Mitsui Chemicals, Inc.

Hirohisa Shiode

Mai Kimura

Kenichi Suzuki

Kouya Kojima

Akio Matsubara

Toshikazu Sakamaki

Takashi Koura

Shingo Kajiyama

Takayuki Kubo

Toshikazu Gomi

A photocurable composition for manufacturing a dental prosthesis by stereolithography, including: a photopolymerization initiator; and a (meth)acrylic monomer component including an acrylic monomer (X) having no aromatic rings and having a ring structure other than an aromatic ring and two or more acryloyloxy groups in one molecule and having an Mw of from 200 to 800, and at least one of a (meth)acrylic monomer (A) having one or more ether bonds and two (meth)acryloyloxy groups in one molecule and having a defined Mw, a (meth)acrylic monomer (B) having a ring structure other than an aromatic ring and one (meth)acryloyloxy group in one molecule and having a defined Mw, a (meth)acrylic monomer (C) having a hydrocarbon skeleton and two (meth)acryloyloxy groups in one molecule and having a defined Mw, and a (meth)acrylic monomer (D) having one or more aromatic rings and one (meth)acryloyloxy group in one molecule and having a Mw.

Photocurable composition, denture base, and plate denture

The present invention provides a photocurable composition which is used for the production by stereolithography of a dental prosthesis or the like. This photocurable composition contains a (meth)acrylic monomer component and a photopolymerization initiator; and the (meth)acrylic monomer component contains: an acrylic monomer (X) containing, within one molecule, two aromatic rings and two acryloyloxy groups, and having a Mw of from 400 to 580; and at least one of: a (meth)acrylic monomer (A) containing, within one molecule, one or more ether bonds and two (meth)acryloyloxy groups, and having a Mw of from 200 to 400; a (meth)acrylic monomer (B) not containing, within one molecule, a ring structure other than an aromatic ring and one (meth)acryloyloxy group, and having a Mw of from 130 to 240; or a (meth)acrylic monomer (C) containing, within one molecule, a hydrocarbon skeleton and two (meth)acryloyloxy groups, and having a Mw of from 190 to 280.

Provided is a photocurable composition including a monomer component including: a monomer (X) containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and having an Mw of from 400 to 580, and a monomer (H) containing, within one molecule, at least one of a hydroxyl group or a carboxy group, and a (meth)acryloyloxy group, and having an Mw of from 100 to 700; and a photopolymerization initiator. The composition has a functional group value (a) of from 0.5&#xd7;10to 2.0&#xd7;10mol/g.Functional group value ()=()&#xd7;&#x2003;&#x2003;Formula (a)wherein nrepresents the total number of hydroxyl groups and carboxy groups contained in one molecule of the (meth)acrylic monomer (H); Mrepresents the Mw of the (meth)acrylic monomer (H); and Prepresents the mass ratio of the (meth)acrylic monomer (H) with respect to the total amount of the (meth)acrylic monomer component.

It is an object of the present invention to provide a stable production process for a melt-blown nonwoven fabric comprising thin fibers and having extremely few thick fibers [number of fusion-bonded fibers] formed by fusion bonding of thermoplastic resin fibers to one another, and an apparatus for the same. The present invention relates to a melt-blown nonwoven fabric comprising polyolefin fibers and having (i) a mean fiber diameter of not more than 2.0 &#x3bc;m, (ii) a fiber diameter distribution CV value of not more than 60%, and (iii) 15 or less fusion-bonded fibers based on 100 fibers; a production process for a melt-blown nonwoven fabric characterized by feeding cooling air of not higher than 30&#xb0; C. from both side surfaces of outlets of slitsfrom which high-temperature high-velocity air is gushed out and thereby cooling the spun molten resin; and a production apparatus for the same.

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Yokohama, Japan

Hirohisa Shiode