% or more is provided; and the color filter array shows excellent spectroscopic characteristics with respect to green light and has a green filter layer excellent in light fastness.

Color filter array having a green filter layer

A method for forming a film using a rotating cup application apparatus in which a rotatable inner cup is provided within an outer cup, the upper openings of the inner cup and the outer cup are closed with corresponding lids, and the lid for the inner cup is integrally rotated together with the inner cup, the method comprising the steps of setting a material to be treated, on which wiring layers have been formed, in the rotating cup application apparatus, applying SOG onto the surface of the material to be treated, thereafter closing the upper openings of the inner cup and the outer cup with the lids, rotating the inner cup in this state to thereby uniformly diffusing the SOG, repeating the SOG application and diffusing steps, and thereafter baking the material to be treated in a heat treatment apparatus.

Film forming method

A color filter array having a yellow filter layer on a substrate wherein the yellow filter layer comprises a pyridone azo dye having its absorption maximum at a wavelength of 400 to 500 nm; and has a transmittance at a wavelength of 450 nm of 5% or less, that at 535 nm of 80% or more and that at 650 nm of 90% or more is provided; the color filter array shows excellent spectroscopic characteristics with respect to yellow light, is capable of forming a pattern with a short time exposure and has a yellow filter layer excellent in light fastness; and a photosensitive resin composition with which a pattern can be formed with a short time exposure is also provided.

Color filter array having a yellow filter layer

A color filter array having a red filter layer on a substrate wherein the red filter layer comprises a xanthene % dye having its absorption maximum at a wavelength of 500 to 600 nm, and a pirazolone azo dye having its absorption maximum at a wavelength of 400 to 550 nm; and has a transmittance at a wavelength of 535 nm of 1% or less and that at 650 nm of 90% or more; and the color filter array shows excellent spectroscopic characteristics with respect to red light and has a red filter layer excellent in light fastness.

Color filter array having a red filter layer

A color filter array having a red filter layer on a substrate wherein the red filter layer comprises a xanthene dye having its absorption maximum at a wavelength of 500 to 600 nm, and a pirazolone azo dye having its absorption maximum at a wavelength of 400 to 550 nm; and has a transmittance at a wavelength of 535 nm of 1% or less and that at 650 nm of 90% or more; and the color filter array shows excellent spectroscopic characteristics with respect to red light and has a red filter layer excellent in light fastness.

According to the invention disclosed, application liquid such as spin-on-glass (SOG) is dropped on the surface of a substrate such as a semiconductor wafer having irregularities thereon and is dispersed on the substrate surface using a centrifugal force generated by rotating the substrate. The rotation of the substrate is performed in a first rotational action at a low speed and a second rotational action at a high speed, the first and second rotational actions being separated by a time interval. The second rotation may be at a constant speed. Alternatively, the rotational speed of the second rotational action may comprise rotation at an intermediate speed continuously followed by rotation at a higher speed. The time interval between the first and second rotational actions is ten times the duration of the first rotational action or longer. The duration of the second rotational action is three times that of the first rotational action or longer. Such time interval and relative durations make the application liquid more conformable to the substrate surface and causes the application liquid to be sufficiently dispersed on the substrate to provide a film having the desired thickness on the substrate, even though the substrate has irregularities thereon.

Method of forming coating film on a substrate

The picture quality of a solid-state image sensing device is improved and its manufacturing process is simplified. The solid-state image sensing device comprises an interlayer film having a recess above a light receiving sensor unit as well as an intra-layer color filter having a protuberance formed by filling the recess in accordance with the curved surface of the recess, the protuberance having a curvature required for collecting the incident light onto the light receiving sensor unit.

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Tokyo, Japan

Hiroki Endo