Sharp Kabushiki Kaisha Corporation

Hirohide Mimura

Tohru Okabe

Hirohiko Nishiki

Kazuatsu Ito

Yuhichi Saitoh

Shogo Murashige

Izumi Ishida

Yujiro Takeda

Shinji Nakajima

Masahito Sano

A display device includes: a first gate insulating film; a first interlayer insulating film; a lower metal layer; an oxide semiconductor layer; a second gate insulating film; a second gate electrode; a second interlayer insulating film; and an upper metal layer being sequentially provided on a substrate, wherein the oxide semiconductor layer includes a second channel region and a second conductor region, the second gate insulating film is disposed in alignment with the second gate electrode, a first contact hole is provided in the first gate insulating film and the first interlayer insulating film, the lower metal layer includes a second conductor connection wiring line, a protection layer having an island shape is provided between the second conductor region and the second interlayer insulating film, a second contact hole exposing the second conductor connection wiring line is provided in the protection layer and the second interlayer insulating film.

Display device

Provided is a method for manufacturing a semiconductor device, the semiconductor device including a substrate, and an oxide semiconductor TFT that is supported by the substrate and includes an oxide semiconductor film as an active layer. The method includes: (A) preparing MO gas containing a first organometallic compound that contains In and a second organometallic compound that contains Zn; and (B) supplying gas containing the MO gas and oxygen to the substrate placed in a chamber under a condition in which the substrate is heated to 500&#xb0; C. or lower, and growing an oxide semiconductor film containing In and Zn on the substrate using an MOCVD method. Step (B) is performed under a condition in which plasma is formed in the chamber.

Method for manufacturing semiconductor device and film forming apparatus

Growing community of inventors

Sakai, Japan

Hirohide Mimura