Tokyo Ohka Kogyo Co., Ltd.

Hiroaki Tomida

Hideo Hada

Takeshi Iwai

Masaaki Muroi

Kota Atsuchi

Masaru Takeshita

Ryotaro Hayashi

Miwa Miyairi

Hirokazu Ozaki

Masaaki Shimazaki

Kazuyuki Shiotani

A technique to acquire a photoresist composition which can reduce occurrence of defects of a resist pattern after development is provided. Further, a technique to obtain a photoresist composition having excellent storage stability characteristics as a resist solution (storage stability); and a technique to obtain a photoresist composition which reduces the change of sensitivity and resist pattern size after treatment almost completely are provided. A photoresist composition containing a resin component (A), an acid-generating component (B) for generating an acid under exposure, and an organic solvent (C) is passed through a first filterequipped with a first membrane having zeta potential of more than &#x2212;20 mV but no more than 15 mV in distilled water of pH 7.0.

Process for producing photoresist composition, filter, coater and photoresist composition

A process is provided for effectively removing by-products such as oligomers contained within a crude resin for an electronic material, thus producing a resin for an electronic material. In this process, a crude resin for an electronic material containing (a1) structural units derived from a (meth)acrylate ester with a hydrophilic site is washed using (b1) an organic solvent which is capable of dissolving said crude resin for an electronic material and which separates into two layers when combined with water, and (b2) water.

Process for refining crude resin for electronic material

A process for refining a crude resin for a resist which is capable of effectively removing by-products such as polymers and oligomers contained within the crude resin. The refining process for the crude resin of resist resin (A) used in a photoresist composition includes at least the resist resin (A) and an acid generator (B) dissolved in a first organic solvent (C), such that if the concentration of the component (A) in the photoresist composition is labeled X, and the crude resin concentration of the component (A) in a crude resin solution including the crude resin of the component (A) dissolved in a second organic solvent (C) is labeled Y, then (i) the crude resin solution is prepared so that Y is smaller than X, and (ii) the crude resin solution is subsequently filtered.

Process for refining crude resin for resist

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Kawasaki, Japan

Hiroaki Tomida