International Business Machines Corporation

Pioneer Corporation

Anelva Corporation

Kabushiki Kaisha Toshiba

Hiroaki Kitahara

Yasumitsu Wada

Masatomo Takeichi

Evan G Colgan

Kai R Schleupen

Yoshiaki Kojima

Hisanori Kinoshita

Paul Stephen Andry

Nobuyuki Takahashi

Frank Robert Libsch

Takatoshi Tsujimura

Shinichi Kimura

Kouhei Suzuki

Masahiro Katsumura

Yoshikazu Ichioka

Toshihiko Yoshida

Hiroshi Takatsuji

Satoshi Tsuji

Yasuhiko Shiota

Yoshiharu Fujii

Tatsuya Nishiwaki

Johji Nakagaki

Meiko Ogawa

Hideo Kimura

Takeshi Yamada

Shigenori Murakami

Akihiro Asahara

A light distribution of light from a light-emitting device () has a higher luminous intensity in a first direction (D) compared to a reference direction (R), the first direction (D) being different from the reference direction (R). The reference direction (R) is a center direction of the light distribution, for example, a direction along the thickness direction of a substrate (), a direction along the width direction of each layer (for example, an EML ()) of a resonator (), or a normal direction of a second surface () of the substrate (). In addition, the light distribution has a higher luminous intensity in a second direction (D) compared to the reference direction (R), the second direction (D) being on an opposite side of the first direction (D) with respect to the reference direction (R).

Light-emitting device

An optically functional layer () is formed over a part of a second surface () of a substrate (). A first electrode () is formed over the optically functional layer (), and a second electrode () is formed over the first electrode (). An organic layer () is located between the first electrode () and the second electrode () and includes a light emitting layer. A plurality of the second electrodes () are formed. At least a part of a region between the plurality of second electrodes () has optical transparency. At least a part of an edge of the second electrode () is located outside the optically functional layer ().

Light emitting device

A standard direction (S) is a horizontal direction (a direction along X direction in the drawing). A base material () is supported by a frame body () so that a second surface () of the base material () is oriented obliquely upward from the standard direction (S). Thereby, a reference direction (R) is oriented obliquely upward from the standard direction (S). A light distribution of light from a light-emitting region () (more specifically, a light-emitting unit ()) has a maximum value in a first direction (D). The first direction (D) is different from the standard direction (S). Specifically, an angle formed between the first direction (D) and the reference direction (R) is greater than an angle formed between the standard direction (S) and the reference direction (R).

Light-emitting system and mobile object

A standard direction (S) is a horizontal direction (a direction along X direction in the drawing). A base material () is supported by a frame body () so that a second surface () of the base material () is oriented obliquely upward from the standard direction (S). Thereby, a reference direction (R) is oriented obliquely upward from the standard direction (S). Light from the light-emitting system () has standard chromaticity in the standard direction (S). In addition, the light from the light-emitting system () has first chromaticity and second chromaticity in a first side direction (S) and a second side direction (S), respectively, the first side direction (S) and the second side direction (S) being symmetric with respect to the standard direction (S). A difference between the first chromaticity and the standard chromaticity is smaller than a difference between the second chromaticity and the standard chromaticity.

Light-emitting system

An electron beam recording apparatus includes: a displacement detection unit including at least three displacement sensors disposed at each different angle in a radial direction of the turntable; a shape calculation unit for calculating, based on the detected displacements by the at least three displacement sensors, shape data corresponding to displacements of side surface of the turntable in the radial directions; a rotation runout computing unit for computing, based on the shape data and at least one displacement detected by the at least three displacement sensors, rotation runout of the turntable including a rotation asynchronous component and a rotation synchronous component; and a beam irradiation position adjustment unit for adjusting an irradiation position of the electron beam based on the rotation runout.

Beam recording apparatus and beam adjustment method

An example electron beam drawing apparatus includes an electron beam emitting unit which emits an electron beam, a rotary stage which rotatably supports a turntable for retaining a drawing object, and a sample stage which is supported by the turntable in a range including a rotating center of the turntable to retain an adjustment sample. A rotationally symmetrical pattern such as a concentric pattern and a radial pattern can be drawn in the drawing object by irradiating the drawing object with the electron beam during rotation of the turntable. Before the pattern is actually drawn in the drawing object, beam adjustment and rotating center adjustment are performed using an adjustment sample. The adjustment sample is retained by the sample stage, and the sample stage is supported by the turntable in the range including the rotating center of the turntable. Therefore, the beam adjustment and the rotating center adjustment can be performed using the adjustment sample supported by the turntable, and the different stage for placing the adjustment sample is not required, which allows the apparatus to be miniaturized.

