Noritsu Koki Co., Ltd.

Noritsu Kenkyu Center Co., Ltd.

Hiroaki Ikehara

Kanichi Nishimoto

Noriyuki Oka

Nobuaki Mihara

A negative film masking system for use in a photographic processing and printing machine includes a negative film masking assembly formed mainly of a mask and a negative film hold-down and a masking mount to which the negative film masking assembly is located. Photographic prints are produced from a negative film loaded in the negative film masking assembly and having standard size frames and panoramic size frames in random combination. A panoramic size frame is designated by masking both widthwise edges of the film in shooting to make two unexposed regions in a standard frame. The negative film masking system further includes a four-sided film gate aperture in the mask and which is identical in the size to the panoramic size frame and a four-sided film gate aperture in the negative film hold-down which is identical in the size to the four-sided film gate aperture of the mask. Detecting apertures in particular positions of the mask are spaced from the four-sided film gate aperture thereof at locations in the unexposed regions of the panoramic size frame. Detecting apertures in the negative film hold-down communicate with the detecting apertures of the mask.

Negative film masking system in photographic processing and printing

The one end of each of liquid introduction pipes through which treating ilquid is introduced from the treating liquid storing baths into the interior of a single disc film treating tank is opened on the peripheral wall of the disc film treating tank. A partition wall is provided in front of a series of treating liquid supply ports on the peripheral wall of the disc film treating tank to constitute a waste liquid chamber which is effective for inhibiting an occurrence of mixing of one treating liquid with other one. The height and width of the partition wall is so determined that stream of the treating liquid flies above the top of the partition wall under the effect of flow inertia.

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Wakayama, Japan

Hiroaki Ikehara