Essilor International

Sumitomo Chemical Company, Limited

Nikon-Essilor Co., Ltd.

Hideyuki Wakiyasu

Masayoshi Tokuda

Tomonori Miyamoto

Tomohiro Ito

Katsuyoshi Takeshita

An object of the present invention is to provide a laminate which has a substrate, an intermediate layer, and a water-repellent layer laminated in this order, and has excellent abrasion resistance. The present invention is a laminate comprising: a substrate (s) having an anti-reflection layer; an intermediate layer (c) placed on the anti-reflection layer side of the substrate; and a water-repellent layer (r), in this order, wherein the intermediate layer (c) is a cured layer of a mixture composition (cc) of an organosilicon compound (C), or a vapor deposition layer of the organosilicon compound (C), the organosilicon compound (C) contains a silicon atom together with an amino group and/or an amine skeleton, the water-repellent layer (r) is a cured layer of a mixture composition (ca) of an organosilicon compound (A) in which a monovalent group having a perfluoropolyether structure is bound to a silicon atom through a linking group or without a linking group located therebetween, and a hydrolyzable group is bound to the silicon atom through a linking group or without a linking group located therebetween, and the laminate satisfies the following requirement (1),

Laminate and production method therefor

The present invention addresses the problem of providing an eyeglass lens that has excellent UV absorption properties and low yellowness. This eyeglass lens is produced using a resin composition that contains m-xylylene diisocyanate, a polythiol compound, and a UV absorber. The UV absorber contains at least a compound represented by formula (1) and a compound represented by formula (2). The M value represented by formula (X) is greater than 1.40 but less than 3.20.

Eyeglass lens

The present invention addresses the problem of providing an eyeglass lens that has excellent UV absorption properties and low yellowness. This eyeglass lens is produced using a resin composition that contains at least one isocyanate compound selected from the group consisting of 2,5-bis(isocyanatomethyl)bicyclo[2.2.1]heptane and 2,6-bis(isocyanatomethyl)bicyclo[2.2.1]heptane; a polythiol compound; a UV absorber represented by formula (1); and a UV absorber represented by formula (2). The M value represented by formula (X) is greater than 0.7 but less than 16.7.

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Tokyo, Japan

Hideyuki Wakiyasu