Sumitomo Chemical Company, Limited

Hiroaki Fujishima

Yasunori Uetani

Masayoshi Minai

Yoshiyuki Takata

Hideki Ushio

Yasunobu Miyamoto

Tsutomu Matsumoto

Takayuki Higashii

Yoshiko Miya

Takayuk Higashii

Nobuharu Kouno

Karou Araki

Chemical amplifying type positive resist composition

Chemically amplified positive resist composition

Process for producing a 2-adamantyl (meth>acrylate

A chemical amplifying type positive resist composition, excellent in adhesion to a substrate and good in resist performances and suitable for exposure using a KrF excimer laser, ArF excimer laser, or the like, which comprises a resin having a polymerization unit of 2-alkyl-2-adamantyl (meth)acrylate and a polymerization unit of a monomer selected from 3-hydroxy-1-adamantyl (meth)acrylate and (meth)acrylonitrile, and an acid generator is provided.

A 1-bromoalkylbenzene derivative is prepared by reacting a phenylalkene derivative with hydrogen bromide in the presence of a non-polar solvent. The phenylalkene derivative is prepared by reacting an alkenyl halide with metal magnesium to form a Grignard reagent, and then reacting the Grignard reagent with a benzyl halide derivative. An allyl Grignard reagent is prepared by reacting continuously an allyl halide derivative with metal magnesium in an organic solvent, in which the allyl halide derivative and metal magnesium are continuously added to the reaction system and the allyl Grignard reagent formed is continuously removed from the reaction system. The processes provide the intended compounds in high yields, high selectivities and high purities.

Process for preparing 1-bromoalkylbenzene derivatives and intermediates

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Toyonaka, Japan

Hiroaki Fujishima