Nichia Corporation

Hiroki Abe

Ryota Funakoshi

Tomoya Yamashita

Kenji Uchida

A light-emitting element includes: a first light-emitting portion includes, in order upward from a lower side, a first n-side layer, a first active layer, and a first p-side layer disposed, each made of a nitride semiconductor; an intermediate layer disposed over the first light-emitting portion and made of a nitride semiconductor including an n-type impurity; and a second light-emitting portion disposed over the intermediate layer and comprising, in order upward from a lower side, a second n-side layer, a second active layer, and a second p-side layer, each made of a nitride semiconductor. An n-type impurity concentration in the intermediate layer is greater than an n-type impurity concentration in the first n-side layer. The first p-side layer includes: a first layer including aluminum and gallium, and a second layer disposed above the first layer, including aluminum and gallium.

Light-emitting element including p-side layer with first and second layers having different p-type impurity concentrations and method for manufacturing same

A method for manufacturing a light-emitting element includes: forming a first light-emitting part comprising a first n-type semiconductor layer, a first active layer on the first n-type semiconductor layer, and a first p-type semiconductor layer on the first active layer; forming an intermediate layer on the first light-emitting part; and forming a second light-emitting part on the intermediate layer, the second light-emitting part comprising a second n-type semiconductor layer, a second active layer on the second n-type semiconductor layer, and a second p-type semiconductor layer on the second active layer.

Method for manufacturing light-emitting element

A nitride semiconductor light emitting element includes: n-side and p-side nitride semiconductor layers; and an active layer. The active layer includes a plurality of well layers and a plurality of barrier layers. The plurality of well layers include first well layers, and second well layers positioned closer to the p-side nitride semiconductor layer than the first well layers. At least one of the plurality of barrier layers positioned between the first well layers and at least one of the plurality of barrier layers positioned between the second well layers respectively include a first barrier layer containing an n-type impurity, and a second barrier layer, wherein a concentration of the n-type impurity in the second barrier layer is lower than a concentration of the n-type impurity in the first barrier layer, and wherein the second barrier layer is positioned closer to the p-side nitride semiconductor layer than the first barrier layer.

Growing community of inventors

Komatsushima, Japan

Hiroki Abe