Samsung Display Co., Ltd.

Samsung Electronics Co., Ltd.

Az Electronic Materials (luxembourg) S.a.r.l.

Hikuk Lee

Jaehyuk Chang

Kibeom Lee

Changhoon Kim

Sanghyun Yun

Cha-Dong Kim

Hoon Jong Kang

Sanghyun Lee

Wooyong Sung

Jung-In Park

Su-Yeon Sim

Jongjin Lee

Sangdon Jang

Chadong Kim

Sangjoon Hong

Inbae Chang

Jungin Park

Deokman Kang

Younsuk Kim

Saetae Oh

A photoresist composition includes an alkali soluble resin, a hardening agent, a photo acid generator, and an organic solvent. The photo acid generator may be represented by Formula 1, in which Lis selected from a single bond, a C-Calkylene group, a C-Calkenylene group, and a C-Calkynylene group; and Ris selected from a C-Caryl group, or a C-Caryl group with at least one substitutent group selected from a group comprising deuterium, a hydroxyl group, a C-Calkyl group, a C-Calkoxy group, and a C-Caryl group.

Photoresist composition and method of manufacturing substrate for display device by using the same

An optical apparatus and a manufacturing method using the optical apparatus are disclosed. The optical apparatus includes a stage supporting a substrate, first optical systems providing a first light onto the substrate, a gantry supporting the first optical systems to transfer them on the stage, and second optical systems disposed between the gantry and the stage and detecting displacement of the first optical systems. Each of the second optical systems includes a beam source generating a second light different with the first light, and sensor arrays for sensing the second light provided to the first optical systems to detect displacement of the first optical systems.

Optical apparatus and manufacturing method using the same

A digital exposure device includes: a stage having a substrate seated thereon where a pattern is to be formed and moving in a scan direction; a data modification unit receiving design data and generating modified data by extending the design data; and a digital exposure unit receiving the design data and projecting a light controlled according to the design data on the substrate, wherein the modified data includes intermedial data corresponding to the size difference between an image of the design data and an image of the modified data and some of unit data forming the intermedial data are data obtained when unit data of the design data are shifted in any expansion direction.

Digital exposure device

A digital exposure device including a GLV or a DMD. The digital exposure device also includes: a stage to support and move a substrate in a scan direction; an optical system disposed between the stage and the GLV or the DMD, to form a pattern on the substrate by modulating light received from the GLV or the DMD; and a control unit to control the a width of the pattern by a unit, the unit being obtained by dividing the width of the pattern by a natural number m, in the second direction.

Digital exposure device using GLV and digital exposure device using DMD

Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light source is configured to provide a first light. The first head is spaced apart from the stage in a first direction and is configured to receive the first light, to generate at least one spot beam by modulating the first light, and to project the at least one spot beam onto the substrate. The digital micro-mirror device control unit is configured to control an energy of the at least one spot beam generated from the first head to be inversely proportional to a size of the at least spot beam generated from the first head.

Digital exposure device using digital micro-mirror device and a method for controlling the same

Growing community of inventors

Yongin-si, South Korea

Hikuk Lee