Ckd Corporation

Tokyo Electron Limited

Hiroki Doi

Minoru Ito

Masayuki Kouketsu

Tsuneyuki Okabe

Hideki Nagaoka

Akiko Nakada

Jun Hirose

Akihiro Ito

Hiroshi Itafuji

Shuji Moriya

Hiroki Endo

Yasunori Nishimura

Takashi Kitazawa

Kazuyuki Miura

Shigeyuki Okura

Masayuki Watanabe

Keiki Ito

Tsuyoshi Shimazu

Yoji Mori

Akihito Sugino

Yukio Ozawa

Masaya Yamauchi

Keisuke Kato

Tetsujiro Kono

Osamu Katsumata

Tokuhide Nawata

Yoshihisa Sudoh

A four-way valve includes a body and a valve component. The body includes a valve chamber and first to fourth communication channels which communicate with the valve chamber at positions arranged in sequence in a predefined rotational direction and cause the valve chamber to communicate with an outside. The valve component is rotatable in the predefined rotational direction and switches the four-way valve to be in at least one of: a first state in which the first and second communication channels communicate with the first region and the third and fourth communication channels communicate with the third region; and a second state in which the second communication channel communicates with the first region, the third communication channel communicates with the second region, and the first and fourth communication channels communicate with the third region.

Four-way valve, valve unit, temperature control system

A gas supply unit and a gas supply system that are small-sized and inexpensive. The gas supply unit is installed on operation gas conveyance pipeline and has fluid control devices communicated via flow path blocks and controlling operation gas. The gas supply unit has the first flow path block, to one side of which an inlet open/close valve included in the fluid control devices is attached, and also has the second flow path block, to one side of which a purge valve included in the fluid control devices is attached. The first flow path block and the second flow path block are layered in the direction perpendicular to the conveyance direction of the operation gas. The inlet open/close valve and the purge valve are arranged between a mass flow controller installed on the operation gas conveyance pipeline and an installation surface where the unit is installed.

Gas supply unit and gas supply system

A flow rate verification failure diagnosis apparatus is applied to a gas supply pipe system including flow rate control devices and a flow rate verification unit for detecting flow rate abnormality by measuring flow rate of each of the flow rate control devices on the basis of pressure measured by a pressure measurement device. The flow rate verification failure diagnosis apparatus comprises a failure diagnosis device having a mode to diagnose a failure in the pressure measurement device at a time of the flow rate verification unit detecting the flow rate abnormality, thereby the reliability of flow rate verification can be enhanced.

Flow rate verification failure diagnosis apparatus, flow rate verification failure diagnosis system, flow rate verification failure diagnosis method, and control program product for flow rate verification failure diagnosis

A gas flow rate verification unit capable of enhancing reliability of gas flow rate verification. The gas flow rate verification unit has a first cutoff valve that is connected to a flow rate control device and to which gas is inputted, a second cutoff valve for discharging the gas, a communication member for allowing the first cutoff valve and the second cutoff valve to communicate with each other, a pressure sensor for detecting the pressure of the gas supplied between the first cutoff valve and the second cutoff valve, a temperature detector for detecting the temperature of the gas supplied between the first cutoff valve and the second cutoff valve, and a control means for verifying the flow of the gas flowing in the flow control device, the verification being performed by using both the result of the pressure detected by the pressure sensor and the result of the temperatures detected by the temperature detector. The volume (Vk) between the valve seat of the first cutoff valve and the valve seat of the second cutoff valve is equal to or less than the volume (Ve) between the outlet of the flow control device and the valve seat of the first cutoff valve.

Gas flow rate verification unit

Provided is a relative pressure control system has a simple configuration, but enables accurate regulation of a division ratio of an operation gas, and concurrently makes it possible to securely drain the operation gas from an operation gas pipeline in case of emergency. The system includes a plurality of air operated valves of a normally open type that are connected to an operation gas pipeline supplied with an operation gas; pressure sensors that are series connected to the respective air operated valves and that detect output pressures of the respective air operated valves; a controller that controls operation pressures of the respective air operated valves in accordance with the pressures detected by the pressure sensors; and a hard interlock solenoid valve that correlates the plurality of air operated valves to one another so that at least one of the plurality of air operated valves is normally opened. In the configuration, an opening of a specified one of the plurality of air operated valves is regulated, the operation gas is output at a predetermined division ratio.

Relative pressure control system and relative flow control system

A liquid raw material supply unit for a vaporizer is adapted to supply a liquid raw material to the vaporizer that vaporizes the liquid raw material. The unit comprises: a manifold internally formed with a flow passage; and a plurality of fluid control valves mounted on the manifold, wherein the plurality of fluid control valves includes: a liquid raw material control valve for controlling supply of the liquid raw material to the flow passage; a cleaning solution control valve for controlling supply of a cleaning solution to the flow passage; a purge gas control valve for controlling supply of a purge gas to the flow passage; and a first introducing control valve connectable to the vaporizer for controlling supply of a fluid from the flow passage to the vaporizer, the purge gas control valve, the cleaning solution control valve, the liquid raw material control valve, and the first introducing control valve being mounted on the manifold in this order from an upstream side of the manifold, wherein the flow passage is connected to valve ports of the plurality of control valves respectively, the valve ports communicating with valve openings of the respective control valves, and the flow passage is configured to allow the purge gas supplied from the purge gas control valve to directly flow in the valve ports of the cleaning solution control valve and the liquid raw material control valve placed downstream from the purge gas control valve.

Liquid raw material supply unit for vaporizer

A flow controller and a flow controlling method are adapted to be released from conventional restrictions by using a novel type called a pulse shot type. A pulse shot (opening/closing operation of a first cutoff valve () and, after that, opening/closing operation of a second cutoff valve ()) is repeated. Simultaneously, a volume flow Q of process gas exhausted from the second cutoff valve () per unit time on the basis of after-filling pressure and after-exhaust pressure of the process gas in a gas filling capacity () measure by a pressure sensor (). Furthermore, a mode of the pulse shot is changed to control the volume flow Q of the process gas exhausted from the second cutoff valve () per unit time.

Pulse shot type flow controller and pulse shot type flow controlling method

Growing community of inventors

Kasugai, Japan

Hiroki Doi