Electron beam drawing apparatus

An apparatus and method for forming an alignment layer with uniform orientation is provided. An alignment layer-forming apparatus includes an ion source for generating ion beams and one or more masks disposed between the ion source and a substrate. The masks each have a reflective face directed to the substrate. The ion beams are reflected between the reflective face of each mask and a thin-film which is disposed on the substrate and which is processed into an alignment layer, whereby the alignment layer is formed with the ion beam finally applied to the thin-film. The orientation of a liquid crystal can be rendered uniform by varying the shape and/or arrangement of the reflective face of the mask. Hence, a liquid crystal display with no brightness or color non-uniformity can be manufactured.

Apparatus and method for forming an alignment layer

A beam adjusting sample having a flat surface being like a plate and having two edges orthogonal to each other is employed. A beam is applied to the beam adjusting sample to detect an amount of the beam passing through the beam adjusting sample. The beam vertically scans the two edges.

Beam adjusting sample, beam adjusting method and beam adjusting device

A laser-based measuring apparatus divides a light beam from a laser light source into at least two light beams, passes the light beams through different optical paths from each other, recombines the light beams, has the light beams interfere with each other to generate interfered light, opto-electrically transduces the interfered light to an optical frequency, and measures the amount of travel of an object which changes an optical path length of a portion of an optical path based on the optical frequency. The measuring apparatus has a portion for generating at least two measuring light beams from the laser light source, two reflection planes included in an object moving on a measuring axis, arranged back-to-back to each other on the measuring axis, and an opposing incident optical system for directing the measuring light beams into the reflection planes, respectively, such that the measuring light beams oppose to each other on the measuring axis.

Laser-based measuring apparatus for measuring an axial run-out in a cylinder of rotation and method for measuring the same utilizing opposing incident measuring light beams

A laser distance measuring system has a simple optical structure with which abnormal return light can be removed. The laser distance measuring system includes a laser light source that generates at least two interferable light beams with different frequencies on a same optical axis, a parallel reflecting portion that includes a reflecting surface, which is included in an object that moves along a measurement axis and that is arranged on the measurement axis, and returns an incident light beam in a direction opposite that at which it is incident and at a certain spacing from and parallel to the incident light beam, and an interferometer that is positioned between the laser light source and the parallel reflecting portion and that is arranged on the measurement axis. The optical axes of the light beams are displaced parallel to one another from the measurement axis and one of the light beams is passed through the interferometer and guided to the parallel reflecting portion. The interferometer has a flat reflector that maintains a light path of the light beam that is returned by the parallel reflecting portion.

Laser distance measuring system and laser distance measuring method

A liquid crystal device (and method for forming the LCD) includes a first transparent substrate having a first surface and a second surface, and a second transparent substrate having a first surface and a second surface. The first transparent substrate and the second transparent substrate are arranged such that the first surface of the first transparent substrate faces the first surface of the second transparent substrate, and a liquid crystal material is enclosed between the first surface of the first transparent substrate and the first surface of the second transparent substrate. A pixel array, in which a plurality of pixel regions are arranged in row and column directions and data signals are applied to the pixel regions through data lines, is formed on the first surface of the first transparent substrate and the first surface of the second transparent substrate.

Liquid crystal display device and method for fabricating the same

A method for opening resist in raised areas of a semiconductor device, in accordance with the present invention, includes forming a conductive layer over a channel insulator layer to form a raised portion which includes a height above a substantially planar surrounding area. The channel insulator layer is aligned to a gate electrode. A photoresist layer is formed over the raised portion and the surrounding area and the photoresist is patterned by employing a gray scale light mask to reduce exposure light on the photoresist on the conductive layer over the raised portion such that after developing the photoresist, the photoresist is removed over a top surface of the raised portion but remains in the surrounding area. The conductive layer is etched in accordance with the photoresist to form source and drain electrodes which are self aligned to the channel insulator layer.

Method of forming fully self-aligned TFT improved process window

A method for opening resist in raised areas of a semiconductor device. In one aspect, a conductive layer is formed over a channel insulator layer to form a raised portion including a height above a substantially planar surrounding area, the channel insulator layer being aligned to a gate electrode. A photoresist layer is formed over the raised portion and the surrounding area, and patterned by employing a gray scale light mask to reduce exposure light on the photoresist over the raised portion. Then, the photoresist is etched to thin it such that a gap is formed in the photoresist down to the conductive layer over the raised portion, but the photoresist remains everywhere else, and the conductive layer is etched in accordance with the photoresist to form source and drain electrodes which are self aligned to the channel insulator layer.

Method of forming fully self-aligned TFT with improved process window

A method for etching a hydrogenated amorphous silicon layer and a metal layer formed thereon in a dry etching tool, is described incorporating the steps of selectively etching the metal layer on the hydrogenated amorphous silicon layer and etching the hydrogenated amorphous silicon layer. The invention overcomes the problem of performing sequential dry etching of a metal layer and a hydrogenated amorphous silicon underlayer in a single etching tool.

Growing community of inventors

Tokyo, Japan

Hiroaki Kitahara