Canon Kabushiki Kaisha

Hirohito Ito

Kotaro Akutsu

Shinji Uchida

Choshoku Sai

Katsumi Asada

Shigeo Sakino

Eiji Osanai

Nobushige Korenaga

Makoto Miyazaki

Yusuke Sugiyama

A charged-particle beam exposure apparatus which includes a deflector that deflects a charged-particle beam, and a stage mechanism that drives a substrate, and draws a pattern on the substrate while scanning the charged-particle beam in a main-scanning direction by the deflector and scanning the substrate in a sub-scanning direction by the stage mechanism. The apparatus includes a blanker unit configured to control irradiation and unirradiation of the substrate with the charged-particle beam, and a controller configured to control the deflector to deflect the charged-particle beam in the sub-scanning direction by an amount of driving of the substrate in the sub-scanning direction by the stage mechanism during a period of time from stop of drawing on the substrate until restart thereof when the drawing on the substrate is stopped and then restarted while the substrate is driven in the sub-scanning direction by the stage mechanism.

Charged-particle beam exposure apparatus and method of manufacturing article

A scanning apparatus which performs scan on an object with a charged particle beam includes: a blanking deflector configured to individually blank a plurality of charged particle beams based on control data; a scanning deflector configured to collectively deflect the plurality of charged particle beams to perform the scan; and a controller. The controller is configured to hold first data used to obtain error in a scanning amount and a scanning direction of the scanning deflector relative to a reference scanning amount and a reference scanning direction with respect to each of the plurality of charged particle beams, and to generate the control data based on the first data so that the scan is performed for a target region on the object.

Scanning apparatus, drawing apparatus, and method of manufacturing article

A positioning apparatus according to the present invention includes: a tabletop having a plane; a plurality of actuators configured to be driven in a direction perpendicular to the plane to move the tabletop; and a control unit configured to measure a frequency response of the tabletop and, when a peak is detected at the resonance frequency of elastic vibration of the tabletop, adjust the thrust distribution ratio for the plurality of actuators to reduce the peak.

Positioning apparatus, exposure apparatus, and device manufacturing method

An imprint apparatus is disclosed that forms, by pressing a resin applied onto a substrate and a mold against each other, a pattern on the substrate. The imprint apparatus includes a substrate stage that holds the substrate, and a control unit for controlling the position of the stage by outputting a manipulating variable on the basis of a position error between a position of the stage which has been measured by position measurement unit and a target position. The control unit reduces a ratio of the manipulating variable to the position error while the substrate and the mold are in contact with each other until mold release.

Imprint apparatus and method for producing article

An optical unit including a plate, an optical element, a fixing device for partially fixing the optical element against the plate, and a deforming device, located between the plate and the optical element, for applying a deforming force to the optical element to change a surface shape of the optical element. The deforming device includes poles for contacting a back face of the optical element, and actuators for driving the poles against the plate.

Optical unit and exposure apparatus having the same

In driving a movable body in a target direction, a force in another direction, which may act on the movable body, is reduced. A system includes a current amplifier, which drives X1 and X2 electromagnets (a first actuator) for aligning the movable body in the X direction, a system including a current amplifier, which drives Y1 and Y2 electromagnets (a second actuator) for aligning the movable body in the Y direction, a subordinate direction component correction unit, which reduces a force in the Y direction acting on the movable body when driving the movable body in the X direction by the first actuator, and a subordinate direction component correction unit, which reduces a force in the X direction acting on the movable body when driving the movable body in the Y direction by the second actuator.

Alignment apparatus

At least one exemplary embodiment is directed to an optical element driving apparatus which includes a first actuator configured to drive an optical element in accordance with a deformation target value, a sensor arranged to measure a position and an orientation of the optical element, a second actuator configured to drive the optical element in accordance with position and orientation target values and an output of the sensor, and a correcting unit configured to correct a measurement error of the sensor caused by deformation of the optical element.

Optical element driving apparatus

A fluid control mechanism includes a laser irradiation control unit to control irradiation of a light beam generated by a laser generation unit, and a liquid tank, having at least one liquid passing port and a lens to collect the light beam in the liquid tank, to hold liquid. The laser irradiation control unit emits the light beam to the lens to collect the light beam by the lens, thereby causing thermal expansion of the liquid in the liquid tank, to control inflow/outflow of the liquid via the liquid passing port.

Fluid control mechanism

A mirror apparatus including a reflecting mirror reflecting light, partition walls, the walls and the reflecting mirror defining a plurality of air chambers, and a regulator regulating air pressure in at least one of the air chambers. With this configuration, the front surface of the reflecting mirror is deformed into a smooth shape so as to correct optical aberration.

Reflecting mirror and exposure apparatus using the same

An optical micromotor having a rotor the rotation whereof can be controlled flexibly and freely through simple arrangement, and a micropump that uses this micromotor. The optical micromotor and the micropump have a rotor () that rotates about a central axis. The rotor () has an optical trap (bead) (), which is trapped by a light beam (), provided at least at one location thereon. When the optical trap () is irradiated with the laser beam (), the rotor is held at a prescribed position together with the optical trap (). When the laser beam () is moved or changed over, the rotor () rotates about the central axis together with the optical trap ().

Optical micromotor, micropump using same and microvalve using same

At least one exemplary embodiment is directed to an optical element holding apparatus including a force generating actuator configured to deform the optical element, a measuring device configured to measure a position of the optical element, and a displacement causing actuator configured to position the optical element based on the measured position.

Optical element holding apparatus, exposure apparatus and device manufacturing method

A positioning device includes a stage which is movable along a reference surface, a stage driving mechanism for driving the stage, and an inertia imparting mechanism for reducing a reaction force produced by driving the stage. The inertia imparting mechanism has a mass body, which is movable with respect to a stage base or a structure, and a mass body driving mechanism for driving the mass body, and the stage base or structure is given inertia by driving the mass body. The inertia imparting mechanism also includes a reaction force compensation, which, by moving the mass body, reduces reaction force caused by motion of the stage, and a positioning compensation control system, which compensates for the position of the mass body. Thus, it is possible to reduce a reaction force produced by motion of the stage, and to compensate for position offset of the mass body.

Positioning device, exposure device, and device manufacturing method

A positioning apparatus includes a movable stage, a first linear motor for moving the stage in a predetermined direction, a platform for supporting the first linear motor, and an inertial force application mechanism for applying a force for canceling a force acting on the platform, which is generated when the stage is moved by the first linear motor. The inertial force application mechanism includes amass body, a guide for supporting and guiding the mass body, a second linear motor for moving the mass body, and a controller for controlling the second linear motor. Since the inertial force application mechanism of the positioning apparatus prevents transmission of vibration generated by an increase in an exciting force of the stage, rapid and precise positioning can be performed.

Positioning apparatus and exposure apparatus using the same

A precision stage is provided so as to be movable along the Z axis, in the .theta. direction, which is the direction of rotation about the Z axis, and in two oblique directions inclined with respect to the Z axis. The stage has a sensor for measuring stage position along the Z axis. Reference-position return of this sensor is carried out. Reference-position return of two Y laser interferometers for measuring the .theta. position of the precision stage is carried out in a state in which the positions of the precision stage in the direction along the Z axis and in the oblique directions are held at predetermined reference positions. After this reference-position return is carried out, reference-position return is performed with regard to an X laser interferometer and the two Y laser interferometers in a state in which the positions of the precision stage in the direction along the Z axis, in the oblique directions and in the .theta. direction are held at predetermined reference positions.

Growing community of inventors

Utsunomiya, Japan

Hirohito Ito