Tokyo Electron Limited

Fujitsu Corporation

Hideyuki Tsutsumi

Yuji Kamikawa

Takayuki Toshima

Kinya Ueno

Tadashi Iino

Miyako Yamasaka

Shinya Hatakeyama

Mitsuru Nakatsuji

Yasushi Miyagawa

The wireless base station notifies the missing to the transmitter upon detection of missing of a data segment received from the transmitter, and the transmitter controls the header compression state of the data segment addressed to the wireless terminal upon the reception of the notification of the missing.

Method of controlling header compression in wireless communication, wireless base station, and transmitter

Semiconductor wafers are cleaned by placing the semiconductor wafers in a processing vessel, forming a pure water film on the surfaces of the wafers, forming an ozonic water film by dissolving ozone gas in the pure water film, and removing resist films formed on the wafers by the agency of the ozonic water film. The pure water film is formed by condensing steam on the surfaces of the wafers. The resist films formed on the surfaces of the wafers can be removed by also using hydroxyl radicals produced by interaction between steam and ozone gas supplied into the processing vessel. Thus, the resist films can be removed highly effectively.

Substrate processing apparatus for resist film removal

Substrate processing method and apparatus

Growing community of inventors

Kawasaki, Japan

Hideyuki Tsutsumi