Nuflare Technology, Inc.

Hideyuki Tsurumaki

Takayuki Abe

Tomohiro Iijima

Junichi Suzuki

Osamu Iizuka

Keiko Emi

Hikaru Yamamura

Sumito Nakada

A charged particle beam drawing apparatus has a drawing unit that directs a charged particle beam and draws a pattern on a target and also has a control calculator that controls the drawing unit. The control calculator has a speed calculating unit configured to calculate a first drawing speed in a first area in a drawing area on the target according to a run-up start coordinate, a drawing start coordinate, and a predetermined first acceleration, and calculate the range of the first area according to the run-up start coordinate, the first acceleration, and a second drawing speed, and also has a drawing control unit configured to control the drawing unit so that, in the first area, drawing is performed at the first drawing speed and, in a second area that follows the first area, drawing is performed at the second drawing speed.

Apparatus and method for calculating drawing speeds of a charged particle beam

A charged particle beam writing method according to embodiments of the present disclosure includes: storing in a charged particle beam writing apparatus a position coordinate at which a drift amount is diagnosed; storing in the charged particle beam writing apparatus first and second time interval patterns which define time intervals to diagnose the drift amount of the charged particle beam; performing first writing of irradiating a target object with the charged particle beam, and writing a writing pattern on the target object while diagnosing the drift amount based on the first time interval pattern during the writing; and performing second writing of writing a predetermined writing pattern while diagnosing the drift amount when the writing reaches the position coordinate and diagnosing the drift amount based on the second time interval pattern during the writing after the writing reaches the position coordinate.

Charged particle beam writing method, computer-readable recording medium, and charged particle beam writing apparatus

A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing region by using the charged particle beam corresponding to the dose.

Charged particle beam writing method and apparatus and readable storage medium

A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first correlation among a time having passed since the writing start time, the total writing time, and the base dose, a third part configured to acquire a fogging effect correction coefficient at the arbitrary time by using a second correlation among the time, the total writing time and the coefficient, a forth part configured to calculate a beam dose at the arbitrary time by using the base dose and the coefficient, a fifth part configured to calculate a beam irradiation time based on the beam dose, a deflector for deflecting the beam, and an aperture for blocking the beam.

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Kanagawa, Japan

Hideyuki Tsurumaki