Mitsubishi Heavy Industries Limited

Hirohisa Yoshida

Masayoshi Murata

Tetsuro Shigemizu

Keisuke Kawamura

Shigeru Nojima

Masanao Yonemura

Yoshiaki Takeuchi

Toshinobu Yasutake

Setsuo Omoto

Akemi Takano

Hiroshi Mashima

Keiji Fujikawa

Naohiko Ishibashi

Satoru Watanabe

Masami Kondo

Katsuki Yagi

A gas supplying system for fuel cell includes a reformer generating a reformed gas by reforming a mixed raw material including a fuel and a first water, a piping network distributing the reformed gas to fuel cell systems each of which is installed in different rooms or buildings, a drain recovery unit recovering a water condensed from the reformed gas in the piping network. The piping network has a circulating route. By the circulation route, the reformed gas does not stay in the piping network so that the water condensation in the piping is suppressed. The water in the piping is removed by the drain recovery unit. According to this configuration, the clogging and corrosion of the piping caused by the condensed water is avoided.

Gas supplying system and gas supplying method

A fuel cell power generation system, equipped with a fuel reforming device and a fuel cell body, includes valves, pipelines, a condenser, and a pump for feeding a burner exhaust gas (raw gas) discharged from a heating burner of the fuel reforming device into the fuel reforming device, and an inert gas formation device including an oxidizable and reducible oxygen adsorbent, which is disposed in the pipelines, and adsorbs oxygen in the burner exhaust gas to remove oxygen from the burner exhaust gas and form an inert gas. The fuel cell power generation system can reliably remove residual matter, without leaving it within the fuel reforming device, in a simple manner at a low cost and with a compact configuration.

Fuel cell power generation system and method for operating the same

Disclosed is a plasma chemical vapor deposition apparatus for forming an amorphous thin film, a microcrystalline thin film or a polycrystalline thin film on a surface of a target substrate by utilizing a glow discharge generated by an electric power supplied from a power source, comprising a reaction vessel, means for supplying a reactant gas into the reaction vessel, discharge means for discharge a waste gas of the reactant gas out of the reaction vessel, a ladder-shaped electrode for discharge generation arranged within the reaction vessel, a power source for supplying a high frequency power of 30 MHz to 200 MHz to the ladder-shaped electrode for a glow discharge generation, a heater for heating and supporting a target substrate, the heater being arranged within the reaction vessel in parallel to the ladder-shaped electrode for discharge generation, and a power distributor for uniformly distributing a high frequency power to the ladder-shaped electrode for discharge generation through a power supply wire.

Plasma chemical vapor deposition apparatus

An apparatus and method for treating exhaust gases. In this apparatus, a plurality of stages of reactor chambers (R , R , . . . R ) are connected in series in the direction of an exhaust gas flow. Further, high-voltage power supplies (V , V , . . . and V ) are connected to the reactor chambers (R , R , . . . and R ), respectively. Moreover, in each of these reactor chambers, a streamer discharger plasma is generated. Furthermore, the more downstream a reactor chamber of a stage is placed, the lower energy to be cast into the reactor chamber becomes. The density of electrons generated in a gas decomposition unit is high in a portion thereof on the upstream side of the exhaust gas flow and the electron density is low in a portion thereof on the downstream side. Additionally, the present invention further provides a pulse generator in which a high voltage, which is an output voltage of a D.C. charger (V ), is simultaneously applied to a plurality of distributed constant lines (or transmission lines) (1 , 1 , 2 , 2 , . . . , N and N ), which are connected in parallel with one another, by means of a signal shortcircuit switch (S ).

Pulse generator for treating exhaust gas

An apparatus and method for treating exhaust gases. A plurality of stages of reactor chambers are connected in series in the direction of an exhaust gas flow. High-voltage power supplies are connected to the reactor chambers In each of these reactor chambers, a streamer discharger plasma is generated. The more downstream a reactor chamber of a stage is placed, the lower energy to be cast into the reactor chamber becomes. The density of electrons generated in a gas decomposition unit is higher on the upstream side of the exhaust gas flow and the electron density is lower on the downstream side. A pulse generator is provided in which a high voltage, which is an output voltage of a D.C. charger (V,), is simultaneously applied to a plurality of distributed constant lines, which are connected in parallel with one another, by a signal shortcircuit switch (S,).

Apparatus and method for treating exhaust gas and pulse generator used therefor

An apparatus and method for treating exhaust gases. In this apparatus, a plurality of stages of reactor chambers (R.sub.1, R.sub.2, . . . . and R.sub.n) are connected in series in the direction of an exhaust gas flow. Further, high-voltage power supplies (V.sub.1, V.sub.21 . . . and V.sub.n) are connected to the reactor chambers (R.sub.1, R.sub.2, . . . . and R.sub.n), respectively. Moreover, in each of these reactor chambers, a streamer discharger plasma is generated. Furthermore, the more downstream a reactor chamber of a stage is placed, the lower energy to be cast into the reactor chamber becomes. The density of electrons generated in a gas decomposition unit is high in a portion thereof on the upstream side of the exhaust gas flow and the electron density is low in a portion thereof on the downstream side. Additionally, the present invention further provides a pulse generator in which a high voltage, which is an output voltage of a D.C. charger (V.sub.0), is simultaneously applied to a plurality of distributed constant lines (or transmission lines) (1.sub.-1, 1.sub.-2, 2.sub.-1, 2.sub.-2, . . . , N.sub.-1 and N.sub.-2), which are connected in parallel with one another, by means of a signal shortcircuit switch (S.sub.1).

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Hiroshima, Japan

Hirohisa Yoshida