Carl Zeiss Smt Gmbh

Leybold Gmbh

Carl Zeiss Microscopy Gmbh

Hin Yiu Anthony Chung

Wolfgang Singer

Stefan Butzmann

Udo Dinger

Gennady Fedosenko

Leonid Gorkhover

Alexander Laue

Dirk Heinrich Ehm

Stefan Wiesner

Almut Czap

Ruediger Reuter

Albrecht Ranck

Martin Antoni

Stefan Hembacher

Hartmut Enkisch

Dirk Schaffer

Berndt Warm

Michel Aliman

Stefan-Wolfgang Schmidt

Dieter Kraus

Stefan Koehler

Thorsten Benter

Yim-Bun-Patrick Kwan

Peter Awakowicz

Stefan Burkart

Axel Dochnahl

Rudiger Reuter

Werner Petzold

Achim Von Keudell

Marc Boeke

Joerg Winter

Andreas Gorus

Valerie Derpmann

Theodore Lundquist

Michael Schmidt

Albrecht Brockhaus

Rüdiger Reuter

Tim Stampe

Bernd Reimann

Jürgen Baier

Marc BÖKE

Jörg Winter

Christos Kourouklis

Sigfried Rennon

Günther Dengel

A mass spectrometer includes an ion trap, which has an interior for storing ions, a signal generator, which is connected to an electrode of the ion trap, which delimits the interior, for coupling in a voltage signal, in particular a radiofrequency voltage signal, and an ionization device for ionizing a gas to be ionized and supplied to the interior. The ionization device is connected to the signal generator in order to use the voltage signal (U, U, U) of the signal generator, which is coupled into the electrode, for generating ions.

Mass spectrometer comprising an ionization device

A method includes parallel or serial ionization of a gas mixture by activating at least two ionization devices operating using different ionization procedures, and/or by ionizing the gas mixture in a detector to which the gas mixture and ions and/or metastable particles of an ionization gas are fed. The method also includes detecting the ionized gas mixture in the detector for the mass spectrometric examination thereof. A mass spectrometer for mass spectrometric examination of gas mixtures includes an ionization unit for ionizing a gas mixture and a detector for detecting the ionized gas mixture.

Method for mass spectrometric examination of gas mixtures and mass spectrometer therefor

The disclosure relates to a mass spectrometer for mass spectrometric examination of gas mixtures, including: an ionization device and an ion trap for storage and mass spectrometric examination of the gas mixture. In one aspect of the disclosure, the ionization device is embodied for supplying ions and/or metastable particles of an ionization gas and/or for supplying electrons to the ion trap for ionizing the gas mixture to be examined and the mass spectrometer is embodied to determine the number of ions and/or metastable particles of the ionization gas present in the ion trap and/or the number of ions of a residual gas present in the ion trap prior to examining the gas mixture. The disclosure also relates to the use of such a mass spectrometer and a method for mass spectrometric examination of a gas mixture.

Mass spectrometer, use thereof, and method for the mass spectrometric examination of a gas mixture

An ionization device includes: a plasma generating device for generating metastable particles and/or ions of an ionization gas in a primary plasma region; a field generating device for generating a glow discharge in a secondary plasma region; an inlet for supplying a gas to be ionized into the secondary plasma region; and a further inlet for supplying the metastable particles and/or the ions of the ionization gas into the secondary plasma region. A mass spectrometer includes such an ionization device and a detector downstream of the outlet of the ionization device for the mass-spectrometric analysis of the ionized gas.

Ionization device with mass spectrometer therewith

A method for examining a gas by mass spectrometry includes: ionizing the gas for producing ions; and storing, exciting and detecting at least some of the produced ions in an FT ion trap. Producing and storing the ions in the FT ion trap and/or exciting the ions prior to the detection of the ions in the FT ion trap includes at least one selective IFT excitation, such as a SWIFT excitation, which is dependent on the mass-to-charge ratio of the ions. The disclosure further relates to a mass spectrometer. A mass spectrometer includes: an FT ion trap; and an excitation device for storing, exciting, and detecting ions in the FT ion trap.

Method for examining a gas by mass spectrometry and mass spectrometer

To improve the bonding of two parts () of a component () of an EUV or UV lithography apparatus such that the probability of occurrence of additional stress over time in the bonded parts () is lessened, a component () of an EUV or UV lithography apparatus comprising two parts () bonded to each other by adhesive material () is proposed, wherein the adhesive material () is coated with a protective layer () insulating the adhesive material () from the surrounding gas environment.

Component of an EUV or UV lithography apparatus and method for producing it

In order to clean optical components () inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, () arranged to apply an electric and/or magnetic field, downstream of the heating filament () in the direction of flow of the hydrogen (). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam ().

Cleaning module, EUV lithography device and method for the cleaning thereof

A method for bonding a first body () to a second, panel-shaped body () at bonding surfaces () lying opposite each other, the second body () projecting in at least one direction (X) beyond an edge (') of the first body (). The method includes: producing a plurality of spacers (to&#x2032; to&#x2032;) on at least one of the bonding surfaces (), applying adhesive () into intermediate spaces (to) between the spacers beyond an outer spacer (&#x2032;) as far as an adhesive periphery (), which is formed at an edge (&#x2032;) of the first body (), and bonding the bodies () by bringing the bonding surfaces () into contact at the spacers (&#x2032; to&#x2032;). A prescribed distance (d) between the adhesive periphery () and the outermost spacer () is set to provide a desired state of deformation of the panel-shaped body () after a shrinkage of the applied adhesive () (e.g. minimized bending of the body.) In an associated composite body (), the prescribed distance (d) lies between 20 &#x3bc;m and 250 &#x3bc;m, preferably between 30 &#x3bc;m and 200 &#x3bc;m, in particular between 40 &#x3bc;m and 150 &#x3bc;m.

Method for bonding bodies and composite body

An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device () for processing an optical element (), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (), the processing device () includes a particle generator () for generating a particle beam, in particular an electron beam (), and/or a high-frequency generator.

EUV lithography device and method for processing an optical element

Growing community of inventors

Ulm, Germany

Hin Yiu Anthony Chung