Nichia Corporation

Hirofumi Nishiyama

Shinichi Daikoku

Yasuhiro Miki

Masahiko Onishi

Shusaku Bando

Shunsuke Minato

Hidetoshi Tanaka

Seiichi Hayashi

Toshinori Wada

Kentaro Yagi

A stacked body includes a long side and a short side in a top view. The long side extends in a first direction. The short side extends in a second direction orthogonal to the first direction. The short side is shorter than the long side. A light emission peak wavelength of a first active layer is different from a light emission peak wavelength of a second active layer. A first n-type layer includes a first n-side contact portion contacting a first electrode. A second n-type layer includes a second n-side contact portion contacting a second electrode. In a top view, a center of the first n-side contact portion is separated from a first line that passes through a center of the second n-side contact portion and is parallel to the first direction.

Light-emitting element

A light emitting element includes a first light emitting portion and a second light emitting portion. The first light emitting portion includes a first stacked body having a first n-type layer, a first active layer, a first p-type layer, a first tunnel junction layer, and a second n-type layer. The second light emitting portion includes a second stacked body having a third n-type layer, a second p-type layer, a second tunnel junction layer, a fourth n-type layer, a second active layer, a third p-type layer, and a transmissive conductive film. A resistivity of the second n-type layer is higher than a resistivity of the transmissive conductive film. A thickness of the second n-type layer is larger than a thickness of the transmissive conductive film.

Light-emitting element and method for manufacturing light-emitting element

A method of manufacturing a light emitting element includes forming an n-side electrode at a lateral surface of an n-type semiconductor layer so as not to cover a light extraction surface. Using a portion of a silicon substrate left on an n-type semiconductor layer as a mask, an insulating film formed at a lateral surface of a semiconductor layered body is removed, to expose a lateral surface of the n-type semiconductor layer and a lateral surface of a resin layer. An n-side electrode positioned between the lateral surface of the n-type semiconductor layer and the lateral surface of the resin layer and connected to the exposed lateral surface of the n-type semiconductor layer is formed. Thereafter, the portion of the silicon substrate is removed, to expose the n-type semiconductor layer.

Method of manufacturing light emitting element

A method includes: bonding a surface of a first wafer on a side having a semiconductor layer to a surface of a second wafer on a side having a first electrode to electrically connect the semiconductor layer and the first electrode; etching a silicon substrate such that a first portion of the silicon substrate remains in a region overlapping with the first electrode in a plan view; etching the semiconductor layer using the first portion as a mask such that a portion of the semiconductor layer between the first portion and the first electrode remains as at least one light-emitting portion; forming a resin layer to cover a lateral surface of the first portion and a lateral surface of the light-emitting portion with the resin layer; removing the first portion to expose the light-emitting portion; and forming a light-transmissive electrically conductive film on or above the light-emitting portion.

Method of manufacturing light-emitting device

A method of manufacturing the light-emitting device includes providing a structure body, mounting the structure body, removing a third substrate region of a silicon substrate of the structure body, disposing a resin layer, disposing a first mask member, removing a first substrate region of the silicon substrate, disposing a first wavelength conversion layer, removing the first mask member, and removing a second substrate region of the silicon substrate.

A method for manufacturing a light-emitting element comprises: forming a mask comprising a first film and a second film such that the mask covers a first active layer and a second nitride semiconductor layer, which comprises: forming the first film covering at least an upper surface of the second nitride semiconductor layer, and forming the second film covering the first film; while the first active layer and the second nitride semiconductor layer are covered with the mask, forming a third nitride semiconductor layer at an exposed portion of a first nitride semiconductor layer, wherein a temperature at which the third nitride semiconductor layer is formed is less than a melting point of the second film; and after the forming of the third nitride semiconductor layer, removing the mask, during which lift-off of the mask is performed by removing the first film, which also removes the second film.

Method for manufacturing light-emitting element

A method of manufacturing a light emitting device includes: providing a wafer that comprises: a supporting substrate, and a plurality of light emitting structures arranged in a two-dimensional array on a first principal surface of the supporting substrate along a first direction and a second direction, each of the plurality of light emitting structures comprising a first semiconductor layer, which includes a first region and a second region, and a second semiconductor layer, which covers the second region of the first semiconductor layer, wherein the plurality of light emitting structures includes a first light emitting structure and a second light emitting structure; forming a recess in the first principal surface of the supporting substrate between the first light emitting structure and the second light emitting structure; forming a resin layer in the recess; and removing the supporting substrate so as to expose the first semiconductor layer.

Method of manufacturing light emitting device

A method of manufacturing a light emitting device includes: (a) providing a wafer that includes a plurality of light emitting structures, each including a first and second semiconductor layer; (b) forming a first insulating layer so as to cover the light emitting structures and define first and second through-holes corresponding to a respective one of the light emitting structures; (c) forming electrically-conductive structures, each electrically connected with a respective one of the first semiconductor layers and first wirings, each electrically connected with a column of the second semiconductor layers aligned in a second direction; (d) forming a second insulating layer so as to cover the first wirings, the second insulating layer defining third through-holes each disposed above a respective one of the first electrically-conductive structures; and (e) forming second wirings, each electrically connected with a row the first electrically-conductive structures aligned in a first direction.

A nitride group semiconductor light emitting device includes a nitride group semiconductor layer, and an electrode structure. The electrode structure is arranged on or above the semiconductor layer, and includes a plurality of deposited metal layers. The plurality of deposited metal layers of the electrode structure includes first and second metal layers. The first metal layer is arranged on the semiconductor layer side. The second metal layer is arranged on or above the first metal layer. The first metal layer contains Cr, and a first metal material. The first metal material has a reflectivity higher than Cr at the light emission peak wavelength of the light emitting device. According to this construction, the first metal layer can have a higher reflectivity as compared with the case where the first metal layer is only formed of Cr, but can keep tight contact with the semiconductor layer.

Nitride group semiconductor light emitting device

To provide a method of manufacturing a nitride semiconductor light emitting element, which has a small number of steps and thus, can improve productivity, the method of manufacturing a nitride semiconductor light emitting element including a nitride semiconductor light emitting element structure having an n-type nitride semiconductor layer and a p-side nitride semiconductor layer which are laminated on a substrate, an n-side pad electrode connecting surface and a p-side pad electrode connecting surface which are formed on the same plane of the substrate; a n-side pad electrode on the n-side pad electrode connecting surface; and a p-side pad electrode on the p-side pad electrode connecting surface, and in the manufacturing method, a pad electrode layer forming step, a resist pattern forming step, a pad electrode layer etching step, a protective layer forming step and a resist pattern removing step are sequentially performed.

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Tokushima, Japan

Hirofumi Nishiyama